ProceedingIntern09 をテンプレートにして作成

開始行:
#include(MenuTab1,notitle) 1993-2009年の国際会議リスト -1) Shuzo Fujimura, Hiroki Ogawa, ''Kenji Ishikawa'', Car... --FT-IR-RAS analysis of native oxide grown on Si(111). ---Extended Abstract of the 1993 Intern. Conf. on Solid S... -2) ''Kenji Ishikawa'', Hiroki Ogawa, Carlos Inomata, Shu... --New analytical method of SiO2 structure by infrared ref... ---1993 Fall Meeting of the Material Research Society (MR... -3) ''Kenji Ishikawa'', Hiroki Ogawa, Carlos Inomata, and... --Contribution of Si/SiO2 interface roughness in the obse... ---Extended Abstract of the 1994 Intern. Conf. on Solid S... -4) Hiroki Ogawa, ''Kenji Ishikawa'', M.T. Suzuki, Y. Hay... --Effects of dissolved oxygen in hf solution on silicon s... ---Extended Abstract of the 1994 Intern. Conf. on Solid S... -5) K. Kubota, Hiroki Ogawa, Y. Morikawa, ''Kenji Ishikaw... --Study on reaction of fluorine radicals with Si(111) sur... ---8th Intern. Micro Process Conf., (Sendai, July 17-20, ... -6) ''Kenji Ishikawa'', Hiroki Ogawa, S. Oshida, K. Suzuk... --Thickness-deconvolved structural properties of thermall... ---Extended Abstract of the 1995 Intern. Conf. on Solid S... -7) Hiroki Ogawa, ''Kenji Ishikawa'', M. Aoki, Shuzo Fuji... --In-situ observation of oxygen exposed hydrogen terminat... ---Extended Abstract of the 1995 Intern. Conf. on Solid S... -8) ''Kenji Ishikawa'', Hiroki Ogawa, S. Oshida, K. Suzuk... --Thickness-deconvolved structural properties of thermall... ---26th IEEE Semiconductor Interface Specialist Conf. (SI... -9) Shuzo Fujimura, ''Kenji Ishikawa'', and Hiroki Ogawa. --Early stage of native oxide growth on an atomically fla... ---Proc. 3rd Intern. Symp. Ultra Clean Processing of Sili... -10) ''Kenji Ishikawa'', and Makoto Sekine. --An in-situ time-resolved infrared spectroscopic study o... ---Microprocess and Nanotechnology Conference (MNC), (Tok... -11) ''Kenji Ishikawa'', and Makoto Sekine. --Early-stage modification of silicon oxide surface in fl... ---47th International Symposium American Vacuum Society (... -12) ''Kenji Ishikawa'', and Makoto Sekine. --Early-stage modification of Silicon dioxide surface dur... ---25th Intern. Conf. on Phenomena in Ionized Gases (ICPI... -13) Shigenori Hayashi, ''Kenji Ishikawa'', and Makoto Se... --Time-resolved planer laser-induced fluorescence of fluo... ---25th International Conference on Phenomena in Ionized ... -14) Mitsuru Okigawa, ''Kenji Ishikawa'', Shoji Kobayashi... --Electron-spin-resonance investigation on solid surfaces... ---25th International Conference on Phenomena in Ionized ... -15) ''Kenji Ishikawa'', Shigenori Hayashi, Mitsuru Okiga... --In-vacuo electron-spin-resonance study on fluorocarbon ... ---AVS 48th International Symposium American Vacuum Socie... -16) ''Kenji Ishikawa'', Mitsuru Okigawa, Makoto Sekine, ... --Dangling bond observation during fluorocarbon plasma et... ---1st International Symposium on Dry Process, (Waseda, T... -17) Hideo Tsuboi, Kazuhiro Karahashi, ''Kenji Ishikawa''... --Measurements of SiO2 etch yields under F+ and CFx+ ion ... ---3rd International Conference on Microelectronics and I... -18) ''Kenji Ishikawa'', Mitsuru Okigawa, Makoto Sekine, ... --Dangling bond observation during plasma etching process... ---16th European Conference on Atomic and Molecular Physi... -19) Kazuhiro Karahashi, Hideo Tsuboi, ''Kenji Ishikawa''... --Measurements of desorbed products and etching yield by ... ---16th European Conference on Atomic and Molecular Physi... -20) ''Kenji Ishikawa'', Yoshikazu Yamaoka, Akihiro Egami... --Using real-time infrared spectroscopy and in-vacuo elec... ---2nd International Symposium on Dry Process, (Hongoh, T... -21) Ken-ichi Yanai, Kazuhiro Karahashi, Hideo Tsuboi, ''... --Study of SiO2 plasma etching and fluorocarbon film depo... ---2nd International Symposium on Dry Process, (Hongoh, T... -22) Akihiro Egami, Yuji Hayashi, Toshio Kikuchi, ''Kenji... --Decomposition Mechanism of c-C4F8 in Plasma Assisted Ca... ---2nd International Symposium on Dry Process, (Hongoh, T... -23) Kazuhiro Karahashi, ''Kenji Ishikawa'', Hideo Tuboi,... --Measurements of desorbed products and etching yield by ... ---AVS 49th International Symposium American Vacuum Socie... -24) Ken-ichi Yanai, ''Kenji Ishikawa'', Kazuhito Karahas... --Study of selective etching of SiO2-to-Si3N4 and a-C:F f... ---4th International Conference on Microelectronics and I... -25) ''Kenji Ishikawa'', Teruo Yagishita, and Moritaka Na... --Vapor treatment of copper surface using organic acids. ---2003 Spring meeting of the Material Research Society (... -26) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Cleaning of copper surface using vapor-phase organic ac... ---203rd Meeting of the Electrochemical Society (ECS), (P... -27) Moritaka Nakamura, Ken-ichi Yanai, Kazuhiro Karahash... --Study of fluorocarbon plasma etching and film depositio... ---16th International Symposium on Plasma Chemistry (ISPC... -28) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Mechanisms of vapor cleaning of copper surface using or... ---204th Meeting of the Electrochemical Society (ECS), (O... -29) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Study of SiO2 plasma etching with off-normal mass-analy... ---AVS 50th International Symposium American Vacuum Socie... -30) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Incident angular dependence of SiO2 and Si3N4 etching w... ---4th International Symposium on Dry Process, (Hongoh, T... -31) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Cleaning of copper surface using vapor-phase organic ac... ---2nd EU-Japan Joint Symposium on Plasma processing, (Fe... -32) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Incident angular dependence of SiO2 and Si3N4 etching w... ---2nd EU-Japan Joint Symposium on Plasma processing, (Fe... -33) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Using in-vacuo electron-spin-resonance and infrared spe... ---AVS 51th International Symposium American Vacuum Socie... -34) Satoshi Yamasaki, and ''Kenji Ishikawa''. --Dangling bond creation and annihilation during plasma p... ---AVS 51st International Symposium American Vacuum Socie... -35) Yuichi Yamazaki, ''Kenji Ishikawa'', Norikazu Mizuoc... --Structural change in diamond by hydrogen plasma treatme... ---10th International Conference New Diamond Science and ... -36) Yuichi Yamazaki, ''Kenji Ishikawa'', Seiji Samukawa,... --Defect creation in diamond by hydrogen plasma treatment... ---23rd International Conference on Defects in Semiconduc... -37) Hiroshi Kudo, ''Kenji Ishikawa'', Y. Mishima, S. Sat... --Efficient reduction of standby leakage current in LSIs ... ---Ext. Abst. the 2005 International conference on Solid... -38) Junya Nakahira, ''Kenji Ishikawa'', N. Nishikawa, M.... --Low temperature dry cleaning technology using formic ac... ---Advanced Metallization Conference (AMC) 2005, (Colorad... -39) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Vacuum-ultraviolet photon irradiation effects in fluoro... ---AVS 52nd International Symposium American Vacuum Socie... -40) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Plasma emission irradiation effects on etching surface ... ---International conference on reactive plasmas and Sympo... -41) Yuichi Yamazaki, ''Kenji Ishikawa'', Norikazu Mizuoc... --Structural damage of diamond by oxygen ion beam exposure. ---International conference on reactive plasmas and Sympo... -42) Masakazu Sugiyama, ''Kenji Ishikawa'', Isao Gunji, Y... --Reduction of copper surface with formic acid for 32-nm-... ---The 209th Electrochemical Society Spring Meeting (ECS)... -43) Hiroshi Kudo, ''Kenji Ishikawa'', R. Tanabe, H. Fuku... --Large reduction in standby power consumption achieved w... ---Ext. Abst. the 2006 International conference on Solid ... -44) Masakazu Sugiyama, ''Kenji Ishikawa'', Masafumi Naka... --Reaction mechanism of low-temperature damageless cleani... ---Advanced Metallization Conference (AMC) 2006: 16th Asi... -45) Hiroshi Kudo, ''Kenji Ishikawa'', M. Nakaishi, A. Ts... --Enhancing yield and reliability by applying dry organic... ---The 11th International Interconnect Technology Confere... -46) K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, H. ... --A new framework for performance prediction of advanced ... ---2008 IEEE International Electron Devices Meeting (IEDM... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

終了行:
#include(MenuTab1,notitle) 1993-2009年の国際会議リスト -1) Shuzo Fujimura, Hiroki Ogawa, ''Kenji Ishikawa'', Car... --FT-IR-RAS analysis of native oxide grown on Si(111). ---Extended Abstract of the 1993 Intern. Conf. on Solid S... -2) ''Kenji Ishikawa'', Hiroki Ogawa, Carlos Inomata, Shu... --New analytical method of SiO2 structure by infrared ref... ---1993 Fall Meeting of the Material Research Society (MR... -3) ''Kenji Ishikawa'', Hiroki Ogawa, Carlos Inomata, and... --Contribution of Si/SiO2 interface roughness in the obse... ---Extended Abstract of the 1994 Intern. Conf. on Solid S... -4) Hiroki Ogawa, ''Kenji Ishikawa'', M.T. Suzuki, Y. Hay... --Effects of dissolved oxygen in hf solution on silicon s... ---Extended Abstract of the 1994 Intern. Conf. on Solid S... -5) K. Kubota, Hiroki Ogawa, Y. Morikawa, ''Kenji Ishikaw... --Study on reaction of fluorine radicals with Si(111) sur... ---8th Intern. Micro Process Conf., (Sendai, July 17-20, ... -6) ''Kenji Ishikawa'', Hiroki Ogawa, S. Oshida, K. Suzuk... --Thickness-deconvolved structural properties of thermall... ---Extended Abstract of the 1995 Intern. Conf. on Solid S... -7) Hiroki Ogawa, ''Kenji Ishikawa'', M. Aoki, Shuzo Fuji... --In-situ observation of oxygen exposed hydrogen terminat... ---Extended Abstract of the 1995 Intern. Conf. on Solid S... -8) ''Kenji Ishikawa'', Hiroki Ogawa, S. Oshida, K. Suzuk... --Thickness-deconvolved structural properties of thermall... ---26th IEEE Semiconductor Interface Specialist Conf. (SI... -9) Shuzo Fujimura, ''Kenji Ishikawa'', and Hiroki Ogawa. --Early stage of native oxide growth on an atomically fla... ---Proc. 3rd Intern. Symp. Ultra Clean Processing of Sili... -10) ''Kenji Ishikawa'', and Makoto Sekine. --An in-situ time-resolved infrared spectroscopic study o... ---Microprocess and Nanotechnology Conference (MNC), (Tok... -11) ''Kenji Ishikawa'', and Makoto Sekine. --Early-stage modification of silicon oxide surface in fl... ---47th International Symposium American Vacuum Society (... -12) ''Kenji Ishikawa'', and Makoto Sekine. --Early-stage modification of Silicon dioxide surface dur... ---25th Intern. Conf. on Phenomena in Ionized Gases (ICPI... -13) Shigenori Hayashi, ''Kenji Ishikawa'', and Makoto Se... --Time-resolved planer laser-induced fluorescence of fluo... ---25th International Conference on Phenomena in Ionized ... -14) Mitsuru Okigawa, ''Kenji Ishikawa'', Shoji Kobayashi... --Electron-spin-resonance investigation on solid surfaces... ---25th International Conference on Phenomena in Ionized ... -15) ''Kenji Ishikawa'', Shigenori Hayashi, Mitsuru Okiga... --In-vacuo electron-spin-resonance study on fluorocarbon ... ---AVS 48th International Symposium American Vacuum Socie... -16) ''Kenji Ishikawa'', Mitsuru Okigawa, Makoto Sekine, ... --Dangling bond observation during fluorocarbon plasma et... ---1st International Symposium on Dry Process, (Waseda, T... -17) Hideo Tsuboi, Kazuhiro Karahashi, ''Kenji Ishikawa''... --Measurements of SiO2 etch yields under F+ and CFx+ ion ... ---3rd International Conference on Microelectronics and I... -18) ''Kenji Ishikawa'', Mitsuru Okigawa, Makoto Sekine, ... --Dangling bond observation during plasma etching process... ---16th European Conference on Atomic and Molecular Physi... -19) Kazuhiro Karahashi, Hideo Tsuboi, ''Kenji Ishikawa''... --Measurements of desorbed products and etching yield by ... ---16th European Conference on Atomic and Molecular Physi... -20) ''Kenji Ishikawa'', Yoshikazu Yamaoka, Akihiro Egami... --Using real-time infrared spectroscopy and in-vacuo elec... ---2nd International Symposium on Dry Process, (Hongoh, T... -21) Ken-ichi Yanai, Kazuhiro Karahashi, Hideo Tsuboi, ''... --Study of SiO2 plasma etching and fluorocarbon film depo... ---2nd International Symposium on Dry Process, (Hongoh, T... -22) Akihiro Egami, Yuji Hayashi, Toshio Kikuchi, ''Kenji... --Decomposition Mechanism of c-C4F8 in Plasma Assisted Ca... ---2nd International Symposium on Dry Process, (Hongoh, T... -23) Kazuhiro Karahashi, ''Kenji Ishikawa'', Hideo Tuboi,... --Measurements of desorbed products and etching yield by ... ---AVS 49th International Symposium American Vacuum Socie... -24) Ken-ichi Yanai, ''Kenji Ishikawa'', Kazuhito Karahas... --Study of selective etching of SiO2-to-Si3N4 and a-C:F f... ---4th International Conference on Microelectronics and I... -25) ''Kenji Ishikawa'', Teruo Yagishita, and Moritaka Na... --Vapor treatment of copper surface using organic acids. ---2003 Spring meeting of the Material Research Society (... -26) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Cleaning of copper surface using vapor-phase organic ac... ---203rd Meeting of the Electrochemical Society (ECS), (P... -27) Moritaka Nakamura, Ken-ichi Yanai, Kazuhiro Karahash... --Study of fluorocarbon plasma etching and film depositio... ---16th International Symposium on Plasma Chemistry (ISPC... -28) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Mechanisms of vapor cleaning of copper surface using or... ---204th Meeting of the Electrochemical Society (ECS), (O... -29) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Study of SiO2 plasma etching with off-normal mass-analy... ---AVS 50th International Symposium American Vacuum Socie... -30) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Incident angular dependence of SiO2 and Si3N4 etching w... ---4th International Symposium on Dry Process, (Hongoh, T... -31) Teruo Yagishita, ''Kenji Ishikawa'', and Moritaka Na... --Cleaning of copper surface using vapor-phase organic ac... ---2nd EU-Japan Joint Symposium on Plasma processing, (Fe... -32) Ken-ichi Yanai, Kazuhito Karahashi, ''Kenji Ishikawa... --Incident angular dependence of SiO2 and Si3N4 etching w... ---2nd EU-Japan Joint Symposium on Plasma processing, (Fe... -33) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Using in-vacuo electron-spin-resonance and infrared spe... ---AVS 51th International Symposium American Vacuum Socie... -34) Satoshi Yamasaki, and ''Kenji Ishikawa''. --Dangling bond creation and annihilation during plasma p... ---AVS 51st International Symposium American Vacuum Socie... -35) Yuichi Yamazaki, ''Kenji Ishikawa'', Norikazu Mizuoc... --Structural change in diamond by hydrogen plasma treatme... ---10th International Conference New Diamond Science and ... -36) Yuichi Yamazaki, ''Kenji Ishikawa'', Seiji Samukawa,... --Defect creation in diamond by hydrogen plasma treatment... ---23rd International Conference on Defects in Semiconduc... -37) Hiroshi Kudo, ''Kenji Ishikawa'', Y. Mishima, S. Sat... --Efficient reduction of standby leakage current in LSIs ... ---Ext. Abst. the 2005 International conference on Solid... -38) Junya Nakahira, ''Kenji Ishikawa'', N. Nishikawa, M.... --Low temperature dry cleaning technology using formic ac... ---Advanced Metallization Conference (AMC) 2005, (Colorad... -39) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Vacuum-ultraviolet photon irradiation effects in fluoro... ---AVS 52nd International Symposium American Vacuum Socie... -40) ''Kenji Ishikawa'', Yuichi Yamazaki, Satoshi Yamasak... --Plasma emission irradiation effects on etching surface ... ---International conference on reactive plasmas and Sympo... -41) Yuichi Yamazaki, ''Kenji Ishikawa'', Norikazu Mizuoc... --Structural damage of diamond by oxygen ion beam exposure. ---International conference on reactive plasmas and Sympo... -42) Masakazu Sugiyama, ''Kenji Ishikawa'', Isao Gunji, Y... --Reduction of copper surface with formic acid for 32-nm-... ---The 209th Electrochemical Society Spring Meeting (ECS)... -43) Hiroshi Kudo, ''Kenji Ishikawa'', R. Tanabe, H. Fuku... --Large reduction in standby power consumption achieved w... ---Ext. Abst. the 2006 International conference on Solid ... -44) Masakazu Sugiyama, ''Kenji Ishikawa'', Masafumi Naka... --Reaction mechanism of low-temperature damageless cleani... ---Advanced Metallization Conference (AMC) 2006: 16th Asi... -45) Hiroshi Kudo, ''Kenji Ishikawa'', M. Nakaishi, A. Ts... --Enhancing yield and reliability by applying dry organic... ---The 11th International Interconnect Technology Confere... -46) K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, H. ... --A new framework for performance prediction of advanced ... ---2008 IEEE International Electron Devices Meeting (IEDM... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

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