ProceedingIntern13 をテンプレートにして作成

開始行:
#include(MenuTab1,notitle) 2013年の国際会議リスト -299) ''Kenji Ishikawa'', Y. Miyawaki, T. Takeuchi, K. Ta... --(PLENARY) Plasma-surface interactions in plasma etching... ---The 16th International Workshop on Advanced Plasma Pro... -300) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Radical density control in H2/N2 plasma based on in-sit... ---The 16th International Workshop on Advanced Plasma Pro... -301) H. Shimoeda, H. Kondo, ''Kenji Ishikawa'', H. Mineo... --Effects of hydroxyl radicals on crystallographic and el... ---The 16th International Workshop on Advanced Plasma Pro... -302) Haorang Wang, ''Kenji Ishikawa'', Hideo Horibe, Kei... --Real-time/in-situ electron spin resonance analysis of p... ---The 16th International Workshop on Advanced Plasma Pro... -303) Jia-Dong Cao, Yi Lu, Ryosuke Kometani, Jong-Yun Par... --Etching characteristics of AlGaN in inductively coupled... ---The 16th International Workshop on Advanced Plasma Pro... -304) R. Kometani, S. Chen, M. Liu, ''Kenji Ishikawa'', H... --High temperature plasma etching of GaN. ---The 5th International Symposium on Advanced Plasma Sci... -305) J. Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, ... --Application of atmospheric pressure plasma in element a... ---The 5th International Symposium on Advanced Plasma Sci... -306) H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, ''Kenj... --High H radical density produced by 1-m-length atmospher... ---The 5th International Symposium on Advanced Plasma Sci... -307) T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Oht... --Measurement of carbon nanowalls / silicon substrate tem... ---The 5th International Symposium on Advanced Plasma Sci... -308) T. Tsutsumi, T. Hiraoka, K. Takeda, ''Kenji Ishikaw... --Real time temperature measurements of film-covered-subs... ---The 5th International Symposium on Advanced Plasma Sci... -309) T. Komuro, K. Takeda, ''Kenji Ishikawa'', M. Sekine... --Absolute density of fluorine atom in capacitively coupl... ---The 5th International Symposium on Advanced Plasma Sci... -310) Y. Abe, A. Fukushima, Y. Kim, K. Takeda, H. Kondo, ... --Cavity ring down measurements of SiH3-behavior in SiH4/... ---The 5th International Symposium on Advanced Plasma Sci... -311) T. Horibe, H. Kondo, H. Kano, ''Kenji Ishikawa'', M... --Formation and characteristics of Pt-Au nanoparticles su... ---The 5th International Symposium on Advanced Plasma Sci... -312) H. Shimoeda, H. Kondo, K. Takeda, ''Kenji Ishikawa'... --Effects of morphological changes induced by hydrogen pe... ---The 5th International Symposium on Advanced Plasma Sci... -313) H. Cho, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M.... --Crystallographic and electrical properties of verticall... ---The 5th International Symposium on Advanced Plasma Sci... -314) L. Yu, J. Kuki, H. Kondo, ''Kenji Ishikawa'', M. Se... --Effect of Ar gas addition on photoconductive characteri... ---The 5th International Symposium on Advanced Plasma Sci... -315) K. Sun, K. Takeda, S. Tajima, H. Kondo, ''Kenji Ish... --Construction of atmospheric pressure mist chemical vapo... ---The 5th International Symposium on Advanced Plasma Sci... -316) A. Fukushima, Y. Lu, Y. Abe, K. Takeda, H. Kondo, '... --Relation between gaseous radicals and μc-Si film proper... ---The 5th International Symposium on Advanced Plasma Sci... -317) L. Ya, A. Fukushima, Y. Abe, Y. Kim, K. Takeda, ''K... --Hydrogen radical injection plasma deposition of (110)-p... ---The 5th International Symposium on Advanced Plasma Sci... -318) Y. Lu, A. Kobayashi, Y. Kim, H. Kondo, ''Kenji Ishi... --Study on precursor adsorption and reaction within SiO2 ... ---The 5th International Symposium on Advanced Plasma Sci... -319) J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'', M. Se... --Effect of boron doping on crystalline structures and el... ---The 5th International Symposium on Advanced Plasma Sci... -320) M. Sekine, S. Amasaki, T. Takeuchi, ''Kenji Ishikaw... --Investigation of Si etch reaction with F and O radicals... ---The 5th International Symposium on Advanced Plasma Sci... -321) Z. Liu, S. Chen, Y. Lu, R. Kometani, ''Kenji Ishika... --Sequential exposure of N and H atoms for recovery of pl... ---The 5th International Symposium on Advanced Plasma Sci... -322) T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. Keude... --Real-time variation of sputtering yield of Ar ion for A... ---The 5th International Symposium on Advanced Plasma Sci... -323) S. Tajima, T. Hayashi, ''Kenji Ishikawa'', M. Sekin... --The change in surface morphology of Si at elevated temp... ---The 5th International Symposium on Advanced Plasma Sci... -324) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Subsequent temporal change of gaseous H and N radical d... ---The 5th International Symposium on Advanced Plasma Sci... -325) Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, ''Kenji... --Gas-phase reaction model of Ar-diluted CHxFy plasmas. ---The 5th International Symposium on Advanced Plasma Sci... -326) A. Malinowski, T. Takeuchi, T. Suzuki, M. Hori, M. ... --Investigation of sticking coefficent of hydrogen radica... ---The 5th International Symposium on Advanced Plasma Sci... -327) T. Hayashi, ''Kenji Ishikawa'', M. Sekine, M. Hori. --Excitation dissociations of c-C5F8 and c-C5HF7 etching ... ---The 5th International Symposium on Advanced Plasma Sci... -328) J. Cao, R. Kometani, J. Park, ''Kenji Ishikawa'', K... --Low-damage, high-accuracy plasma etching of Ga-compound... ---The 5th International Symposium on Advanced Plasma Sci... -329) M. Ito, H. Hashizume, T. Ohta, F. Jia, K. Takeda, '... --Dependence of exposure distance on inactivation of P. d... ---The 5th International Symposium on Advanced Plasma Sci... -330) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K. Nakamu... --Plasma-activated medium selectively killed glioblastoma... ---The 5th International Symposium on Advanced Plasma Sci... -331) ''Kenji Ishikawa'', H. Mizuno, H. Tanaka, H. Hashiz... --Electron spin resonance study of plasma-biological surf... ---The 5th International Symposium on Advanced Plasma Sci... -332) H. Mizuno, ''Kenji Ishikawa'', H. Tanaka, H. Hashiz... --Plasma-biological surface interaction investigated by e... ---The 5th International Symposium on Advanced Plasma Sci... -333) H. Hashizume, T. Ohta, M. Ito, F. Jia, K. Takeda, '... --Measurement of singlet oxygen molecule densities in the... ---The 5th International Symposium on Advanced Plasma Sci... -334) J. Jolibois, K. Takeda, H. Tanaka, ''Kenji Ishikawa... --Effect of biological solution on generation of radical ... ---The 5th International Symposium on Advanced Plasma Sci... -335) H. Kondo, T. Hagino, ''Kenji Ishikawa'', H. Kano, M... --Study on mechanism of ultrahigh speed synthesis of high... ---The 5th International Symposium on Advanced Plasma Sci... -336) Hiroshi Hashizume, T. Ohta, M. Ito, F. Jia, K. Take... --Effects of reactive oxygen species on inactivation of P... ---The 6th International Conference on PLAsma Nanotechnol... -337) J. S.Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda... --Influence of N2 inclusion to Ar AP plasma in atomization. ---The 6th International Conference on PLAsma Nanotechnol... -338) Y. Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishikawa'... --Effects of hydrogen contained in fluorocarbon gas molec... ---The 6th International Conference on PLAsma Nanotechnol... -339) T. Hayashi, ''Kenji Ishikawa'', M.Sekine, M. Hori. --Dissociative properties of etching gases. ---The 6th International Conference on PLAsma Nanotechnol... -340) R. Kometani, L. Michael, ''Kenji Ishikawa'', K. Tak... --Chlorine plasma etching of GaN at high temperature. ---The 6th International Conference on PLAsma Nanotechnol... -341) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K.Nakamur... --Characterization of anti-tumor effect of glioblastoma b... ---The 6th International Conference on PLAsma Nanotechnol... -342) Y. Miyawaki, Y. Kondo, K. Takeda, S. Tajima, H. Kon... --(INVITED) Reduction of surface roughness on ArF-photore... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -343) H. Hashizume, T. Ohta, F. Jia, K. Takeda, K. Ishika... --(INVITED) Analysis of fungal spore inactivation based o... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -344) S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. H... --(INVITED) Si chemical dry etching using the reaction of... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -345) L. Jia, J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'... --Effect of boron doping on amorphous carbon films grown ... ---17th International Workshop on Advanced Plasma Process... -346) Takayuki Ohta, Hiroshi Hashizume, Masafumi Ito, Kei... --Inactivation of microorganisms in liquid exposed by oxy... ---XXXI International Conference on Phenomena in Ionized ... -347) Takayoshi Tsutsumi, Keigo Takeda, ''Kenji Ishikawa'... --Non-contact temperature measurements of film-covered-su... ---XXXI International Conference on Phenomena in Ionized ... -348) J. Kularatne, J. Jolibois, H. Kano, M. Ito, T. Ohta... --Detection of metal elements in soil using atmospheric p... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -349) J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kond... --Effect of Hexane on the synthesis of nanographene using... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -350) H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M... --Crystallographic and chemical modification of carbon na... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -351) Masaru Hori, Yusuke Abe, Atsushi Fukushima, Ya Lu, ... --Hydrogen radical-injection plasma fabricated microcryst... ---21th International Symposium on Plasma Chemistry (ISPC... -352) Hiromasa Tanaka, Masaaki Mizuno, ''Kenji Ishikawa''... --Plasma-activated medium induced apoptosis on glioblasto... ---21th International Symposium on Plasma Chemistry (ISPC... -353) Hiroko Iguchi, Ryosuke Kometani, Michael Liu, Kenji... --Effects of high temperature etching on GaN using by Cl2... ---10th International Conference on Nitride Semiconductor... -354) Makoto Sekine, Zecheng Liu, Shang Chen, Ryosuke Kom... --Recovery of plasma-damaged GaN by in situ radical expos... ---10th International Conference on Nitride Semiconductor... -355) ''Kenji Ishikawa'', Ryosuke Kometani, Keigo Takeda,... --Surface analysis of GaN at elevated substrate temperatu... ---10th International Conference on Nitride Semiconductor... -356) ''Kenji Ishikawa'', Hiromasa Tanaka, Hiroshi Hashiz... --(INVITED) In-situ ESR measurements for plasma materials... ---(AEPSE), 23-1 -357) ''Kenji Ishikawa'', Naoyuki Kurake, Hiromasa Tanaka... --(INVITED) Electron spin resonance study of plasma-liqui... ---9th Asian-european International Conference On Plasma ... -358) Yudai Miyawaki, Haoran Wang, ''Kenji Ishikawa'', Ma... --Analysis of fluorocarbon gas plasma surface interaction... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -359) Takayuki Ohta, Takayoshi Tsutsumi, Keigo Takeda, ''... --Non-contact temperature monitoring of substrates using ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -360) Satomi Tajima, Toshio Hayashi, ''Kenji Ishikawa'', ... --Fabricating the smooth etched Si surface for MEMS devic... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -361) Kuangda Sun, Keigo Takeda, Hitoshi Itoh, Hiroki Kon... --Low-temperature insulating film formation with plasma e... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -362) Jerome Jolibois, Jagath Kularatna, Hiroyuki Kano, M... --Effect of hydrogen peroxide on carbon materials produce... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -363) Yusuke Kondo, Yudai Miyawaki, ''Kenji Ishikawa'', T... --Control of gas phase reaction in etching plasmas employ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -364) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigations for dissociation paths ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -365) Jongyun Park, Jiadong Cao, Zecheng Liu, Takashi Kak... --Plasma etching of Ga-based compound semiconductor. ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -366) Masaru Hori, Hiromasa Tanaka, Masaaki Mizuno, Kae N... --Plasma-activated medium induced apoptosis on tumor cells. ---66th Annual Gaseous Electronic Conference (GEC2013), (... -367) Masafumi Ito, Hiroshi Hashizume, Takayuki Ohta, Kei... --Reaction mechanism between cell membranes of P. digitat... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -368) Keigo Takeda, ''Kenji Ishikawa'', Hiromasa Tanaka, ... --Measurement of activated species generated by AC power ... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -369) Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Reduction mechanism of surface roughness on ArF-photore... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -370) Takayoshi Tsutsumi, Takayuki Ohta, ''Kenji Ishikawa... -- Non-contact measurements of substrate-temperature by f... ---AVS 60th International Symposium & Exhibition, (Long B... -371) Itsuko Sakai, Shinpei Amasaki, Takuya Takeuchi, Kei... --Reaction mechanism at the sidewall of through Si via (T... ---AVS 60th International Symposium & Exhibition, (Long B... -372) Jia-Dong Cao, Yi Li, Ryosuke Kometani, Jong-Yun Par... --Etching characteristics of AlGaN and GaN in inductively... ---AVS 60th International Symposium & Exhibition, (Long B... -373) Takuya Takeuchi, Yan Zhang, ''Kenji Ishikawa'', Mak... --Plasma induced surface roughness of ArF photoresist exa... ---AVS 60th International Symposium & Exhibition, (Long B... -374) Ryosuke Kometani, ''Kenji Ishikawa'', Makoto Sekine... --High Temperature Etching of GaN preserving smooth and s... ---AVS 60th International Symposium & Exhibition, (Long B... -375) Masaru Hori, K. Takeda, H. Kondo, ''Kenji Ishikawa'... --(INVITED) Advanced surface engineering on material pro... ---The 1st International Conference on Surface Engineerin... -376) M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, ''Kenji Is... --(INVITED) Advanced surface engineering on material pro... ---The 1st International Conference on Surface Engineerin... -377) T. Ohta, H. Hashizume, M. Ito, T. Takeda, K. Ishika... --Gas phase diagnostics of atmospheric oxygen radical sou... ---8th Asia-Pacfic International Symposium on the Basics ... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

終了行:
#include(MenuTab1,notitle) 2013年の国際会議リスト -299) ''Kenji Ishikawa'', Y. Miyawaki, T. Takeuchi, K. Ta... --(PLENARY) Plasma-surface interactions in plasma etching... ---The 16th International Workshop on Advanced Plasma Pro... -300) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Radical density control in H2/N2 plasma based on in-sit... ---The 16th International Workshop on Advanced Plasma Pro... -301) H. Shimoeda, H. Kondo, ''Kenji Ishikawa'', H. Mineo... --Effects of hydroxyl radicals on crystallographic and el... ---The 16th International Workshop on Advanced Plasma Pro... -302) Haorang Wang, ''Kenji Ishikawa'', Hideo Horibe, Kei... --Real-time/in-situ electron spin resonance analysis of p... ---The 16th International Workshop on Advanced Plasma Pro... -303) Jia-Dong Cao, Yi Lu, Ryosuke Kometani, Jong-Yun Par... --Etching characteristics of AlGaN in inductively coupled... ---The 16th International Workshop on Advanced Plasma Pro... -304) R. Kometani, S. Chen, M. Liu, ''Kenji Ishikawa'', H... --High temperature plasma etching of GaN. ---The 5th International Symposium on Advanced Plasma Sci... -305) J. Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, ... --Application of atmospheric pressure plasma in element a... ---The 5th International Symposium on Advanced Plasma Sci... -306) H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, ''Kenj... --High H radical density produced by 1-m-length atmospher... ---The 5th International Symposium on Advanced Plasma Sci... -307) T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Oht... --Measurement of carbon nanowalls / silicon substrate tem... ---The 5th International Symposium on Advanced Plasma Sci... -308) T. Tsutsumi, T. Hiraoka, K. Takeda, ''Kenji Ishikaw... --Real time temperature measurements of film-covered-subs... ---The 5th International Symposium on Advanced Plasma Sci... -309) T. Komuro, K. Takeda, ''Kenji Ishikawa'', M. Sekine... --Absolute density of fluorine atom in capacitively coupl... ---The 5th International Symposium on Advanced Plasma Sci... -310) Y. Abe, A. Fukushima, Y. Kim, K. Takeda, H. Kondo, ... --Cavity ring down measurements of SiH3-behavior in SiH4/... ---The 5th International Symposium on Advanced Plasma Sci... -311) T. Horibe, H. Kondo, H. Kano, ''Kenji Ishikawa'', M... --Formation and characteristics of Pt-Au nanoparticles su... ---The 5th International Symposium on Advanced Plasma Sci... -312) H. Shimoeda, H. Kondo, K. Takeda, ''Kenji Ishikawa'... --Effects of morphological changes induced by hydrogen pe... ---The 5th International Symposium on Advanced Plasma Sci... -313) H. Cho, H. Kondo, ''Kenji Ishikawa'', M. Sekine, M.... --Crystallographic and electrical properties of verticall... ---The 5th International Symposium on Advanced Plasma Sci... -314) L. Yu, J. Kuki, H. Kondo, ''Kenji Ishikawa'', M. Se... --Effect of Ar gas addition on photoconductive characteri... ---The 5th International Symposium on Advanced Plasma Sci... -315) K. Sun, K. Takeda, S. Tajima, H. Kondo, ''Kenji Ish... --Construction of atmospheric pressure mist chemical vapo... ---The 5th International Symposium on Advanced Plasma Sci... -316) A. Fukushima, Y. Lu, Y. Abe, K. Takeda, H. Kondo, '... --Relation between gaseous radicals and μc-Si film proper... ---The 5th International Symposium on Advanced Plasma Sci... -317) L. Ya, A. Fukushima, Y. Abe, Y. Kim, K. Takeda, ''K... --Hydrogen radical injection plasma deposition of (110)-p... ---The 5th International Symposium on Advanced Plasma Sci... -318) Y. Lu, A. Kobayashi, Y. Kim, H. Kondo, ''Kenji Ishi... --Study on precursor adsorption and reaction within SiO2 ... ---The 5th International Symposium on Advanced Plasma Sci... -319) J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'', M. Se... --Effect of boron doping on crystalline structures and el... ---The 5th International Symposium on Advanced Plasma Sci... -320) M. Sekine, S. Amasaki, T. Takeuchi, ''Kenji Ishikaw... --Investigation of Si etch reaction with F and O radicals... ---The 5th International Symposium on Advanced Plasma Sci... -321) Z. Liu, S. Chen, Y. Lu, R. Kometani, ''Kenji Ishika... --Sequential exposure of N and H atoms for recovery of pl... ---The 5th International Symposium on Advanced Plasma Sci... -322) T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. Keude... --Real-time variation of sputtering yield of Ar ion for A... ---The 5th International Symposium on Advanced Plasma Sci... -323) S. Tajima, T. Hayashi, ''Kenji Ishikawa'', M. Sekin... --The change in surface morphology of Si at elevated temp... ---The 5th International Symposium on Advanced Plasma Sci... -324) T. Suzuki, K. Takeda, ''Kenji Ishikawa'', H. Kondo,... --Subsequent temporal change of gaseous H and N radical d... ---The 5th International Symposium on Advanced Plasma Sci... -325) Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, ''Kenji... --Gas-phase reaction model of Ar-diluted CHxFy plasmas. ---The 5th International Symposium on Advanced Plasma Sci... -326) A. Malinowski, T. Takeuchi, T. Suzuki, M. Hori, M. ... --Investigation of sticking coefficent of hydrogen radica... ---The 5th International Symposium on Advanced Plasma Sci... -327) T. Hayashi, ''Kenji Ishikawa'', M. Sekine, M. Hori. --Excitation dissociations of c-C5F8 and c-C5HF7 etching ... ---The 5th International Symposium on Advanced Plasma Sci... -328) J. Cao, R. Kometani, J. Park, ''Kenji Ishikawa'', K... --Low-damage, high-accuracy plasma etching of Ga-compound... ---The 5th International Symposium on Advanced Plasma Sci... -329) M. Ito, H. Hashizume, T. Ohta, F. Jia, K. Takeda, '... --Dependence of exposure distance on inactivation of P. d... ---The 5th International Symposium on Advanced Plasma Sci... -330) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K. Nakamu... --Plasma-activated medium selectively killed glioblastoma... ---The 5th International Symposium on Advanced Plasma Sci... -331) ''Kenji Ishikawa'', H. Mizuno, H. Tanaka, H. Hashiz... --Electron spin resonance study of plasma-biological surf... ---The 5th International Symposium on Advanced Plasma Sci... -332) H. Mizuno, ''Kenji Ishikawa'', H. Tanaka, H. Hashiz... --Plasma-biological surface interaction investigated by e... ---The 5th International Symposium on Advanced Plasma Sci... -333) H. Hashizume, T. Ohta, M. Ito, F. Jia, K. Takeda, '... --Measurement of singlet oxygen molecule densities in the... ---The 5th International Symposium on Advanced Plasma Sci... -334) J. Jolibois, K. Takeda, H. Tanaka, ''Kenji Ishikawa... --Effect of biological solution on generation of radical ... ---The 5th International Symposium on Advanced Plasma Sci... -335) H. Kondo, T. Hagino, ''Kenji Ishikawa'', H. Kano, M... --Study on mechanism of ultrahigh speed synthesis of high... ---The 5th International Symposium on Advanced Plasma Sci... -336) Hiroshi Hashizume, T. Ohta, M. Ito, F. Jia, K. Take... --Effects of reactive oxygen species on inactivation of P... ---The 6th International Conference on PLAsma Nanotechnol... -337) J. S.Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda... --Influence of N2 inclusion to Ar AP plasma in atomization. ---The 6th International Conference on PLAsma Nanotechnol... -338) Y. Kondo, Y. Miyawaki, K. Takeda, ''Kenji Ishikawa'... --Effects of hydrogen contained in fluorocarbon gas molec... ---The 6th International Conference on PLAsma Nanotechnol... -339) T. Hayashi, ''Kenji Ishikawa'', M.Sekine, M. Hori. --Dissociative properties of etching gases. ---The 6th International Conference on PLAsma Nanotechnol... -340) R. Kometani, L. Michael, ''Kenji Ishikawa'', K. Tak... --Chlorine plasma etching of GaN at high temperature. ---The 6th International Conference on PLAsma Nanotechnol... -341) H. Tanaka, M. Mizuno, ''Kenji Ishikawa'', K.Nakamur... --Characterization of anti-tumor effect of glioblastoma b... ---The 6th International Conference on PLAsma Nanotechnol... -342) Y. Miyawaki, Y. Kondo, K. Takeda, S. Tajima, H. Kon... --(INVITED) Reduction of surface roughness on ArF-photore... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -343) H. Hashizume, T. Ohta, F. Jia, K. Takeda, K. Ishika... --(INVITED) Analysis of fungal spore inactivation based o... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -344) S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. H... --(INVITED) Si chemical dry etching using the reaction of... ---17th Korea-Japan Workshop on Advanced Plasma Processes... -345) L. Jia, J. Kuki, L. Yu, H. Kondo, ''Kenji Ishikawa'... --Effect of boron doping on amorphous carbon films grown ... ---17th International Workshop on Advanced Plasma Process... -346) Takayuki Ohta, Hiroshi Hashizume, Masafumi Ito, Kei... --Inactivation of microorganisms in liquid exposed by oxy... ---XXXI International Conference on Phenomena in Ionized ... -347) Takayoshi Tsutsumi, Keigo Takeda, ''Kenji Ishikawa'... --Non-contact temperature measurements of film-covered-su... ---XXXI International Conference on Phenomena in Ionized ... -348) J. Kularatne, J. Jolibois, H. Kano, M. Ito, T. Ohta... --Detection of metal elements in soil using atmospheric p... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -349) J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kond... --Effect of Hexane on the synthesis of nanographene using... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -350) H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M... --Crystallographic and chemical modification of carbon na... ---The 12th Asia Pacific Physics Conference of AAPPS and ... -351) Masaru Hori, Yusuke Abe, Atsushi Fukushima, Ya Lu, ... --Hydrogen radical-injection plasma fabricated microcryst... ---21th International Symposium on Plasma Chemistry (ISPC... -352) Hiromasa Tanaka, Masaaki Mizuno, ''Kenji Ishikawa''... --Plasma-activated medium induced apoptosis on glioblasto... ---21th International Symposium on Plasma Chemistry (ISPC... -353) Hiroko Iguchi, Ryosuke Kometani, Michael Liu, Kenji... --Effects of high temperature etching on GaN using by Cl2... ---10th International Conference on Nitride Semiconductor... -354) Makoto Sekine, Zecheng Liu, Shang Chen, Ryosuke Kom... --Recovery of plasma-damaged GaN by in situ radical expos... ---10th International Conference on Nitride Semiconductor... -355) ''Kenji Ishikawa'', Ryosuke Kometani, Keigo Takeda,... --Surface analysis of GaN at elevated substrate temperatu... ---10th International Conference on Nitride Semiconductor... -356) ''Kenji Ishikawa'', Hiromasa Tanaka, Hiroshi Hashiz... --(INVITED) In-situ ESR measurements for plasma materials... ---(AEPSE), 23-1 -357) ''Kenji Ishikawa'', Naoyuki Kurake, Hiromasa Tanaka... --(INVITED) Electron spin resonance study of plasma-liqui... ---9th Asian-european International Conference On Plasma ... -358) Yudai Miyawaki, Haoran Wang, ''Kenji Ishikawa'', Ma... --Analysis of fluorocarbon gas plasma surface interaction... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -359) Takayuki Ohta, Takayoshi Tsutsumi, Keigo Takeda, ''... --Non-contact temperature monitoring of substrates using ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -360) Satomi Tajima, Toshio Hayashi, ''Kenji Ishikawa'', ... --Fabricating the smooth etched Si surface for MEMS devic... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -361) Kuangda Sun, Keigo Takeda, Hitoshi Itoh, Hiroki Kon... --Low-temperature insulating film formation with plasma e... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -362) Jerome Jolibois, Jagath Kularatna, Hiroyuki Kano, M... --Effect of hydrogen peroxide on carbon materials produce... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -363) Yusuke Kondo, Yudai Miyawaki, ''Kenji Ishikawa'', T... --Control of gas phase reaction in etching plasmas employ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -364) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, ... --Quantum chemical investigations for dissociation paths ... ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -365) Jongyun Park, Jiadong Cao, Zecheng Liu, Takashi Kak... --Plasma etching of Ga-based compound semiconductor. ---Dry Process Symposium 2013 (DPS2013), (Ramada Plaza Je... -366) Masaru Hori, Hiromasa Tanaka, Masaaki Mizuno, Kae N... --Plasma-activated medium induced apoptosis on tumor cells. ---66th Annual Gaseous Electronic Conference (GEC2013), (... -367) Masafumi Ito, Hiroshi Hashizume, Takayuki Ohta, Kei... --Reaction mechanism between cell membranes of P. digitat... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -368) Keigo Takeda, ''Kenji Ishikawa'', Hiromasa Tanaka, ... --Measurement of activated species generated by AC power ... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -369) Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, ''Kenji... --Reduction mechanism of surface roughness on ArF-photore... ---66th Annual Gaseous Electronic Conference (GEC2013), (... -370) Takayoshi Tsutsumi, Takayuki Ohta, ''Kenji Ishikawa... -- Non-contact measurements of substrate-temperature by f... ---AVS 60th International Symposium & Exhibition, (Long B... -371) Itsuko Sakai, Shinpei Amasaki, Takuya Takeuchi, Kei... --Reaction mechanism at the sidewall of through Si via (T... ---AVS 60th International Symposium & Exhibition, (Long B... -372) Jia-Dong Cao, Yi Li, Ryosuke Kometani, Jong-Yun Par... --Etching characteristics of AlGaN and GaN in inductively... ---AVS 60th International Symposium & Exhibition, (Long B... -373) Takuya Takeuchi, Yan Zhang, ''Kenji Ishikawa'', Mak... --Plasma induced surface roughness of ArF photoresist exa... ---AVS 60th International Symposium & Exhibition, (Long B... -374) Ryosuke Kometani, ''Kenji Ishikawa'', Makoto Sekine... --High Temperature Etching of GaN preserving smooth and s... ---AVS 60th International Symposium & Exhibition, (Long B... -375) Masaru Hori, K. Takeda, H. Kondo, ''Kenji Ishikawa'... --(INVITED) Advanced surface engineering on material pro... ---The 1st International Conference on Surface Engineerin... -376) M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, ''Kenji Is... --(INVITED) Advanced surface engineering on material pro... ---The 1st International Conference on Surface Engineerin... -377) T. Ohta, H. Hashizume, M. Ito, T. Takeda, K. Ishika... --Gas phase diagnostics of atmospheric oxygen radical sou... ---8th Asia-Pacfic International Symposium on the Basics ... ---- #include(MenuTab2,notitle) #include(Footer,notitle)

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