Manuscript のバックアップの現在との差分(No.88)

#author("2023-11-11T19:40:15+09:00","default:ishikawa","ishikawa")
#author("2024-04-13T08:41:38+09:00","default:ishikawa","ishikawa")
[[Publication]]

*Forthcoming articles

// Environmental Technology & Innovation
-[287] TBD
// In-plane orientation of carbon nanowalls induced by oblique angle irradiation by ions during plasma-enhanced chemical vapor deposition
-[297] TBD
--to be submitted
---Naoyuki Iwata, ''Kenji Ishikawa'', Yasuhiro Nishikawa, Hiroyuki Kato, Motoyuki Shimizu, Masashi Kato, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

// Thin Solid Film  Nitrogen admixture effects on growth characteristics and properties of carbon nanowalls
-[286] TBD
// JVB Future of Plasma Etching for Microelectronics: Challenges and Opportunities
-[296] TBD
--to be submitted
--- Peter Raj Dennis Christy, Nikolay Britun, Minh Ngo Quang, Thi-Thuy-Nga Nguyen, Hiroki Kondo, Osamu Oda, ''Kenji Ishikawa'' and Masaru Hori
---Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, ''Kenji Ishikawa'', Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek

// Advanced Engineering Materials   Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review
-[295] (Invited review) TBD
--to be submitted
---''Kenji Ishikawa''

// SR Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by REMOCVD (Radical-Enhanced Metalorganic Chemical Vapor Deposition) without using ammonia gas
-[294] TBD
--to be submitted
---Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori

//JACS  Cryogenic Etching of SiO2 Using Hydrogen-containing Fluorocarbon Gases Based on Pseudo-Wet Plasma Mechanism
-[293] TBD
--to be submitted
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 

// 
-[285] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
-[292] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
--under review. Research Square [[(Preprint):https://doi.org/10.21203/rs.3.rs-2010278/v1]] 
---Camelia Miron, Satoshi Kashiwagura, Nikolay Britun, Daiki Ito, Naoyuki Iwata, Yang Liu, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, Hiroshi Hashizume, Hiroki Kondo, ''Kenji Ishikawa'', Hiromasa Tanaka, and Masaru Hori

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*Just as accepted 

-[284]  An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases
--Applied Physics Letters 123 pp. 1-6 (2023) [[(DOI):https://doi.org/10.1063/5.0173553]]
---Shih-Nan Hsiao, Makoto Sekine, ''Kenji Ishikawa'', Yuki Iijima, Yoshinobu Ohya, and Masaru Hori
-[291] In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching
--Journal of the Vacuum Science and Technologies A 42, (2024).　[[(DOI):https://doi.org/10.1116/6.0003432]]
---Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori 

-[283] &color(white,red){OPEN};    Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching
--Applied Surface Science 158876 pp. 1-6 (2024) [[(DOI):https://doi.org/10.1016/j.apsusc.2023.158876]]
---''Kenji Ishikawa'', Thi-Thuy-Nga Nguyen, Yuta Aoki, Hiroyasu Sato, Junichi Kawakami, Shuji Tsuno, Shin-Nan Hsiao, and Masaru Hori
-[P] Editorial: Low-temperature Plasma as a Strategy to Achieve SDGs
--Free Radical Research (2023) [[(DOI):https://doi.org/10.1080/10715762.2023.2297343]]
---Hiromasa Tanaka, ''Kenji Ishikawa'', and Shinya Toyokuni

-[J] 総説：プラズマなどで処理された水の多様性  Preface: Diversity of water activated by low temperature plasma, etc.
--静電気学会誌 47巻 6号 1 (2023)
---''石川健治'' Kenji Ishikawa

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*Published online 

-[290] Inhibition of glutamine metabolism increases sensitivity to plasma-activated medium-induced cytotoxicity
--Free Radical Research 58, (2024). [[(DOI):https://doi.org/10.1080/10715762.2024.2332343]]
---Shu Tanaka, Sae Hayashi, Tomohiro Otsuka, Tetsuro Kamiya, ''Kenji Ishikawa'', and Hirokazu Hara

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[[CRediT:https://www.elsevier.com/authors/journal-authors/policies-and-ethics/credit-author-statement]] from authorship to contributorship [[detail:https://onlinelibrary.wiley.com/doi/full/10.1002/leap.1210]]

1. Conceptualization, 2. Data curation, 3. Formal Analysis, 4. Funding acquisition, &color(black,yellow){5. Investigation};, 6. Methodology, 7. Project administration, 8. Resources, 9. Software, &color(black,yellow){10, Supervision};, 11. Validation, 12. Visualization, &color(white,red){13. Writing – original draft};, &color(white,orange){14. Writing – review & editing};

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