ProceedingIntern11 をテンプレートにして作成

開始行:
#include(MenuTab1,notitle) 2011年の国際会議リスト -95) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo ... --(''INVITED'') Real-time electron-spin-resonance study ... ---12th International Workshop of Advanced Plasma Process... -96) T. Hiraoka, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Study of terahertz time domain spectroscopy for biologi... ---12th International Workshop of Advanced Plasma Process... -97) S. Iseki, T. Ohta, M. Ito, H. Kano, K. Takeda, ''Ken... --Effect of reactive oxygen species on Penicillium digita... ---12th International Workshop of Advanced Plasma Process... -98) Masaru Hori, ''Kenji Ishikawa'', Keigo Takeda, and S... --Insight into plasma nano-interface with organic materia... ---2nd International Workshop on Plasma Nano-interface an... -99) ''Kenji Ishikawa'', Shang Chen, Ryosuke Kometani, Hi... --Nitrogen radical annealing recovery of etch-induced-dam... ---3rd International Symposium on Advance Plasma Science ... -100) Ryosuke Kometani, Shang Chen, ''Kenji Ishikawa'', H... --Interaction of gallium nitride (GaN) surface with chlor... ---3rd International Symposium on Advance Plasma Science ... -101) Shang Chen, Ryosuke Kometani, ''Kenji Ishikawa'', H... --Deep level defect in GaN after plasma beam etching. ---3rd International Symposium on Advance Plasma Science ... -102) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --Real-time electron-spin-resonance measurement of plasma... ---3rd International Symposium on Advance Plasma Science ... -103) T. Hiraoka, K. Takeda, ''Kenji Ishikawa'', H. Kondo... --Measurement of optical properties of carbon-based mater... ---3rd International Symposium on Advance Plasma Science ... -104) Noboru Ebizuka, Hiroki Kondo, ''Kenji Ishikawa'', M... --Plasma nano-technologies for fabrications of VPH gratin... ---3rd International Symposium on Advance Plasma Science ... -105) Yusuke Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishik... --SiO2 plasma etching process using alternative gas, C3F6O. ---3rd International Symposium on Advance Plasma Science ... -106) Sho Kawashima, Yusuke Abe, Keigo Takeda, ''Kenji Is... --Crystallinity control of microcrystalline silicon film ... ---3rd International Symposium on Advance Plasma Science ... -107) Yusuke Abe, Keigo Takeda, ''Kenji Ishikawa'', Hirok... --Surface loss probability of hydrogen radical in SiH4/H2... ---3rd International Symposium on Advance Plasma Science ... -108) H. Shimoeda, H. Kondo, K. Takeda, ''Kenji Ishikawa'... --Effects of substrate temperatures on crystallographic c... ---3rd International Symposium on Advance Plasma Science ... -109) M. Kato, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M... --Three dimensional distribution of atomic radical in non... ---3rd International Symposium on Advance Plasma Science ... -110) Tatsuya Hagino, H. Kano, ''Kenji Ishikawa'', K. Tak... --High-speed synthesis of nano-graphene by in-liquid plas... ---3rd International Symposium on Advance Plasma Science ... -111) Fendong Jia, N. Sumi, ''Kenji Ishikawa'', H. Kano, ... --Measurement of the electron temperature and density of ... ---3rd International Symposium on Advance Plasma Science ... -112) Sachiko Iseki, T. Ohta, M. Ito, H. Kano, K. Takeda,... --O radical measurement in Penicillium digitatum inactiva... ---3rd International Symposium on Advance Plasma Science ... -113) A. Malinowski, Masaru Hori, Makoto Sekine, ''Kenji ... --Radical flux modeling and analysis for sticking coeffic... ---3rd International Symposium on Advance Plasma Science ... -114) Takuya Takeuchi, S. Amasaki, K. Takeda, ''Kenji Ish... --In situ XPS analysis of surface modification on ArF pho... ---3rd International Symposium on Advance Plasma Science ... -115) Yudai Miyawaki, Y. Kondo, H. Yamamoto, K. Takeda, '... --C5HF7 chemistry for highly selective etch of SiO2 over ... ---3rd International Symposium on Advance Plasma Science ... -116) Toshiya Suzuki, K. Takeda, H. Kondo, ''Kenji Ishika... --Sub-nm scale control of etched-profile-fluctuations in ... ---3rd International Symposium on Advance Plasma Science ... -117) Shinpei Amasaki, T. Takeuchi, K. Takeda, ''Kenji Is... --Study of Si etch reaction with F and O radicals using S... ---3rd International Symposium on Advance Plasma Science ... -118) Kohei Asano, H. Yamamoto, K. Takeda, ''Kenji Ishika... --In-situ FTIR analysis of porous low-k films exposed to ... ---3rd International Symposium on Advance Plasma Science ... -119) Sho Kawashima, Y. Abe, K. Takeda, ''Kenji Ishikawa'... --Crystallinity control of microcrystalline silicon film ... ---3rd International Symposium on Advance Plasma Science ... -120) Tokushige Kino, H. Kondo, ''Kenji Ishikawa'', Makot... --Synthesis of amorphous carbon films employing radical-i... ---3rd International Symposium on Advance Plasma Science ... -121) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --Real-time/in-situ electron-spin-resonance analysis of s... ---4th International Conference on PLAsma-Nano Technology... -122) Shinpei Amasaki, T. Takeuchi, K. Takeda, ''Kenji Is... --Investigation of Si etch reaction with F and O radicals... ---4th International Conference on PLAsma-Nano Technology... -123) Yusuke Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishik... --Chemical modeling of etch process using C3F6O alternati... ---4th International Conference on PLAsma-Nano Technology... -124) A. Malinowski, Makoto Sekine, Masaru Hori, ''Kenji ... --Investigation of surface reactions in ArF photoresist b... ---4th International Conference on PLAsma-Nano Technology... -125) T. Kanda, H. Kondo, K. Yamakawa, M. Hiramatsu, K. T... --Control of bridging growth and electrical properties of... ---4th International Conference on PLAsma-Nano Technology... -126) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Dissociations of alternate etching gases in reactive pl... ---4th International Conference on PLAsma-Nano Technology... -127) M. Kato, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M... --Gas phase reaction of activated species in O2/Ar nonequ... ---4th International Conference on PLAsma-Nano Technology... -128) Shang Chen, Y. Lu, R. Kometani, K. Takeda, ''Kenji ... --Passivation of plasma damaged GaN with hydrogen radical... ---4th International Conference on PLAsma-Nano Technology... -129) Fendong Jia, K. Takeda, ''Kenji Ishikawa'', H. Inui... --Measurement of atomic oxygen in ultrahigh density 60 Hz... ---4th International Conference on PLAsma-Nano Technology... -130) Y. Lu, S. Chen, R. Kometani, ''Kenji Ishikawa'', H.... --Surface analysis of GaN irradiated by Cl2 plasma beam. ---4th International Conference on PLAsma-Nano Technology... -131) Tatsuya Hagino, Hiroyuki Kano, ''Kenji Ishikawa'', ... --Synthesis of nano-graphene by plasma in liquid ethanol. ---4th International Conference on PLAsma-Nano Technology... -132) Toshiya Suzuki, S. Mitsuguti, A. Malinowski, Keigo ... --Subnanometer-scale control of feature size and shape in... ---International Conference on Microelectronics and Plasm... -133) Hiroki Kondo, Tatsuya Hagino, ''Kenji Ishikawa'', K... --Growth processes and crystallographic properties of nan... ---International Conference on Microelectronics and Plasm... -134) ''Kenji Ishikawa'', N. Sumi, A. Kono, H. Horibe, K.... --(INVITED) Real-time electron-spin-resonance study of pl... ---13th International Workshop on Advanced Plasma Process... -135) Shang Chen, Yi Lu, Ryousuke Kometani, ''Kenji Ishik... --Recovery of plasma-damaged GaN by atomic nitrogen and h... ---13th International Workshop on Advanced Plasma Process... -136) Hironao Shimoeda, Hiroki Kondo, ''Kenji Ishikawa'',... --Effects of oxygen radical irradiation on crystalline st... ---13th International Workshop on Advanced Plasma Process... -137) Masaru Hori, ''Kenji Ishikawa'', Naoya Sumi, Akihik... --Real time electron-spin-rresonace (ESR) study of plasma... ---The 20th International Symposium on Plasma Chemistry (... -138) Keigo Takeda, Masanori Kato, ''Kenji Ishikawa'', Hi... --Spatial distribution of atomic radical generated by ac ... ---The 20th International Symposium on Plasma Chemistry (... -139) Keigo Takeda, Hirotoshi Inui, ''Kenji Ishikawa'', H... --Behavior of hydrogen radical on reduction of copper oxi... ---30th International Conference on Phenomena in Ionized ... -140) Masaru Hori, Yusuke Abe, Keigo Takeda, ''Kenji Ishi... --Surface reaction of hydrogen radical on plasma enhanced... ---30th International Conference on Phenomena in Ionized ... -141) A. Malinowski, M. Sekine, M. Hori, ''Kenji Ishikawa... --Sticking coefficient of hydrogen radicals on ArF resist... --- 2011 International Conference on Simulation of Semico... -142) Makoto Sekine, Yudai Miyawaki, Yusuke Kondo, Keigo ... --(INVITED) Mechanism of highly selective SiO2 etching ov... ---4th International conference on advanced plasma techno... -143) A. Malinowski, Masaru Hori, Makoto Sekine, ''Kenji ... --Development of radical kinetic behavior investigation m... ---ESSDERC2011, (Finlandia Hall, Sep. 12-16, 2011), P-26. -144) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo... --(INVITED) In situ ESR measurements for revealing plasma... ---Asian-European International Conference on Plasma Surf... -145) Fengdong Jia, Keigo Takeda, ''Kenji Ishikawa'', Hir... --Highly spatial mapping of atomic oxygen density in a 60... ---Asian-European International Conference on Plasma Surf... -146) Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, ''Kenji... --Modeling of C3F6O/Ar plasma chemistry for SiO2 etching ... ---Asian-European International Conference on Plasma Surf... -147) Hiroshi Yamamoto, Kohei Asano, ''Kenji Ishikawa'', ... --In situ analysis of plasma-induced modification on poro... ---International Conference on Solid State Devices and Ma... -148) Yusuke Abe, Atsushi Fukushima, Y. Lu, Keigo Takeda,... --Effect of hydrogen radical-injection on growth property... ---International Conference on Solid State Devices and Ma... -149) Y. Lu, Shang Chen, Ryosuke Kometani, Keigo Takeda, ... --Plasma-induced damage of gan and its recovery by atomic... ---International Conference on Solid State Devices and Ma... -150) Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Field emission properties of 10-nm pillars of organics ... ---International Conference on Solid State Devices and Ma... -151) T. Hagino, Hiroki Kondo, Hiroyuki Kano, ''Kenji Ish... --Ultrafast synthesis of nanographene employing an ultrah... ---International Conference on Solid State Devices and Ma... -152) H. J. Cho, Keigo Takeda, Hiroki Kondo, ''Kenji Ishi... --Crystallographic and electrical properties of semicondu... ---International Conference on Solid State Devices and Ma... -153) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo... --Polymer surface modification: real-time in situ electro... ---58th International Symposium on American Vacuum Societ... -154) Shang Chen, Yi Lu, Kometani Ryousuke, Keigo Takeda,... --Room temperature radical annealing of plasma damaged ga... ---58th International Symposium on American Vacuum Societ... -155) Fengdong Jia, Keigo Takeda, ''Kenji Ishikawa'', Hir... --High performance of 60-Hz atmospheric pressure plasma: ... ---58th International Symposium on American Vacuum Societ... -156) Yudai Miyawaki, Yusuke Kondo, Kohei Asano, Makoto S... --Mechanism of highly selective SiO2 etching over Si3N4, ... ---58th International Symposium on American Vacuum Societ... -157) Atsushi Fukushima, Yusuke Abe, Keigo Takeda, Hiroki... --(Poster award) Relationship between radicals in gas pha... ---15th International Conference on Thin Films (ICTF 2011... -158) Jun Kuki, Leyong Yu, Hiroki Kondo, ''Kenji Ishikawa... --Effects of rf bias on structural properties of amorphou... ---15th International Conference on Thin Films (ICTF 2011... -159) S. Tomiya, M. Minami, ''Kenji Ishikawa'', S. Izumi,... --Plasma induced damage to InGaN single quantum well. ---International Symposium on Dry Process (DPS), Kyoto, N... -160) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --(Young Researcher Award) Real-time / in-situ electron s... ---International Symposium on Dry Process (DPS), Kyoto, N... -161) Kohei Asano, Hiroshi Yamamoto, Yudai Miyawaki, Keig... --Inhibition of roughness formation on 193 nm photoresist... ---International Symposium on Dry Process (DPS), Kyoto, N... -162) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigation for Si chemical dry etch... ---International Symposium on Dry Process (DPS), Kyoto, N... -163) Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, ''Kenji... --Clarification of highly selective SiO2 etching mechanis... ---International Symposium on Dry Process (DPS), Kyoto, N... -164) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Hir... --Study on photoresist surface modification induced by fl... ---International Symposium on Dry Process (DPS), Kyoto, N... -165) Shinpei Amasaki, Takuya Takeuchi, Keigo Takeda, ''K... --Investigation of reaction mechanism at sidewall of thro... ---International Symposium on Dry Process (DPS), Kyoto, N... -166) Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, ''Kenji... --Modeling of C3F6O/Ar plasma chemistry for SiO2 etching ... ---International Symposium on Dry Process (DPS), Kyoto, N... -167) Tatsuya Komuro, Keigo Takeda, ''Kenji Ishikawa'', M... --Spatial distribution of electron density in dc-superpos... ---International Symposium on Dry Process (DPS), Kyoto, N... -168) Ryusuke Kometani, Shang Chen, Y. Lu, ''Kenji Ishika... --Investigation of GaN exposed to plasma at high temperat... ---International Symposium on Dry Process (DPS), Kyoto, N... -169) Yusuke Abe, Atsushi Fukushima, Ya Lu, Keigo Takeda,... --Behavior of radicals in SiH4/H2 plasma for fabrication ... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -170) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, ''K... --Study on modification process of photoresist by fluoroc... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -171) Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Mechanism of highly selective SiO2 etching over Si usin... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -172) Takehiro Hiraoka, Noboru Ebizuka, Keigo Takeda, Tak... --Evaluation of Penicillium digitatum sterilization using... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -173) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigation for chemical dry etching... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -174) Keigo Takeda, Masanori Kato, ''Kenji Ishikawa'', Ma... --Quantitatively investigation of activated species gener... ---4th International Symposium of Plasma Center for Indus... -175) ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Mak... --Surface and interface analysis for plasma processing. ---4th International Symposium of Plasma Center for Indus... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

終了行:
#include(MenuTab1,notitle) 2011年の国際会議リスト -95) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo ... --(''INVITED'') Real-time electron-spin-resonance study ... ---12th International Workshop of Advanced Plasma Process... -96) T. Hiraoka, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Study of terahertz time domain spectroscopy for biologi... ---12th International Workshop of Advanced Plasma Process... -97) S. Iseki, T. Ohta, M. Ito, H. Kano, K. Takeda, ''Ken... --Effect of reactive oxygen species on Penicillium digita... ---12th International Workshop of Advanced Plasma Process... -98) Masaru Hori, ''Kenji Ishikawa'', Keigo Takeda, and S... --Insight into plasma nano-interface with organic materia... ---2nd International Workshop on Plasma Nano-interface an... -99) ''Kenji Ishikawa'', Shang Chen, Ryosuke Kometani, Hi... --Nitrogen radical annealing recovery of etch-induced-dam... ---3rd International Symposium on Advance Plasma Science ... -100) Ryosuke Kometani, Shang Chen, ''Kenji Ishikawa'', H... --Interaction of gallium nitride (GaN) surface with chlor... ---3rd International Symposium on Advance Plasma Science ... -101) Shang Chen, Ryosuke Kometani, ''Kenji Ishikawa'', H... --Deep level defect in GaN after plasma beam etching. ---3rd International Symposium on Advance Plasma Science ... -102) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --Real-time electron-spin-resonance measurement of plasma... ---3rd International Symposium on Advance Plasma Science ... -103) T. Hiraoka, K. Takeda, ''Kenji Ishikawa'', H. Kondo... --Measurement of optical properties of carbon-based mater... ---3rd International Symposium on Advance Plasma Science ... -104) Noboru Ebizuka, Hiroki Kondo, ''Kenji Ishikawa'', M... --Plasma nano-technologies for fabrications of VPH gratin... ---3rd International Symposium on Advance Plasma Science ... -105) Yusuke Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishik... --SiO2 plasma etching process using alternative gas, C3F6O. ---3rd International Symposium on Advance Plasma Science ... -106) Sho Kawashima, Yusuke Abe, Keigo Takeda, ''Kenji Is... --Crystallinity control of microcrystalline silicon film ... ---3rd International Symposium on Advance Plasma Science ... -107) Yusuke Abe, Keigo Takeda, ''Kenji Ishikawa'', Hirok... --Surface loss probability of hydrogen radical in SiH4/H2... ---3rd International Symposium on Advance Plasma Science ... -108) H. Shimoeda, H. Kondo, K. Takeda, ''Kenji Ishikawa'... --Effects of substrate temperatures on crystallographic c... ---3rd International Symposium on Advance Plasma Science ... -109) M. Kato, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M... --Three dimensional distribution of atomic radical in non... ---3rd International Symposium on Advance Plasma Science ... -110) Tatsuya Hagino, H. Kano, ''Kenji Ishikawa'', K. Tak... --High-speed synthesis of nano-graphene by in-liquid plas... ---3rd International Symposium on Advance Plasma Science ... -111) Fendong Jia, N. Sumi, ''Kenji Ishikawa'', H. Kano, ... --Measurement of the electron temperature and density of ... ---3rd International Symposium on Advance Plasma Science ... -112) Sachiko Iseki, T. Ohta, M. Ito, H. Kano, K. Takeda,... --O radical measurement in Penicillium digitatum inactiva... ---3rd International Symposium on Advance Plasma Science ... -113) A. Malinowski, Masaru Hori, Makoto Sekine, ''Kenji ... --Radical flux modeling and analysis for sticking coeffic... ---3rd International Symposium on Advance Plasma Science ... -114) Takuya Takeuchi, S. Amasaki, K. Takeda, ''Kenji Ish... --In situ XPS analysis of surface modification on ArF pho... ---3rd International Symposium on Advance Plasma Science ... -115) Yudai Miyawaki, Y. Kondo, H. Yamamoto, K. Takeda, '... --C5HF7 chemistry for highly selective etch of SiO2 over ... ---3rd International Symposium on Advance Plasma Science ... -116) Toshiya Suzuki, K. Takeda, H. Kondo, ''Kenji Ishika... --Sub-nm scale control of etched-profile-fluctuations in ... ---3rd International Symposium on Advance Plasma Science ... -117) Shinpei Amasaki, T. Takeuchi, K. Takeda, ''Kenji Is... --Study of Si etch reaction with F and O radicals using S... ---3rd International Symposium on Advance Plasma Science ... -118) Kohei Asano, H. Yamamoto, K. Takeda, ''Kenji Ishika... --In-situ FTIR analysis of porous low-k films exposed to ... ---3rd International Symposium on Advance Plasma Science ... -119) Sho Kawashima, Y. Abe, K. Takeda, ''Kenji Ishikawa'... --Crystallinity control of microcrystalline silicon film ... ---3rd International Symposium on Advance Plasma Science ... -120) Tokushige Kino, H. Kondo, ''Kenji Ishikawa'', Makot... --Synthesis of amorphous carbon films employing radical-i... ---3rd International Symposium on Advance Plasma Science ... -121) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --Real-time/in-situ electron-spin-resonance analysis of s... ---4th International Conference on PLAsma-Nano Technology... -122) Shinpei Amasaki, T. Takeuchi, K. Takeda, ''Kenji Is... --Investigation of Si etch reaction with F and O radicals... ---4th International Conference on PLAsma-Nano Technology... -123) Yusuke Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishik... --Chemical modeling of etch process using C3F6O alternati... ---4th International Conference on PLAsma-Nano Technology... -124) A. Malinowski, Makoto Sekine, Masaru Hori, ''Kenji ... --Investigation of surface reactions in ArF photoresist b... ---4th International Conference on PLAsma-Nano Technology... -125) T. Kanda, H. Kondo, K. Yamakawa, M. Hiramatsu, K. T... --Control of bridging growth and electrical properties of... ---4th International Conference on PLAsma-Nano Technology... -126) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Dissociations of alternate etching gases in reactive pl... ---4th International Conference on PLAsma-Nano Technology... -127) M. Kato, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M... --Gas phase reaction of activated species in O2/Ar nonequ... ---4th International Conference on PLAsma-Nano Technology... -128) Shang Chen, Y. Lu, R. Kometani, K. Takeda, ''Kenji ... --Passivation of plasma damaged GaN with hydrogen radical... ---4th International Conference on PLAsma-Nano Technology... -129) Fendong Jia, K. Takeda, ''Kenji Ishikawa'', H. Inui... --Measurement of atomic oxygen in ultrahigh density 60 Hz... ---4th International Conference on PLAsma-Nano Technology... -130) Y. Lu, S. Chen, R. Kometani, ''Kenji Ishikawa'', H.... --Surface analysis of GaN irradiated by Cl2 plasma beam. ---4th International Conference on PLAsma-Nano Technology... -131) Tatsuya Hagino, Hiroyuki Kano, ''Kenji Ishikawa'', ... --Synthesis of nano-graphene by plasma in liquid ethanol. ---4th International Conference on PLAsma-Nano Technology... -132) Toshiya Suzuki, S. Mitsuguti, A. Malinowski, Keigo ... --Subnanometer-scale control of feature size and shape in... ---International Conference on Microelectronics and Plasm... -133) Hiroki Kondo, Tatsuya Hagino, ''Kenji Ishikawa'', K... --Growth processes and crystallographic properties of nan... ---International Conference on Microelectronics and Plasm... -134) ''Kenji Ishikawa'', N. Sumi, A. Kono, H. Horibe, K.... --(INVITED) Real-time electron-spin-resonance study of pl... ---13th International Workshop on Advanced Plasma Process... -135) Shang Chen, Yi Lu, Ryousuke Kometani, ''Kenji Ishik... --Recovery of plasma-damaged GaN by atomic nitrogen and h... ---13th International Workshop on Advanced Plasma Process... -136) Hironao Shimoeda, Hiroki Kondo, ''Kenji Ishikawa'',... --Effects of oxygen radical irradiation on crystalline st... ---13th International Workshop on Advanced Plasma Process... -137) Masaru Hori, ''Kenji Ishikawa'', Naoya Sumi, Akihik... --Real time electron-spin-rresonace (ESR) study of plasma... ---The 20th International Symposium on Plasma Chemistry (... -138) Keigo Takeda, Masanori Kato, ''Kenji Ishikawa'', Hi... --Spatial distribution of atomic radical generated by ac ... ---The 20th International Symposium on Plasma Chemistry (... -139) Keigo Takeda, Hirotoshi Inui, ''Kenji Ishikawa'', H... --Behavior of hydrogen radical on reduction of copper oxi... ---30th International Conference on Phenomena in Ionized ... -140) Masaru Hori, Yusuke Abe, Keigo Takeda, ''Kenji Ishi... --Surface reaction of hydrogen radical on plasma enhanced... ---30th International Conference on Phenomena in Ionized ... -141) A. Malinowski, M. Sekine, M. Hori, ''Kenji Ishikawa... --Sticking coefficient of hydrogen radicals on ArF resist... --- 2011 International Conference on Simulation of Semico... -142) Makoto Sekine, Yudai Miyawaki, Yusuke Kondo, Keigo ... --(INVITED) Mechanism of highly selective SiO2 etching ov... ---4th International conference on advanced plasma techno... -143) A. Malinowski, Masaru Hori, Makoto Sekine, ''Kenji ... --Development of radical kinetic behavior investigation m... ---ESSDERC2011, (Finlandia Hall, Sep. 12-16, 2011), P-26. -144) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo... --(INVITED) In situ ESR measurements for revealing plasma... ---Asian-European International Conference on Plasma Surf... -145) Fengdong Jia, Keigo Takeda, ''Kenji Ishikawa'', Hir... --Highly spatial mapping of atomic oxygen density in a 60... ---Asian-European International Conference on Plasma Surf... -146) Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, ''Kenji... --Modeling of C3F6O/Ar plasma chemistry for SiO2 etching ... ---Asian-European International Conference on Plasma Surf... -147) Hiroshi Yamamoto, Kohei Asano, ''Kenji Ishikawa'', ... --In situ analysis of plasma-induced modification on poro... ---International Conference on Solid State Devices and Ma... -148) Yusuke Abe, Atsushi Fukushima, Y. Lu, Keigo Takeda,... --Effect of hydrogen radical-injection on growth property... ---International Conference on Solid State Devices and Ma... -149) Y. Lu, Shang Chen, Ryosuke Kometani, Keigo Takeda, ... --Plasma-induced damage of gan and its recovery by atomic... ---International Conference on Solid State Devices and Ma... -150) Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Field emission properties of 10-nm pillars of organics ... ---International Conference on Solid State Devices and Ma... -151) T. Hagino, Hiroki Kondo, Hiroyuki Kano, ''Kenji Ish... --Ultrafast synthesis of nanographene employing an ultrah... ---International Conference on Solid State Devices and Ma... -152) H. J. Cho, Keigo Takeda, Hiroki Kondo, ''Kenji Ishi... --Crystallographic and electrical properties of semicondu... ---International Conference on Solid State Devices and Ma... -153) ''Kenji Ishikawa'', Naoya Sumi, Akihiko Kono, Hideo... --Polymer surface modification: real-time in situ electro... ---58th International Symposium on American Vacuum Societ... -154) Shang Chen, Yi Lu, Kometani Ryousuke, Keigo Takeda,... --Room temperature radical annealing of plasma damaged ga... ---58th International Symposium on American Vacuum Societ... -155) Fengdong Jia, Keigo Takeda, ''Kenji Ishikawa'', Hir... --High performance of 60-Hz atmospheric pressure plasma: ... ---58th International Symposium on American Vacuum Societ... -156) Yudai Miyawaki, Yusuke Kondo, Kohei Asano, Makoto S... --Mechanism of highly selective SiO2 etching over Si3N4, ... ---58th International Symposium on American Vacuum Societ... -157) Atsushi Fukushima, Yusuke Abe, Keigo Takeda, Hiroki... --(Poster award) Relationship between radicals in gas pha... ---15th International Conference on Thin Films (ICTF 2011... -158) Jun Kuki, Leyong Yu, Hiroki Kondo, ''Kenji Ishikawa... --Effects of rf bias on structural properties of amorphou... ---15th International Conference on Thin Films (ICTF 2011... -159) S. Tomiya, M. Minami, ''Kenji Ishikawa'', S. Izumi,... --Plasma induced damage to InGaN single quantum well. ---International Symposium on Dry Process (DPS), Kyoto, N... -160) Naoya Sumi, ''Kenji Ishikawa'', Akihiko Kono, Hideo... --(Young Researcher Award) Real-time / in-situ electron s... ---International Symposium on Dry Process (DPS), Kyoto, N... -161) Kohei Asano, Hiroshi Yamamoto, Yudai Miyawaki, Keig... --Inhibition of roughness formation on 193 nm photoresist... ---International Symposium on Dry Process (DPS), Kyoto, N... -162) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigation for Si chemical dry etch... ---International Symposium on Dry Process (DPS), Kyoto, N... -163) Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, ''Kenji... --Clarification of highly selective SiO2 etching mechanis... ---International Symposium on Dry Process (DPS), Kyoto, N... -164) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Hir... --Study on photoresist surface modification induced by fl... ---International Symposium on Dry Process (DPS), Kyoto, N... -165) Shinpei Amasaki, Takuya Takeuchi, Keigo Takeda, ''K... --Investigation of reaction mechanism at sidewall of thro... ---International Symposium on Dry Process (DPS), Kyoto, N... -166) Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, ''Kenji... --Modeling of C3F6O/Ar plasma chemistry for SiO2 etching ... ---International Symposium on Dry Process (DPS), Kyoto, N... -167) Tatsuya Komuro, Keigo Takeda, ''Kenji Ishikawa'', M... --Spatial distribution of electron density in dc-superpos... ---International Symposium on Dry Process (DPS), Kyoto, N... -168) Ryusuke Kometani, Shang Chen, Y. Lu, ''Kenji Ishika... --Investigation of GaN exposed to plasma at high temperat... ---International Symposium on Dry Process (DPS), Kyoto, N... -169) Yusuke Abe, Atsushi Fukushima, Ya Lu, Keigo Takeda,... --Behavior of radicals in SiH4/H2 plasma for fabrication ... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -170) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, ''K... --Study on modification process of photoresist by fluoroc... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -171) Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Mechanism of highly selective SiO2 etching over Si usin... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -172) Takehiro Hiraoka, Noboru Ebizuka, Keigo Takeda, Tak... --Evaluation of Penicillium digitatum sterilization using... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -173) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigation for chemical dry etching... ---64th Annual Gaseous Electronics Conference (GEC), (Sal... -174) Keigo Takeda, Masanori Kato, ''Kenji Ishikawa'', Ma... --Quantitatively investigation of activated species gener... ---4th International Symposium of Plasma Center for Indus... -175) ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Mak... --Surface and interface analysis for plasma processing. ---4th International Symposium of Plasma Center for Indus... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

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