DPS2005 Organizing Committees




International Organizing Committee

Chair H. Sugai (Nagoya University, Japan)
Co-chair C.-K. Choi (Cheju National University, Korea)
Vice-chair M. Yoneda (Renesas Technology Corp., Japan)
Vice-chair J.T. Moon (Samsung Electronics Co., Korea)
Members D.S.H. Chan (National Singapore University, Singapore)
V. Donelly (University of Houston, USA)
D.B. Graves (UCLA at Berkeley, USA)
T. Hayashi (ULVAC Inc., Japan)
L. van den Hove (Silicon Process Technology IMEC, Belgium)
O. Joubert (LTM/CNRS, France)
H.J. Kim (Seoul National University, Korea)
K. Kudo (Chiba University, Japan)
J.K. Lee (Pohang Institute of Science and Technology, Korea)
K.C. Leou (National Tsing Hua University, Taiwan
T. Makabe (Keio University, Japan)
C.H. Moon (Samsung SDI, Korea)
L. Overzet (Universtiy of Texas at Dallas, USA)
Shi-Woo Rhee (Pohang Institute of Science and Technology, Korea)
O. Takai (Nagoya University, Japan)
M.C.M. van de Sanden (Eindovoven University of Technology, the Netherland)
H.H. Sawin (Massachusetts Institute of Technology, USA)
J.P.M. Schmitt (Unaxis-France SA, France)
K. Tachibana (Kyoto University, Japan)
M. Tsujimura (Ebara Corp., Japan)
S. Xu (Nanyang Technological University, Singapore)
S. Zaima (Nagoya University, Japan)

Interational Advisory Committee

Chair J. Nishizawa (Tokyo MetropolitanUniversity, Japan)
Co-chair Y. Tarui (Tokyo Univ. of Agriculture and Technology, Japan)
Members M. Esashi (Tohoku University, Japan)
R. Gottscho (Lam Research Co., Ltd., USA)
Y. Horiike (National Institute for Material Science, Japan)
T. Lill (Applied Materials Inc., USA)
Y. Ohki (Waseda University, Japan)
S. Tachi (Hitach Hi-Technologies Co., Japan)
K.-W. Whang (Seoul National University, Korea)

Executive Committee

Chair M. Hori (Nagoya University, Japan)
Vice-chair N.-E. Lee (Sungkyunkwan University, Korea)
Secretary T. Ohiwa (Toshiba Corp. Semiconductor Company, Japan)
Treasurer K. Kurihara (Toshiba Corp., Japan)
Members H.J. Lee (Cheju National University, Korea)
K. Nakamura (Chubu University, Japan)
H. Toyoda (Nagoya University, Japan)

Publication Committee

Chair N. Fujiwara (Renesas Technology Corp., Japan)
Vice-chair A. Kono (Nagoya University, Japan)
Vice-chair H.Y. Chang (Korea Advanced Institute of Science and Technology, Korea)
Members T. Abe (Tohoku University, Japan)
Y.S. Hwang (Seoul National University, Korea)
T. Ichiki (The University of Tokyo, Japan)
N. Ikegami (Oki Electric Industry Co., Ltd, Japan)
J.H. Joo (Kunsan National University, Korea)
E. Kusano (Kanazawa Institute of Technology, Japan)
Y. Morikawa (ULVAC Inc., Japan)
K. Sasaki (Nagoya University, Japan)
M. Shiratani (Kyushu University, Japan)
E. Stamate (Al. I. Cuza University, Romania)
T. Tatsumi (Sony Corp., Japan)
F. Tochikubo (Tokyo Metropolitan University, Japan)

Program Committee

Chair K. Nojiri (Lam Research Co., Ltd, Japan.)
Vice-chair T-H. Ahn (Samsung Electronics Co., Korea)
Vice-chair T. Ohiwa (Toshiba Corp. Semiconductor Company, Japan)
Members Y. Akiyama (Tokai University, Japan)
K. Azuma (Advanced LCD Technologies Development Center Co. Ltd., Japan)
J-P. Booth (Ecole Polytechnique, France)
J. P. Chang (University of California at Los Angeles, USA)
E. H. Choi (Kwangwoon University, Korea)
D. J. Economou (University of Houston, USA)
M. Engelhardt (Infineon Technologies AG, USA)
H. Fujiyama (Nagasaki University, Japan)
H. Habuka (Yokohama National University, Japan)
S. Hamaguchi (Osaka University, Japan)
M. P. Hong (Samsung Electronics Co., Korea)
S. K. Hong (LG-PRC, Korea)
K. Horioka (Applied Materials Japan, Inc., Japan)
Y. Ichikawa (Fuji Electric Device Technology Co., Ltd., Japan)
S. Ikeda (ASM Japan K.K., Japan)
M. Izawa (Hitachi Ltd., Japan)
Hyeongtag Jeon (Hanyang University, Korea)
Changjin Kang (Samsung Electronics Co., Korea)
J. W. Kim (Hynix, Korea)
K. Kinoshita (National Institute of AIST, Japan)
A. Koshiishi (Tokyo Electron AT Ltd., Japan)
H. Kuwano (Tohoku University, Japan)
A. P. Mahorowala (IBM, USA)
S. Miyazaki (Hiroshima University)
H. Nakagawa (Canon ANELVA Technix Corp., Japan)
Y. Nakagawa (ANELVA Corp., Japan)
M. Nakamura (FUJITSU LIMITED, Japan)
H. Ohtake (NEC Corp.)
K. Ono (Kyoto University, Japan)
Y. Oshita (Toyota Technological Institute, Japan)
S. Samukawa (Tohoku University, Japan)
M. Sekine (University of Connecticut, USA)
M. Shimada (Hiroshima University, Japan)
K. Shimogaki (The University of Tokyo, Japan)
M. Tuda (Mitsubishi Electric Corp., Japan)
K. Tsujimoto (Renesas Technology Corp., Japan)
S. Watanabe (Hitachi High-Technologies Corp., Japan)
G. Y. Yeom (Sungkyunkwan University, Korea)

Local Organizing Committee

Chair J.G. Han (Sungkyunkwan University, Korea)
Members J.H. Boo (Sungkyunkwan University, Korea)
H.Y. Chae (Sungkyunkwan University, Korea)
W.H. Choe (Korea Advanced Institute of Science and Technology, Korea)
M. Hiramatsu (Meijo University, Japan)
K.M. Lee (Cheju National University, Korea)
Y.H. Yu (Cheju National University, Korea)