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2013年の国際会議リスト

-299) ''Kenji Ishikawa'', Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T. Hayashi, M. Sekine, and M. Hori.
--(PLENARY) Plasma-surface interactions in plasma etching of future device fabrication.
---The 16th International Workshop on Advanced Plasma Processing and Diagnostics, January 25 - 27, 2013, (Okazaki Conference Center, Okazaki, Japan)
-300) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, and M. Hori.
--Radical density control in H2/N2 plasma based on in-situ monitoring with vacuum ultra violet absorption spectroscopy.
---The 16th International Workshop on Advanced Plasma Processing and Diagnostics, January 25 - 27, 2013, (Okazaki Conference Center, Okazaki, Japan)
-301) H. Shimoeda, H. Kondo, ''Kenji Ishikawa'', H. Mineo, M. Sekine and M. Hori.
--Effects of hydroxyl radicals on crystallographic and electronic structures of carbon nanowalls.
---The 16th International Workshop on Advanced Plasma Processing and Diagnostics, January 25 - 27, 2013, (Okazaki Conference Center, Okazaki, Japan)
-302) Haorang Wang, ''Kenji Ishikawa'', Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--Real-time/in-situ electron spin resonance analysis of plasma surface interactions.
---The 16th International Workshop on Advanced Plasma Processing and Diagnostics, January 25 - 27, 2013, (Okazaki Conference Center, Okazaki, Japan)
-303) Jia-Dong Cao, Yi Lu, Ryosuke Kometani, Jong-Yun Park, ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--Etching characteristics of AlGaN in inductively coupled Cl2 plasmas.
---The 16th International Workshop on Advanced Plasma Processing and Diagnostics, January 25 - 27, 2013, (Okazaki Conference Center, Okazaki, Japan)
-304) R. Kometani, S. Chen, M. Liu, ''Kenji Ishikawa'', H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, M. Hori.
--High temperature plasma etching of GaN.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), Tha-A03OA
-305) J. Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, M. Hori.
--Application of atmospheric pressure plasma in element analysis of agricultural products.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1003A
-306) H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, H. Toyoda, M. Hori.
--High H radical density produced by 1-m-length atmospheric pressure microwave plasma system.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1013A
-307) T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Ohta, H. Kondo, ''Kenji Ishikawa'', M. Ito, M. Sekine, M. Hori.
--Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1022A
-308) T. Tsutsumi, T. Hiraoka, K. Takeda, ''Kenji Ishikawa'', T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori.
--Real time temperature measurements of film-covered-substrate employing Fourier domain low coherence interferometer during plasma processes.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1023A
-309) T. Komuro, K. Takeda, ''Kenji Ishikawa'', M. Sekine, H. Kondo, M. Hori.
--Absolute density of fluorine atom in capacitively coupled plasma employing hydro-fluorocarbon gases for highly selective SiO2 etching.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1028A
-310) Y. Abe, A. Fukushima, Y. Kim, K. Takeda, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Cavity ring down measurements of SiH3-behavior in SiH4/H2 plasma.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1031A
-311) T. Horibe, H. Kondo, H. Kano, ''Kenji Ishikawa'', M. Sekine, M. Hiramatsu, M. Hori.
--Formation and characteristics of Pt-Au nanoparticles supported on carbon nanowalls (CNWs) employing a supercritical fluid.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1060A
-312) H. Shimoeda, H. Kondo, K. Takeda, ''Kenji Ishikawa'', M. Hiramatsu, M. Sekine, M. Hori.
--Effects of morphological changes induced by hydrogen peroxide treatment on electrical properties of carbon nanowalls.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1061A
-313) H. Cho, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hiramatsu, M. Hori.
--Crystallographic and electrical properties of vertically-grown graphene sheets by CH4/H2 plasma.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1064A
-314) L. Yu, J. Kuki, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Effect of Ar gas addition on photoconductive characteristics of amorphous carbon films synthesized by plasma-enhanced chemical vapor deposition.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P1067A
-315) K. Sun, K. Takeda, S. Tajima, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori, H. Itoh.
--Construction of atmospheric pressure mist chemical vapor deposition technology for the all-printed electronic technology.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P2020A
-316) A. Fukushima, Y. Lu, Y. Abe, K. Takeda, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Relation between gaseous radicals and μc-Si film property in SiH4/H2 plasma CVD.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P2026A
-317) L. Ya, A. Fukushima, Y. Abe, Y. Kim, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, M. Hori.
--Hydrogen radical injection plasma deposition of (110)-preferentially oriented microcrystalline silicon films.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P2036A
-318) Y. Lu, A. Kobayashi, Y. Kim, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Study on precursor adsorption and reaction within SiO2 growth cycle of low temperature plasma-enhanced atomic layer deposition using in situ ATR-FTIR.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P2075A
-319) J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Effect of boron doping on crystalline structures and electrical properties of amorphous carbon films grown by radical-injection plasma enhanced chemical vapor deposition.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P2077C
-320) M. Sekine, S. Amasaki, T. Takeuchi, ''Kenji Ishikawa'', K. Takeda, H. Kondo, M. Hori.
--Investigation of Si etch reaction with F and O radicals using SF6/O2 plasma.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3001A
-321) Z. Liu, S. Chen, Y. Lu, R. Kometani, ''Kenji Ishikawa'', H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori.
--Sequential exposure of N and H atoms for recovery of plasma-damaged GaN.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3003A
-322) T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. Keudell, ''Kenji Ishikawa'', H. Kondo, K. Takeda, M. Sekine, M. Hori.
--Real-time variation of sputtering yield of Ar ion for ArF photoresist during Ar plasma exposure.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3004A
-323) S. Tajima, T. Hayashi, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--The change in surface morphology of Si at elevated temperature during the plasmaless Si etching with NO/F2 gas mixture.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3005A
-324) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, M. Hori.
--Subsequent temporal change of gaseous H and N radical density in H2/N2 plasma after air exposure and its control.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3006A
-325) Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, ''Kenji Ishikawa'', T. Hayashi, M. Sekine, M. Hori.
--Gas-phase reaction model of Ar-diluted CHxFy plasmas.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3007A
-326) A. Malinowski, T. Takeuchi, T. Suzuki, M. Hori, M. Sekine, H. Kondo, ''Kenji Ishikawa'', L. Lukasiak, A. Jakubowski.
--Investigation of sticking coefficent of hydrogen radical on ArF 193 nm chemically amplified resist.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3010A
-327) T. Hayashi, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Excitation dissociations of c-C5F8 and c-C5HF7 etching gases.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3011A
-328) J. Cao, R. Kometani, J. Park, ''Kenji Ishikawa'', K. Takeda, H. Kondo, M. Sekine, M. Hori.
--Low-damage, high-accuracy plasma etching of Ga-compound semiconductors.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3012A
-329) M. Ito, H. Hashizume, T. Ohta, F. Jia, K. Takeda, ''Kenji Ishikawa'', M. Hori.
--Dependence of exposure distance on inactivation of P. digitatum spores using low-temperature atmospheric pressure radical source.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3017A
-330) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K. Nakamura, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori.
--Plasma-activated medium selectively killed glioblastoma brain tumor cells and indueced apoptosis.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3022A
-331) ''Kenji Ishikawa'', H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori.
--Electron spin resonance study of plasma-biological surface interaction for food hygiene.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3025A
-332) H. Mizuno, ''Kenji Ishikawa'', H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori.
--Plasma-biological surface interaction investigated by electron spin resonance.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3027A
-333) H. Hashizume, T. Ohta, M. Ito, F. Jia, K. Takeda, ''Kenji Ishikawa'', M. Hori.
--Measurement of singlet oxygen molecule densities in the inactivation process of P. digitatum spores using low-temperature atmospheric pressure radical source.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3040A
-334) J. Jolibois, K. Takeda, H. Tanaka, ''Kenji Ishikawa'', M. Hori.
--Effect of biological solution on generation of radical species induced by nonequilibrium atmospheric pressure plasma.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P3051A
-335) H. Kondo, T. Hagino, ''Kenji Ishikawa'', H. Kano, M. Sekine, M. Hori.
--Study on mechanism of ultrahigh speed synthesis of high crystallinity nanographene employing in-liquid plasma.
---The 5th International Symposium on Advanced Plasma Science and its applications for nitrides and nanomaterials (ISPlasma), January 24-February 1, 2013, (Nagoya University, Aichi, Japan), P4011A
-336) Hiroshi Hashizume, T. Ohta, M. Ito, F. Jia, K. Takeda, ''Kenji Ishikawa'', M. Hori.
--Effects of reactive oxygen species on inactivation of Penicillium digitatum spores dependent on exposure distance using an atmospheric-pressureoxygen radical source.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), O-7
-337) J. S.Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Influence of N2 inclusion to Ar AP plasma in atomization.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), PA-10
-338) Y. Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishikawa'', H. Kondo, T. Hayashi, M. Sekine, M. Hori.
--Effects of hydrogen contained in fluorocarbon gas molecules fordielectric film etching process.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), PA-11
-339) T. Hayashi, ''Kenji Ishikawa'', M.Sekine, M. Hori.
--Dissociative properties of etching gases.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), PD-1
-340) R. Kometani, L. Michael, ''Kenji Ishikawa'', K. Takeda, H. Kondo, H. Amano, M. Sekine, M.Hori.
--Chlorine plasma etching of GaN at high temperature.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), PG-7
-341) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K.Nakamura, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori.
--Characterization of anti-tumor effect of glioblastoma brain tumor cellsby plasma-activated medium.
---The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013), February 2-3, 2013, (Gero-Synergy center, Gifu, Japan), PH-7
-342) Y. Miyawaki, Y. Kondo, K. Takeda, S. Tajima, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, A. Ito, H. Matsumoto, M. Hori.
--(INVITED) Reduction of surface roughness on ArF-photoresist by C5HF7 gas plasma.
---17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, (Sungkyunkwan University, Suwon & Hanhwa Resort Seorak, Sokcho, Republic of Korea, May 23-25, 2013).
-343) H. Hashizume, T. Ohta, F. Jia, K. Takeda, K. Ishikawa, M. Hori, M. Ito.
--(INVITED) Analysis of fungal spore inactivation based on measurements of reactive-oxygen-species densities.
---17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, (Sungkyunkwan University, Suwon & Hanhwa Resort Seorak, Sokcho, Republic of Korea, May 23-25, 2013).
-344) S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Hori.
--(INVITED) Si chemical dry etching using the reaction of NO and F2.
---17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, (Sungkyunkwan University, Suwon & Hanhwa Resort Seorak, Sokcho, Republic of Korea, May 23-25, 2013).
-345) L. Jia, J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M. Hori.
--Effect of boron doping on amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition.
---17th International Workshop on Advanced Plasma Processing and Diagnostics and 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, May 23-25, 2013 (Korea)
-346) Takayuki Ohta, Hiroshi Hashizume, Masafumi Ito, Keigo Takeda, ''Kenji Ishikawa'', and M. Hori.
--Inactivation of microorganisms in liquid exposed by oxygen radical source.
---XXXI International Conference on Phenomena in Ionized Gases (ICPIG), (Granada Congress Centre, Spain, July 14-19, 201), PS3-103
-347) Takayoshi Tsutsumi, Keigo Takeda, ''Kenji Ishikawa'', Takayuki Ohta, Masafumi Ito, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--Non-contact temperature measurements of film-covered-substrate during plasma processes.
---XXXI International Conference on Phenomena in Ionized Gases (ICPIG), (Granada Congress Centre, Spain, July 14-19, 201), PS4-013
-348) J. Kularatne, J. Jolibois, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori.
--Detection of metal elements in soil using atmospheric pressure plasma.
---The 12th Asia Pacific Physics Conference of AAPPS and The third Asia-Europe Physics Summit (APPP), International Conference Halls, Makuhari Messe Chiba, Japan , July 14-19, 2013), D2-PTu-10
-349) J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kondo, K. Ishikawa, M. Hori.
--Effect of Hexane on the synthesis of nanographene using liquid plasma.
---The 12th Asia Pacific Physics Conference of AAPPS and The third Asia-Europe Physics Summit (APPP), International Conference Halls, Makuhari Messe Chiba, Japan , July 14-19, 2013), D2-PTh-6
-350) H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori.
--Crystallographic and chemical modification of carbon nanowalls by radical oxidation.
---The 12th Asia Pacific Physics Conference of AAPPS and The third Asia-Europe Physics Summit (APPP), International Conference Halls, Makuhari Messe Chiba, Japan , July 14-19, 2013), A3-3-O4
-351) Masaru Hori, Yusuke Abe, Atsushi Fukushima, Ya Lu, Sho Kawashima, Keita Miwa, Keigo Takeda, Hiroki Kondo, ''Kenji Ishikawa'', and Makoto Sekine.
--Hydrogen radical-injection plasma fabricated microcrystalline silicon thin film for solar cells.
---21th International Symposium on Plasma Chemistry (ISPC), (Cairns Convention Centre, Australia, August 4-9, 2013)
-352) Hiromasa Tanaka, Masaaki Mizuno, ''Kenji Ishikawa'', Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru Hori .
--Plasma-activated medium induced apoptosis on glioblastoma brain tumor cells by inhibiting growth/survival signaling.
---21th International Symposium on Plasma Chemistry (ISPC), (Cairns Convention Centre, Australia, August 4-9, 2013)
-353) Hiroko Iguchi, Ryosuke Kometani, Michael Liu, Kenji Nakashima, Takahiro Kozawa, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--Effects of high temperature etching on GaN using by Cl2 plasma.
---10th International Conference on Nitride Semiconductors (ICNS10), (Wasington, USA, August 25-30, 2013), DP.1.20.
-354) Makoto Sekine, Zecheng Liu, Shang Chen, Ryosuke Kometani, ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, and Masaru Hori.
--Recovery of plasma-damaged GaN by in situ radical exposure.
---10th International Conference on Nitride Semiconductors (ICNS10), (Wasington, USA, August 25-30, 2013), AP.1.61.
-355) ''Kenji Ishikawa'', Ryosuke Kometani, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--Surface analysis of GaN at elevated substrate temperature.
---10th International Conference on Nitride Semiconductors (ICNS10), (Wasington, USA, August 25-30, 2013), AP.1.59.
-356) ''Kenji Ishikawa'', Hiromasa Tanaka, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--(INVITED) In-situ ESR measurements for plasma materials interactions.
---(AEPSE), 23-1
-357) ''Kenji Ishikawa'', Naoyuki Kurake, Hiromasa Tanaka, Takashi Kondo, Kae Nakamura, Hiroaki Kajiyama, Fumitaka kikkawa, Masaaki Mizono, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--(INVITED) Electron spin resonance study of plasma-liquid medium interactions.
---9th Asian-european International Conference On Plasma Surface Enginnering, Conference and Exhibition (AEPSE), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 25-30, 2013), 3-4I
-358) Yudai Miyawaki, Haoran Wang, ''Kenji Ishikawa'', Makoto Sekine, Keigo Takeda, Satomi Tajima, Hiroki Kondo, and Masaru Hori.
--Analysis of fluorocarbon gas plasma surface interactions using real-time / In-situ electron spin resonance.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), B-3.
-359) Takayuki Ohta, Takayoshi Tsutsumi, Keigo Takeda, ''Kenji Ishikawa'', Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito.
--Non-contact temperature monitoring of substrates using optical interferometry on plasma processing.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-12
-360) Satomi Tajima, Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--Fabricating the smooth etched Si surface for MEMS devices by the reaction of NO+F2 -> F + FNO.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-43
-361) Kuangda Sun, Keigo Takeda, Hitoshi Itoh, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--Low-temperature insulating film formation with plasma enhanced mist chemical vapor deposition.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-56
-362) Jerome Jolibois, Jagath Kularatna, Hiroyuki Kano, Masafumi Ito, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--Effect of hydrogen peroxide on carbon materials produced by gas-liquid plasma.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-57
-363) Yusuke Kondo, Yudai Miyawaki, ''Kenji Ishikawa'', Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori.
--Control of gas phase reaction in etching plasmas employing hydro-fluorocarbon gases.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-61
-364) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--Quantum chemical investigations for dissociation paths of fluoro-methane compounds.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-64
-365) Jongyun Park, Jiadong Cao, Zecheng Liu, Takashi Kako, ''Kenji Ishikawa'', Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
--Plasma etching of Ga-based compound semiconductor.
---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Jeju Hotel, Jeju, Korea, August 29-30, 2013), P-69
-366) Masaru Hori, Hiromasa Tanaka, Masaaki Mizuno, Kae Nakamura, Hiroaki Kajiyama, Keigo Takeda, ''Kenji Ishikawa'', Hiroyuki Kano, and Fumitaka Kikkawa.
--Plasma-activated medium induced apoptosis on tumor cells.
---66th Annual Gaseous Electronic Conference (GEC2013), (Westin Hotel Princeton, Princeton New Jersey, United States, September 30-4, 2013), LW3.00003
-367) Masafumi Ito, Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, ''Kenji Ishikawa'', and Masaru Hori.
--Reaction mechanism between cell membranes of P. digitatum spores and oxygen radicals.
---66th Annual Gaseous Electronic Conference (GEC2013), (Westin Hotel Princeton, Princeton New Jersey, United States, September 30-4, 2013), MR1.00053
-368) Keigo Takeda, ''Kenji Ishikawa'', Hiromasa Tanaka, Hiroyuki Kano, Makoto Sekine, and Masaru Hori.
--Measurement of activated species generated by AC power excited non-equilibrium atmospheric pressure Ar plasma jet with air engulfment.
---66th Annual Gaseous Electronic Conference (GEC2013), (Westin Hotel Princeton, Princeton New Jersey, United States, September 30-4, 2013), DT2.00004
-369) Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, ''Kenji Ishikawa'', Makoto Sekine, Azumi Ito, Hirokazu Matsumoto, and Masaru Hori.
--Reduction mechanism of surface roughness on ArF-photoresist using C5HF7 gas plasma.
---66th Annual Gaseous Electronic Conference (GEC2013), (Westin Hotel Princeton, Princeton New Jersey, United States, September 30-4, 2013), LW1.00005
-370) Takayoshi Tsutsumi, Takayuki Ohta, ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito.
-- Non-contact measurements of substrate-temperature by frequency-domain low-coherence interferometry.
---AVS 60th International Symposium & Exhibition, (Long Beach, California, USA, October 27-1, 2013), PS1-TuA-10 (17:00)
-371) Itsuko Sakai, Shinpei Amasaki, Takuya Takeuchi, Keigo Takeda, ''Kenji Ishikawa'', Hiroki Kondo, Makoto Sekine, Noriko Sakurai, Hisataka Hayashi, Tokuhisa Ohiwa, and Masaru Hori.
--Reaction mechanism at the sidewall of through Si via (TSV) etching by SF6/O2/SiF4 plasma.
---AVS 60th International Symposium & Exhibition, (Long Beach, California, USA, October 27-1, 2013), PS2-TuA-11 (17:20)
-372) Jia-Dong Cao, Yi Li, Ryosuke Kometani, Jong-Yun Park, ''Kenji Ishikawa'', Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori.
--Etching characteristics of AlGaN and GaN in inductively coupled Cl2 plasma.
---AVS 60th International Symposium & Exhibition, (Long Beach, California, USA, October 27-1, 2013), PS-TuP-11 (18:00)
-373) Takuya Takeuchi, Yan Zhang, ''Kenji Ishikawa'', Makoto Sekine, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, and Masaru Hori.
--Plasma induced surface roughness of ArF photoresist examined by plasma-beam processes.
---AVS 60th International Symposium & Exhibition, (Long Beach, California, USA, October 27-1, 2013), PS-WeM-2 (8:20)
-374) Ryosuke Kometani, ''Kenji Ishikawa'', Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori.
--High Temperature Etching of GaN preserving smooth and stoichiometric GaN surface.
---AVS 60th International Symposium & Exhibition, (Long Beach, California, USA, October 27-1, 2013), PS-ThA-6 (15:40)
-375) Masaru Hori, K. Takeda, H. Kondo, ''Kenji Ishikawa'', M.Sekine.
--(INVITED)  Advanced surface engineering on material processing employing ultrahigh density atmospheric pressure plasma.
---The 1st International Conference on Surface Engineering (ICSE2013), (Busan, Korea, November 18-21, 2013), THUAM03-2
-376) M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, ''Kenji Ishikawa'', H. Kondo, M. Sekine, M. Hori.
--(INVITED)  Advanced surface engineering on material processing employing ultrahigh density atmospheric pressure plasma.
---The 1st International Conference on Surface Engineering (ICSE2013), (Busan, Korea, , November 18-21, 2013), THUAM03-2
-377) T. Ohta, H. Hashizume, M. Ito, T. Takeda, K. Ishikawa, M. Hori.
--Gas phase diagnostics of atmospheric oxygen radical sourse on inactivation of P. digitatum spores.
---8th Asia-Pacfic International Symposium on the Basics and Applications of Plasma Technology, (Hsinchu, Taiwan, December 20-22, 2013). O10-03

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