Publication の変更点

#author("2026-05-26T18:13:16+09:00","default:ishikawa","ishikawa")
#author("2026-05-26T18:15:20+09:00","default:ishikawa","ishikawa")
* Publication

Total 371 peer-reviewed papers (journal 332 papers + 15 paper in Japanese + 15 peer-reviewed proceedings + 9 other papers); 
Total 372 peer-reviewed papers (journal 333 papers + 15 paper in Japanese + 15 peer-reviewed proceedings + 9 other papers); 

''6109'' {7610} total citations ; h-index ''37'' , {''40'' [[Scopus:http://www.scopus.com/authid/detail.url?authorId=55360981500]] }
// [[Publons>https://publons.com/researcher/2507368/kenji-ishikawa/]]    Author ID (I-6758-2014 was changed from [[C-9919-2009:http://www.researcherid.com/rid/C-9919-2009]]) on Thomson Reuters database.

Topics    &color(white,blue){FC};    Fluorocarbon plasmas, &color(white,blue){HN};    hydrogen-nitrogen mixture plasmas, &color(white,brown){APP};    Atmospheric pressure plasmas, &color(white,brown){PA};    Plasma agriculture, and &color(white,brown){PM};    Plasma medicine, &color(white,green){dia};    Plasma processes for diamond, &color(white,green){C};    nano-carbon, &color(white,green){Si};    nanocrystalline silicon, &color(black,pink){GaN};    Gallium nitrides, &color(white,green){MG};    Metal gates, &color(white,green){Pt};    Platinum, 

Methods    &color(black,yellow){IR};    Infrared spectroscopic studies, &color(black,yellow){LIF};    Laser induced fluorescence, &color(white,red){ESR};    Electron spin (Paramagnetic) resonance, &color(black,orange){Beam};    Surface reactions under ion beam irradiation, &color(black,cyan){QC};    Quantum chemical computation

**2026

-[333] &color(white,red){OPEN Q1}; &color(white,blue){Etch};  &color(white,green){Pt};    Anisotropic etching of platinum thin film in cyclic removal using low-energy oxygen-ion sputtering and formic acid vapor exposure
--Applied Surface Science 736, 166731 pp. 1-15 (August 1, 2026). [[(DOI):https://doi.org/10.1016/j.apsusc.2026.166731]]
---Kazuhiro Miwa, Thi-Thuy-Nga Nguyen, Masaru Hori, ''Kenji Ishikawa'', and Daijiro Akagi

-[332] &color(white,red){OPEN, Q1}; &color(white,blue){Etch};    Unraveling Etching Mechanism for SiN Film in Cryogenic Hydrogen-Fluoride Plasmas
--Chemical Engineering Journal 540, 177378 pp. 1-9 (July 15, 2026). [[(DOI):https://doi.org/10.1016/j.cej.2026.177378]]
---Shi-Nan Hsiao, Yusuke Imai, Makoto Sekine, ''Kenji Ishikawa'', Masaru Hori, Ryutaro Suda, and Yoshihide Kihara

-[331] &color(white,blue){Etch};    Evaluation of Si Thin Film Formed from Si0.7Ge0.3/Si/Si0.7Ge0.3 Stacked Layers with CF4/H2 Plasma for Si-Nanosheet Formation toward GAA Transistor Application
--Applied Physics Letters 128 (21), 212105 (May 26, 2026). [[(DOI):https://doi.org/10.1063/5.0315151]]
---Kotaro Ozaki, Yusuke Imai, Yuki Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuji Yamamoto, Wei-Chen Wen, Ibuki Saburi, and Katsunori Makihara

-[330] &color(white,red){OPEN}; &color(white,brown){PM};     Non-thermal plasma-activated methionine-containing Ringer's solution enhances cytotoxicity by increasing oxidative stress
--Journal of Clinical Biochemistry and Nutrition 78 (3), pp. 251-258 (May 1, 2026). [[(DOI):https://doi.org/10.3164/jcbn.25-241]]
---Kosei Fujisawa, Sakura Tanahashi, Kyoka Katagiri, Soo Takasu, Tomohiro Otsuka, Tetsuro Kamiya, ''Kenji Ishikawa'', Yukihiro Esaka, and Hirokazu Hara

-[329] &color(white,red){OPEN}; &color(white,blue){Etch}; &color(white,green){Si};     Etch profiles in silicon in SF6 and O2 plasma based on etch-depth-dependent O/F transport gradient model
--Japanese Journal of Applied Physics 65, 08SP06 pp. 1-9 (April 24, 2026). [[(DOI):https://doi.org/10.35848/1347-4065/ae5ab3]]
---Shuto Tsuchioka, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and ''Kenji Ishikawa''

-[328] &color(white,red){OPEN}; &color(white,green){C};     Origins of intrinsic stress in disordered carbon materials: A first-principles study
--Physical Review B 113,134111 pp. 1-11 (April 15, 2026). [[(DOI):https://doi.org/10.1103/hgt2-8fyw]]
---Yusuke Ando, Hu Li, Jian Ping Zhao, Masaaki Matsukuma, ''Kenji Ishikawa'', and Peter Ventzek

-[327] &color(white,red){OPEN}; &color(white,brown){APP};     Preliminary study on the visualization and evaluation of non-thermal plasma dose profiles using radiochromic film
--The European Physical Journal Plus 141, 375 pp. 1-10 (April 7, 2026). [[(DOI):https://doi.org/10.1140/epjp/s13360-026-07613-9]]
---Hiroshi Yasuda, Takashi Kondo, and ''Kenji Ishikawa''

-[326] &color(white,red){OPEN}; &color(white,red){ESR};    Quantification of dangling bonds formed by plasma treatment as reactive sites for functionalization of hexagonal boron nitride nanoparticles
--ACS Applied Nano Materials 9 (14), pp. 6080–6089 (April 1, 2026). [[(DOI):https://doi.org/10.1021/acsanm.5c05661]]
---Kenichi Inoue, Naoto Takagi, Tsuyohito Ito, Yoshiki Shimizu, Yukiya Hakuta, Kohzo Ito, ''Kenji Ishikawa'', Masaru Hori, and Kazuo Terashima

-[325]  &color(white,brown){PM};    Bactericidal properties of tryptophan and pyrrole solutions irradiated by oxygen radicals
--Japanese Journal of Applied Physics 65 (5), 056001 pp. 1-5 (March 2, 2026). [[(DOI):https://doi.org/10.35848/1347-4065/ae4552]]
---Daiji Kitagawa, Kenta Shimizu, Takuya Watanabe, Motoyuki Shimizu, Masashi Kato, Hiromasa Tanaka, ''Kenji Ishikawa'', Masaru Hori, and Masafumi Ito

-[324] &color(white,red){FREE}; &color(white,blue){Etch};    Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating
-[324] &color(white,blue){Etch};    Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating
--Journal of Vacuum Science and Technology A 44 (2), 022603 pp. 1-13 (March 1, 2026). [[(DOI):https://doi.org/10.1116/6.0005128]]
---Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Kenetsu Yokogawa, Masaru Izawa, ''Kenji Ishikawa'', and Masaru Hori

-[323] &color(white,red){OPEN}; &color(white,blue){Etch};    Formation of SCF+, SCF2+, and CS2+ ions during gas modulation cycles associated with interference between alternating C4F8 and SF6 in Ar plasma
--Japanese Journal of Applied Physics 65 (3), 030904 pp. 1-5 (February 11, 2026). [[(DOI):https://doi.org/10.35848/1347-4065/ae3bc4]]
---Taito Yoshie, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and ''Kenji Ishikawa''

-[322] &color(white,red){OPEN}; &color(white,blue){HFC};    Photodissociation and electron-collision induced dissociation of C5H2F10 using photoelectron–photoion coincidence spectroscopy and quantum chemistry
--Scientific Reports 16, 5312 pp. 1-15 (January 16, 2026). [[(DOI):https://doi.org/10.1038/s41598-026-36140-x]]
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and ''Kenji Ishikawa''

-[321]  &color(white,brown){PM}; &color(white,red){ESR};    Long-term dynamics of nitric oxide radicals in plasma-activated Ringer’s lactate solution
--Plasma Processes and Polymers 23 (1), 70122 pp. 1-6 (January, 2026). [[(DOI):https://doi.org/10.1002/ppap.70122]]
---Taishi Yamakawa, Kenichi Inoue, ''Kenji Ishikawa'', Masaru Hori, and Hiromasa Tanaka



**Before 2025

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