Manuscript のバックアップの現在との差分(No.118)

#author("2024-03-29T09:43:53+09:00","default:ishikawa","ishikawa")
#author("2024-04-13T08:41:38+09:00","default:ishikawa","ishikawa")
[[Publication]]

*Forthcoming articles

// In-plane orientation of carbon nanowalls induced by oblique angle irradiation by ions during plasma-enhanced chemical vapor deposition
-[297] TBD
--to be submitted
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

// JVB Future of Plasma Etching for Microelectronics: Challenges and Opportunities
-[296] TBD
--to be submitted
---Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, ''Kenji Ishikawa'', Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek

// Advanced Engineering Materials   Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review
-[295] (Invited review) TBD
--to be submitted
---''Kenji Ishikawa''

// JVA R In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching
// SR Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by REMOCVD (Radical-Enhanced Metalorganic Chemical Vapor Deposition) without using ammonia gas
-[294] TBD
--to be submitted
---Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori 

// SR Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by REMOCVD (Radical-Enhanced Metalorganic Chemical Vapor Deposition) without using ammonia gas
-[293] TBD
--to be submitted
---Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori

//JACS  Cryogenic Etching of SiO2 Using Hydrogen-containing Fluorocarbon Gases Based on Pseudo-Wet Plasma Mechanism
-[292] TBD
-[293] TBD
--to be submitted
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 

// 
-[291] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
-[292] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
--under review. Research Square [[(Preprint):https://doi.org/10.21203/rs.3.rs-2010278/v1]] 
---Camelia Miron, Satoshi Kashiwagura, Nikolay Britun, Daiki Ito, Naoyuki Iwata, Yang Liu, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, Hiroshi Hashizume, Hiroki Kondo, ''Kenji Ishikawa'', Hiromasa Tanaka, and Masaru Hori

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*Just as accepted 

-[290] Nitrogen admixture effects on growth characteristics and properties of carbon nanowalls
--Thin Solid Films (2024). [[(SSRN Preprint):https://doi.org/10.2139/ssrn.4606947]]
---Peter Raj Dennis Christy, Ngo Van Nong, Nikolay Britun, Ngo Quang Minh, Thi-Thuy-Nga Nguyen, Hiroki Kondo, Osamu Oda, ''Kenji Ishikawa'' and Masaru Hori
-[291] In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching
--Journal of the Vacuum Science and Technologies A 42, (2024).　[[(DOI):https://doi.org/10.1116/6.0003432]]
---Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori 

-[289] Growth and characterization of carbon nanowalls synthesized at low temperature of 225 C by radical injection plasma-enhanced chemical vapor deposition
--Vacuum (2024). 
---Ngo Quang Minh, Ngo Van Nong, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori

-[288] Dissociative properties of C4F6 obtained using computational chemistry
--Japanese Journal of Applied Physics (2024). [[(DOI):https://doi.org/10.35848/1347-4065/ad3166]]
---Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori

-[P] Editorial: Low-temperature Plasma as a Strategy to Achieve SDGs
--Free Radical Research (2023) [[(DOI):https://doi.org/10.1080/10715762.2023.2297343]]
---Hiromasa Tanaka, ''Kenji Ishikawa'', and Shinya Toyokuni

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*Published online 

-[287] Inhibition of glutamine metabolism increases sensitivity to plasma-activated medium-induced cytotoxicity
-[290] Inhibition of glutamine metabolism increases sensitivity to plasma-activated medium-induced cytotoxicity
--Free Radical Research 58, (2024). [[(DOI):https://doi.org/10.1080/10715762.2024.2332343]]
---Shu Tanaka, Sae Hayashi, Tomohiro Otsuka, Tetsuro Kamiya, ''Kenji Ishikawa'', and Hirokazu Hara

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[[CRediT:https://www.elsevier.com/authors/journal-authors/policies-and-ethics/credit-author-statement]] from authorship to contributorship [[detail:https://onlinelibrary.wiley.com/doi/full/10.1002/leap.1210]]

1. Conceptualization, 2. Data curation, 3. Formal Analysis, 4. Funding acquisition, &color(black,yellow){5. Investigation};, 6. Methodology, 7. Project administration, 8. Resources, 9. Software, &color(black,yellow){10, Supervision};, 11. Validation, 12. Visualization, &color(white,red){13. Writing – original draft};, &color(white,orange){14. Writing – review & editing};

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