Manuscript の変更点

#author("2024-05-09T12:35:49+09:00","default:ishikawa","ishikawa")
#author("2024-05-14T18:27:33+09:00","default:ishikawa","ishikawa")
[[Publication]]

*Forthcoming articles

// In-plane orientation of carbon nanowalls induced by oblique angle irradiation by ions during plasma-enhanced chemical vapor deposition
-[297] TBD
--to be submitted
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

// Advanced Engineering Materials   Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review
-[296] (Invited review) TBD
--to be submitted
---''Kenji Ishikawa''

//JACS  Cryogenic Etching of SiO2 Using Hydrogen-containing Fluorocarbon Gases Based on Pseudo-Wet Plasma Mechanism
-[295] TBD
--to be submitted
---Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori 

// 
-[294] Low-temperature plasma irradiation of Ringer's lactate generates heterogeneous molecules for cancer treatment
--under review. Research Square [[(Preprint):https://doi.org/10.21203/rs.3.rs-2010278/v1]] 
---Camelia Miron, Satoshi Kashiwagura, Nikolay Britun, Daiki Ito, Naoyuki Iwata, Yang Liu, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, Hiroshi Hashizume, Hiroki Kondo, ''Kenji Ishikawa'', Hiromasa Tanaka, and Masaru Hori

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*Just as accepted 

-[293] Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by REMOCVD (Radical-Enhanced Metalorganic Chemical Vapor Deposition) without using ammonia gas
--Scientific Reports (2024). [[(DOI):https://doi.org/10.1038/s41598-024-61501-9]]
---Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori

-[292] Future of Plasma Etching for Microelectronics: Challenges and Opportunities
-[293] Future of Plasma Etching for Microelectronics: Challenges and Opportunities
--Journal of Vacuum Science and Technology B (2024).
---Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, ''Kenji Ishikawa'', Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek

-[P] Editorial: Low-temperature Plasma as a Strategy to Achieve SDGs
--Free Radical Research (2023) [[(DOI):https://doi.org/10.1080/10715762.2023.2297343]]
---Hiromasa Tanaka, ''Kenji Ishikawa'', and Shinya Toyokuni

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*Published online 

-[292] Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition
--Scientific Reports 14, 10861 pp. 1-18 (May 13, 2024). [[(DOI):https://doi.org/10.1038/s41598-024-61501-9]]
---Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, ''Kenji Ishikawa'', and Masaru Hori

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[[CRediT:https://www.elsevier.com/authors/journal-authors/policies-and-ethics/credit-author-statement]] from authorship to contributorship [[detail:https://onlinelibrary.wiley.com/doi/full/10.1002/leap.1210]]

1. Conceptualization, 2. Data curation, 3. Formal Analysis, 4. Funding acquisition, &color(black,yellow){5. Investigation};, 6. Methodology, 7. Project administration, 8. Resources, 9. Software, &color(black,yellow){10, Supervision};, 11. Validation, 12. Visualization, &color(white,red){13. Writing – original draft};, &color(white,orange){14. Writing – review & editing};

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