Manuscript のバックアップの現在との差分(No.85)

#author("2024-05-06T10:07:25+09:00","default:ishikawa","ishikawa")
#author("2024-10-26T20:56:16+09:00","default:ishikawa","ishikawa")
[[Publication]]

*Forthcoming articles

// In-plane orientation of carbon nanowalls induced by oblique angle irradiation by ions during plasma-enhanced chemical vapor deposition
-[297] TBD
--to be submitted
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori
// KSG-14
-[310] TBD 
-- in preparation
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and ''Kenji Ishikawa''

// Advanced Engineering Materials   Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review
-[296] (Invited review) TBD
--to be submitted
---''Kenji Ishikawa''
// Mitigation of damage on AlGaN in selective etching of GaN by substrate temperature at 400 C
-[309] TBD
-- in preparation
---Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, ''Kenji Ishikawa'', and Masaru Hori

// SR Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by REMOCVD (Radical-Enhanced Metalorganic Chemical Vapor Deposition) without using ammonia gas
-[295] TBD
// JVST   Atomic layer etching of GaN by cyclic exposure of BCl3 and F2-added Ar plasma at a substrate temperature of 400 C
-[308] TBD
--to be submitted
---Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori
---Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, ''Kenji Ishikawa'', and Masaru Hori

//JACS  Cryogenic Etching of SiO2 Using Hydrogen-containing Fluorocarbon Gases Based on Pseudo-Wet Plasma Mechanism
-[294] TBD
--to be submitted
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 
// ASS  Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3
-[307] TBD
--under review
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and ''Kenji Ishikawa''

// Plant Production Science    Effect of low-temperature plasma irradiation of seeds on plant part proportions of young plants in mungbean (Vigna radiata)
-[306] TBD
--under review
---Hiroshi Ehara, Jiang Xinwei, Mana Kano-Nakata, Nikolay Britun, Hiroshi Hashizume, Hiromasa Tanaka, and ''Kenji Ishikawa''

// Reviews of Modern Plasma Physics   Development in low-temperature plasma applications in Asia: A special report
-[305] TBD
--under review
---Pankaj Attri, ''Kenji Ishikawa'', Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani

// 
-[293] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
-[304] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
--under review. Research Square [[(Preprint):https://doi.org/10.21203/rs.3.rs-2010278/v1]] 
---Camelia Miron, Satoshi Kashiwagura, Nikolay Britun, Daiki Ito, Naoyuki Iwata, Yang Liu, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, Hiroshi Hashizume, Hiroki Kondo, ''Kenji Ishikawa'', Hiromasa Tanaka, and Masaru Hori

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*Just as accepted 

-[292] Future of Plasma Etching for Microelectronics: Challenges and Opportunities
--Journal of Vacuum Science and Technology B (2024).
---Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, ''Kenji Ishikawa'', Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek
-[303] Analysis of the synergetic effect of process parameters of hydrogenated amorphous carbon deposition in plasma-enhanced chemical vapor deposition using machine learning
--Diamond & Related Materials (2024).
---Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori

-[302] &color(white,red){OPEN};    Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices
--ACS Applied Nano Materials (2024). [[(DOI):https://doi.org/10.1021/acsanm.4c01771]]
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

-[P] Editorial: Low-temperature Plasma as a Strategy to Achieve SDGs
--Free Radical Research (2023) [[(DOI):https://doi.org/10.1080/10715762.2023.2297343]]
---Hiromasa Tanaka, ''Kenji Ishikawa'', and Shinya Toyokuni

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*Published online 


-[301] &color(white,red){OPEN};    Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor 
--Applied Surface Science 681, 161485 (February 1, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2024.161485]]
---Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, ''Kenji Ishikawa'', and Masaru Hori

-[300] &color(white,red){OPEN};    Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer' s lactate solution
--Faraday Discussions (2024) [[(DOI):https://doi.org/10.1039/D4FD00116H]]
---Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, ''Kenji Ishikawa'', and Yasufumi Takahashi

-[299] &color(white,red){OPEN};    Pseudo-wet plasma mechanism enabling high-throughput dry etching of SiO2 by cryogenic-assisted surface reactions
--Small method 2400090 pp.1-6 (2024) [[(DOI):https://doi.org/10.1002/smtd.202400090]]
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 



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[[CRediT:https://www.elsevier.com/authors/journal-authors/policies-and-ethics/credit-author-statement]] from authorship to contributorship [[detail:https://onlinelibrary.wiley.com/doi/full/10.1002/leap.1210]]

1. Conceptualization, 2. Data curation, 3. Formal Analysis, 4. Funding acquisition, &color(black,yellow){5. Investigation};, 6. Methodology, 7. Project administration, 8. Resources, 9. Software, &color(black,yellow){10, Supervision};, 11. Validation, 12. Visualization, &color(white,red){13. Writing – original draft};, &color(white,orange){14. Writing – review & editing};

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