Manuscript のバックアップの現在との差分(No.110)

#author("2024-08-23T08:31:36+09:00","default:ishikawa","ishikawa")
#author("2024-10-26T20:56:16+09:00","default:ishikawa","ishikawa")
[[Publication]]

*Forthcoming articles

// KSG-14
-[310] TBD 
-- in preparation
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and ''Kenji Ishikawa''

// Mitigation of damage on AlGaN in selective etching of GaN by substrate temperature at 400 C
-[309] TBD
-- in preparation
---Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, ''Kenji Ishikawa'', and Masaru Hori

// High-speed removal process of organic polymers by non-thermal atmospheric pressure spark discharge at room temperature 
// JVST   Atomic layer etching of GaN by cyclic exposure of BCl3 and F2-added Ar plasma at a substrate temperature of 400 C
-[308] TBD
-- in preparation
---Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, ''Kenji Ishikawa'', Hiroshi Hashizume, and Masaru Hori

// Atomic layer etching of GaN by cyclic exposure of BCl3 and F2-added Ar plasma at a substrate temperature of 400 C
-[307] TBD
-- in preparation
--to be submitted
---Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, ''Kenji Ishikawa'', and Masaru Hori

// DRM  Contribution analysis of plasma process parameters in amorphous carbon deposition using machine learning and explainable AI
-[306] TBD
--to be submitted
---Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori

// ASS  Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3
-[305] TBD
--to be submitted
-[307] TBD
--under review
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and ''Kenji Ishikawa''

// Plant Production Science    Effect of low-temperature plasma irradiation of seeds on plant part proportions of young plants in mungbean (Vigna radiata)
-[304] TBD
--to be submitted
-[306] TBD
--under review
---Hiroshi Ehara, Jiang Xinwei, Mana Kano-Nakata, Nikolay Britun, Hiroshi Hashizume, Hiromasa Tanaka, and ''Kenji Ishikawa''

// ACS Applied Materials & Interfaces    Non-halogen dry etching of metal carbide TiAlC by low-pressure N2/H2 plasma at room temperature
-[303] TBD
--to be submitted
---Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, ''Kenji Ishikawa'', and Masaru Hori

// ASS   Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor
-[302] TBD
--to be submitted
---Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, ''Kenji Ishikawa'', and Masaru Hori

// Reviews of Modern Plasma Physics   Development in low-temperature plasma applications in Asia: A special report
-[301] TBD
--to be submitted
-[305] TBD
--under review
---Pankaj Attri, ''Kenji Ishikawa'', Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani

// ACS Applied Nano Materials   Achieving in-plane orientation of carbon nanowalls induced by oblique angle irradiation by ions during plasma-enhanced chemical vapor deposition: Implications for sensing, energy harvesting, and nano-bio devices
-[300] TBD
--to be submitted
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

// 
-[299] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
-[304] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
--under review. Research Square [[(Preprint):https://doi.org/10.21203/rs.3.rs-2010278/v1]] 
---Camelia Miron, Satoshi Kashiwagura, Nikolay Britun, Daiki Ito, Naoyuki Iwata, Yang Liu, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, Hiroshi Hashizume, Hiroki Kondo, ''Kenji Ishikawa'', Hiromasa Tanaka, and Masaru Hori

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*Just as accepted 

-[298] The Science and applications of plasma activated solutions: Current trends and future directions
--Plasma Medicine (2024).
---Hiromasa Tanaka, Masaaki Mizuno, ''Kenji Ishikawa'', Camelia Miron, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, Masafumi Ito, and Masaru Hori
-[303] Analysis of the synergetic effect of process parameters of hydrogenated amorphous carbon deposition in plasma-enhanced chemical vapor deposition using machine learning
--Diamond & Related Materials (2024).
---Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori

-[302] &color(white,red){OPEN};    Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices
--ACS Applied Nano Materials (2024). [[(DOI):https://doi.org/10.1021/acsanm.4c01771]]
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

-[P] Editorial: Low-temperature Plasma as a Strategy to Achieve SDGs
--Free Radical Research (2023) [[(DOI):https://doi.org/10.1080/10715762.2023.2297343]]
---Hiromasa Tanaka, ''Kenji Ishikawa'', and Shinya Toyokuni

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*Published online 

-[297] &color(white,red){OPEN};    Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer' s lactate solution

-[301] &color(white,red){OPEN};    Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor 
--Applied Surface Science 681, 161485 (February 1, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2024.161485]]
---Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, ''Kenji Ishikawa'', and Masaru Hori

-[300] &color(white,red){OPEN};    Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer' s lactate solution
--Faraday Discussions (2024) [[(DOI):https://doi.org/10.1039/D4FD00116H]]
---Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, ''Kenji Ishikawa'', and Yasufumi Takahashi

-[295] &color(white,red){OPEN};    Pseudo-wet plasma mechanism enabling high-throughput dry etching of SiO2 by cryogenic-assisted surface reactions
-[299] &color(white,red){OPEN};    Pseudo-wet plasma mechanism enabling high-throughput dry etching of SiO2 by cryogenic-assisted surface reactions
--Small method 2400090 pp.1-6 (2024) [[(DOI):https://doi.org/10.1002/smtd.202400090]]
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 



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[[CRediT:https://www.elsevier.com/authors/journal-authors/policies-and-ethics/credit-author-statement]] from authorship to contributorship [[detail:https://onlinelibrary.wiley.com/doi/full/10.1002/leap.1210]]

1. Conceptualization, 2. Data curation, 3. Formal Analysis, 4. Funding acquisition, &color(black,yellow){5. Investigation};, 6. Methodology, 7. Project administration, 8. Resources, 9. Software, &color(black,yellow){10, Supervision};, 11. Validation, 12. Visualization, &color(white,red){13. Writing – original draft};, &color(white,orange){14. Writing – review & editing};

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