Publication の変更点


#author("2025-04-20T14:00:40+09:00","default:ishikawa","ishikawa")
#author("2025-04-20T14:02:11+09:00","default:ishikawa","ishikawa")
* Publication

Total 349 peer-reviewed papers (journal 310 papers + 15 paper in Japanese + 15 peer-reviewed proceedings + 9 other papers); 

''5509'' {6586} total citations ; h-index ''35'' , {''38'' [[Scopus:http://www.scopus.com/authid/detail.url?authorId=55360981500]] }
''5509'' {6653} total citations ; h-index ''35'' , {''38'' [[Scopus:http://www.scopus.com/authid/detail.url?authorId=55360981500]] }
// [[Publons>https://publons.com/researcher/2507368/kenji-ishikawa/]]    Author ID (I-6758-2014 was changed from [[C-9919-2009:http://www.researcherid.com/rid/C-9919-2009]]) on Thomson Reuters database.

Topics    &color(white,blue){FC};    Fluorocarbon plasmas, &color(white,blue){HN};    hydrogen-nitrogen mixture plasmas, &color(white,brown){APP};    Atmospheric pressure plasmas, &color(white,brown){PA};    Plasma agriculture, and &color(white,brown){PM};    Plasma medicine, &color(white,green){dia};    Plasma processes for diamond, &color(white,green){C};    nano-carbon, &color(white,green){Si};    nanocrystalline silicon, &color(black,pink){GaN};    Gallium nitrides, &color(white,green){MG};    Metal gates, &color(white,green){Pt};    Platinum, 

Methods    &color(black,yellow){IR};    Infrared spectroscopic studies, &color(black,yellow){LIF};    Laser induced fluorescence, &color(white,red){ESR};    Electron spin (Paramagnetic) resonance, &color(black,orange){Beam};    Surface reactions under ion beam irradiation, &color(black,cyan){QC};    Quantum chemical computation

**2025

-[310] &color(white,red){OPEN Q1}; &color(white,blue){Etch}; &color(white,green){MG};   Selective dry etching of TiAlC over TiN using nonhalogen N2/H2 plasma
--Applied Surface Science 691, 162665 pp. 1-13 (May 15, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2025.162665]]
---Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, ''Kenji Ishikawa'', and Masaru Hori

-[309] &color(white,red){OPEN Q1}; &color(white,blue){Etch}; &color(white,green){Pt};    Low-temperature atomic layer etching of platinum via sequential wet-like reactions of plasma oxidation and complexation
--Applied Surface Science 687, 162325 pp. 1-15 (April 1, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2025.162325]]
---Thi-Thuy-Nga Nguyen, Daijiro Akagi, Takeshi Okato, ''Kenji Ishikawa'', and Masaru Hori

-[308] &color(white,red){OPEN Q1}; &color(white,blue){HFC};    Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2
--Scientific Reports 15, 9507 pp. 1-10 (March 18, 2025). [[(DOI):https://doi.org/10.1038/s41598-025-94119-6]]
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and ''Kenji Ishikawa''

-[307] &color(white,red){OPEN Q1}; &color(white,blue){Etch};    Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3
--Applied Surface Science 684, 161815 pp. 1-10 (March 1, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2024.161815]]
---Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and ''Kenji Ishikawa''

-[306] &color(white,red){Review};    Developments in low-temperature plasma applications in Asia
--Reviews of Modern Plasma Physics 9, 6 pp. 1-72 (February 8, 2025). [[(DOI):https://doi.org/10.1007/s41614-025-00184-9]], allotment writing the section of 5  Plasma‑assisted material processing, pp. 37-47
---Pankaj Attri, ''Kenji Ishikawa'', Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani

-[305] &color(white,red){OPEN}; &color(white,green){C};   Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices
--ACS Applied Nano Materials 8 (6), pp. 2660–2668 (February 2, 2025). [[(DOI):https://doi.org/10.1021/acsanm.4c01771]]
---Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Mineo Hiramatsu, and Masaru Hori

-[304] &color(white,red){OPEN}; &color(white,brown){PM};    Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer' s lactate solution
--Faraday Discussions 257, pp. 212-223 (February 1, 2025). [[(DOI):https://doi.org/10.1039/D4FD00116H]]
---Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, ''Kenji Ishikawa'', and Yasufumi Takahashi

-[303] &color(white,red){OPEN Q1}; &color(white,green){C};     Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor 
--Applied Surface Science 681, 161485 pp. 1-10 (February 1, 2025). [[(DOI):https://doi.org/10.1016/j.apsusc.2024.161485]]
---Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, ''Kenji Ishikawa'', and Masaru Hori

-[302] &color(black,pink){GaN}; &color(white,blue){Etch};      Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400°C
--Journal of Vacuum Science and Technology B 43, 022202 pp. 1-13 (January 27, 2025). [[(DOI):https://doi.org/10.1116/5.0239755]]
---Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, ''Kenji Ishikawa'', and Masaru Hori

-[301] &color(white,red){OPEN}; &color(white,green){C};    Analysis of the synergetic effect of process parameters of hydrogenated amorphous carbon deposition in plasma-enhanced chemical vapor deposition using machine learning
--Diamond & Related Materials 151, 111687 pp. 1-12 (January 1, 2025). [[(DOI):https://doi.org/10.1016/j.diamond.2024.111687]]
---Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori



**Before 2024

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