ProceedingIntern10
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2010年の国際会議リスト
-47) ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--(INVITED) Nanoscale engineering for plasma etching of f...
---10th International Workshop of Advanced Plasma Process...
-48) C. S. Moon, K. Takeda, Makoto Sekine, Y. Setsuhara, ...
--A well-established compact combinatorial etching proces...
---2nd International Symposium on Advance Plasma Science ...
-49) S. Chen, H. Kano, S. Den, K. Takeda, ''Kenji Ishikaw...
--Radical kinetics in N2-H2 plasma generated by novel hig...
---2nd International Symposium on Advance Plasma Science ...
-50) Y. Abe, C. S. Moon, S. Kawashima, K. Takeda, H. Kond...
--Surface loss probabilities of h atom on various silicon...
---2nd International Symposium on Advance Plasma Science ...
-51) H. Inui, Y. Matsudaira, N. Yoshida, N. Iwaki, T. Kaw...
--Measurement of H radical density in H2/Ar nonequilibriu...
---2nd International Symposium on Advance Plasma Science ...
-52) A. Malinowski, Masaru Hori, Makoto Sekine, T. Suzuki...
--Modeling of radical tranformation under ‘pape’ structur...
---2nd International Symposium on Advance Plasma Science ...
-53) E. Shibata, Makoto Sekine, ''Kenji Ishikawa'', H. Ko...
--Porous SiOCH low-k film etch process and its surface re...
---2nd International Symposium on Advance Plasma Science ...
-54) Y. Miyawaki, K. Takeda, A. Ito, M. Nakamura, H. Kond...
--SiO2 cotact hole etch mechanism using environment-frien...
---2nd International Symposium on Advance Plasma Science ...
-55) T. Takeuchi, Makoto Sekine, H. Toyoda, H. Kondo, ''K...
--Analysis of ArF photoresist modified by fluorocarbon io...
---2nd International Symposium on Advance Plasma Science ...
-56) S. Chen, Y. Nagoe, M. Nakai, ''Kenji Ishikawa'', H. ...
--Deep-level defect passivation by high density hydrogen ...
---2nd International Symposium on Advance Plasma Science ...
-57) H. Kuroda, H. Sugiura, H. Yamamoto, M. Ito, T. Ohta,...
--Measurement of Si wafer temperature with metal thin fil...
---2nd International Symposium on Advance Plasma Science ...
-58) H. Shimoeda, Y. Miyawaki, K. Takeda, ''Kenji Ishikaw...
--Effect of oxygen etching on the morphologies of carbon ...
---2nd International Symposium on Advance Plasma Science ...
-59) H. Mikuni, T. Kanda, S. Kondo, W. Takeuchi, K. Yamak...
--Initial nucleation in carbon nanowalls growth on Si and...
---2nd International Symposium on Advance Plasma Science ...
-60) S. Kondo, K. Yasuda, H. Kondo, ''Kenji Ishikawa'', M...
--Effect of ion irradiation on carbon nanowalls growth.
---2nd International Symposium on Advance Plasma Science ...
-61) K. Mase, S. Mitsuguchi, S. Kondo, H. Kano, ''Kenji I...
--Effect of plasma surface treatments on supporting of pl...
---2nd International Symposium on Advance Plasma Science ...
-62) S. Iseki, S. Uchida, S. Takashima, T. Ohta, M. Ito, ...
--Low-temperature treatment using high-density non-equili...
---2nd International Symposium on Advance Plasma Science ...
-63) Y. Matsudaira, H. Inui, H. Kano, K. Takeda, ''Kenji ...
--Synthesis of amorphous carbon films using nonequilibriu...
---2nd International Symposium on Advance Plasma Science ...
-64) T. Kino, S. Kondo, W. Takeuchi, H. Kondo, ''Kenji Is...
--Fabrication of carbon nanomaterials synthesized by plas...
---2nd International Symposium on Advance Plasma Science ...
-65) S. Kawashima, Y. Abe, K. Takeda, ''Kenji Ishikawa'',...
--Diagnostics in high pressure SiH4/H2 plasma for deposit...
---2nd International Symposium on Advance Plasma Science ...
-66) ''Kenji Ishikawa'', K. Takeda, H. Kondo, M.Sekine an...
--Siloxane polymer surface modifications by exposure of p...
---2nd International Symposium on Advance Plasma Science ...
-67) T. Hayashi, ''Kenji Ishikawa'', Makoto Sekine, Masar...
--Dissociation channel of c-C4F8 to CF2 radical in reacti...
---3rd International Conference on PLAsma-Nano Technology...
-68) ''Kenji Ishikawa'', N. Ebizuka, K. Takeda, H. Kondo,...
--Quasi-Bragg grating with sub-wavelength particles.
---3rd International Conference on PLAsma-Nano Technology...
-69) T. Kino, H. Kondo, ''Kenji Ishikawa'', Makoto Sekine...
--Control in optical properties of amorphous carbon films...
---International Symposium on Technology Evolution for Si...
-70) H. Yamamoto, K. Takeda, H. Kondo, ''Kenji Ishikawa''...
--Modification of Si-O-Si Structure in Porous SiOCH Films...
---11th International Workshop on Advanced Plasma Process...
-71) A. Malinowski, W. Takeuchi, Makoto Sekine, ''Kenji I...
--Performance estimation of carbon nanowall-based field e...
---The 40th Solid-State Device Research Conference ESSDER...
-72) A. Malinowski, L. Lukasiak, A. Jakubowski, D. Tomasz...
--3D TCAD simulation study of the influence of line-width...
---The 10th Conference "Electron Technology ELTE 2010", (...
-73) Shang Chen, Ryosuke Kometani, ''Kenji Ishikawa'', Hi...
--Analysis of gallium nitride (GaN) surface interacted wi...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-74) ''Kenji Ishikawa'', N. Sumi, A. Kono, H. Horibe, K. ...
--In situ electron spin resonance study for plasma-surfac...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-75) Fengdong Jia, Naoya Sumi, ''Kenji Ishikawa'', Hiroyu...
--Time dependence measurement of electron density and tem...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-76) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, M...
--Dissociation channels of c-C4F8 to CF2 radical in react...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-77) Masaki Minami, Shigetaka Tomiya, ''Kenji Ishikawa'',...
--Analysis of GaN damage induced by Cl2/SiCl4/Ar plasma.
---63rd Annual Gaseous Electronics Conference and 7th Int...
-78) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, ''Ke...
--Study on modified surface layer of photoresist employin...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-79) Hiroshi Yamamoto, Kohei Asano, Keigo Takeda, ''Kenji...
--Modification of Si-O-Si structure in porous SiOCH low-k...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-80) Yusuke Abe, Keigo Takeda, ''Kenji Ishikawa'', Hiroki...
--Measurement of surface loss probabilities of hydrogen r...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-81) S. Kawashima, Yusuke Abe, Keigo Takeda, ''Kenji Ishi...
--High-speed growth and crystallinity control of microcry...
---Third International workshop on Thin Film Silicon Sola...
-82) Tsuyoshi Yamaguchi, Keigo Takeda, Chishio Koshimizu,...
--Highly selective etching of SiOCH over sic films by dua...
---57th International Symposium on American Vacuum Societ...
-83) Hiroshi Yamamoto, Keigo Takeda, ''Kenji Ishikawa'', ...
--Mechanism of modification in Si-O-Si structure in porou...
---57th International Symposium on American Vacuum Societ...
-84) Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, ''Kenji ...
--Mechanism of highly selective SiO2 etching over photore...
---57th International Symposium on American Vacuum Societ...
-85) ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Mako...
--Polymer surface modification: vibrational sum frequency...
---57th International Symposium on American Vacuum Societ...
-86) Yudai Miyawaki, Yusuke Kondo, Hiroshi Yamamoto, A. I...
--C5HF7 chemistry for highly selective etch of SiO2 over ...
---32nd International Symposium on Dry Process (DPS), (To...
-87) H. Yamamoto, Y. Miyawaki, K. Takeda, ''Kenji Ishikaw...
--Observation of 193-nm photoresist surface exposed to et...
---32nd International Symposium on Dry Process (DPS), (To...
-88) Takuya Takeuchi, Shinpei Amasaki, K. Takeda, ''Kenji...
--Investigation of the modified ArF photoresist surface d...
---32nd International Symposium on Dry Process (DPS), (To...
-89) Shinpei Amasaki, Takuya Takeuchi, Keigo Takeda, ''Ke...
--Investigation of Si etch reaction induced by SF6/O2 pla...
---32nd International Symposium on Dry Process (DPS), (To...
-90) ''Kenji Ishikawa'', Makoto Sekine, Masaru Hori.
--In line electron spin resonance study of plasma-surface...
---The 3rd International Symposium of Plasma Center for I...
-91) M. Hori , ''Kenji Ishikawa'', H. Kondo, K. Takeda, H...
--(INVITED) Plasma induced surface and/or sub-surface in...
---The Second International Symposium on Plasma Nanoscien...
-92) ''Kenji Ishikawa'', Makoto Sekine, Masaru Hori.
--(INVITED) In line electron spin resonance study of pla...
---20th MRS-Japan Academic Symposium, Session A: Frontier...
-93) Naoya Sumi,''Kenji Ishikawa'',Akihiro Kono,Hideo ...
--Real-time electron-spin-resonance measurement of plasma...
---20th MRS-Japan Academic Symposium, Session A: Frontier...
-94) Tokushige Kino,Hiroki Kondo,''Kenji Ishikawa'',Ma...
--Controlled synthesis of amorphous carbon films by radic...
---20th MRS-Japan Academic Symposium, Session A : Frontie...
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終了行:
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2010年の国際会議リスト
-47) ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori.
--(INVITED) Nanoscale engineering for plasma etching of f...
---10th International Workshop of Advanced Plasma Process...
-48) C. S. Moon, K. Takeda, Makoto Sekine, Y. Setsuhara, ...
--A well-established compact combinatorial etching proces...
---2nd International Symposium on Advance Plasma Science ...
-49) S. Chen, H. Kano, S. Den, K. Takeda, ''Kenji Ishikaw...
--Radical kinetics in N2-H2 plasma generated by novel hig...
---2nd International Symposium on Advance Plasma Science ...
-50) Y. Abe, C. S. Moon, S. Kawashima, K. Takeda, H. Kond...
--Surface loss probabilities of h atom on various silicon...
---2nd International Symposium on Advance Plasma Science ...
-51) H. Inui, Y. Matsudaira, N. Yoshida, N. Iwaki, T. Kaw...
--Measurement of H radical density in H2/Ar nonequilibriu...
---2nd International Symposium on Advance Plasma Science ...
-52) A. Malinowski, Masaru Hori, Makoto Sekine, T. Suzuki...
--Modeling of radical tranformation under ‘pape’ structur...
---2nd International Symposium on Advance Plasma Science ...
-53) E. Shibata, Makoto Sekine, ''Kenji Ishikawa'', H. Ko...
--Porous SiOCH low-k film etch process and its surface re...
---2nd International Symposium on Advance Plasma Science ...
-54) Y. Miyawaki, K. Takeda, A. Ito, M. Nakamura, H. Kond...
--SiO2 cotact hole etch mechanism using environment-frien...
---2nd International Symposium on Advance Plasma Science ...
-55) T. Takeuchi, Makoto Sekine, H. Toyoda, H. Kondo, ''K...
--Analysis of ArF photoresist modified by fluorocarbon io...
---2nd International Symposium on Advance Plasma Science ...
-56) S. Chen, Y. Nagoe, M. Nakai, ''Kenji Ishikawa'', H. ...
--Deep-level defect passivation by high density hydrogen ...
---2nd International Symposium on Advance Plasma Science ...
-57) H. Kuroda, H. Sugiura, H. Yamamoto, M. Ito, T. Ohta,...
--Measurement of Si wafer temperature with metal thin fil...
---2nd International Symposium on Advance Plasma Science ...
-58) H. Shimoeda, Y. Miyawaki, K. Takeda, ''Kenji Ishikaw...
--Effect of oxygen etching on the morphologies of carbon ...
---2nd International Symposium on Advance Plasma Science ...
-59) H. Mikuni, T. Kanda, S. Kondo, W. Takeuchi, K. Yamak...
--Initial nucleation in carbon nanowalls growth on Si and...
---2nd International Symposium on Advance Plasma Science ...
-60) S. Kondo, K. Yasuda, H. Kondo, ''Kenji Ishikawa'', M...
--Effect of ion irradiation on carbon nanowalls growth.
---2nd International Symposium on Advance Plasma Science ...
-61) K. Mase, S. Mitsuguchi, S. Kondo, H. Kano, ''Kenji I...
--Effect of plasma surface treatments on supporting of pl...
---2nd International Symposium on Advance Plasma Science ...
-62) S. Iseki, S. Uchida, S. Takashima, T. Ohta, M. Ito, ...
--Low-temperature treatment using high-density non-equili...
---2nd International Symposium on Advance Plasma Science ...
-63) Y. Matsudaira, H. Inui, H. Kano, K. Takeda, ''Kenji ...
--Synthesis of amorphous carbon films using nonequilibriu...
---2nd International Symposium on Advance Plasma Science ...
-64) T. Kino, S. Kondo, W. Takeuchi, H. Kondo, ''Kenji Is...
--Fabrication of carbon nanomaterials synthesized by plas...
---2nd International Symposium on Advance Plasma Science ...
-65) S. Kawashima, Y. Abe, K. Takeda, ''Kenji Ishikawa'',...
--Diagnostics in high pressure SiH4/H2 plasma for deposit...
---2nd International Symposium on Advance Plasma Science ...
-66) ''Kenji Ishikawa'', K. Takeda, H. Kondo, M.Sekine an...
--Siloxane polymer surface modifications by exposure of p...
---2nd International Symposium on Advance Plasma Science ...
-67) T. Hayashi, ''Kenji Ishikawa'', Makoto Sekine, Masar...
--Dissociation channel of c-C4F8 to CF2 radical in reacti...
---3rd International Conference on PLAsma-Nano Technology...
-68) ''Kenji Ishikawa'', N. Ebizuka, K. Takeda, H. Kondo,...
--Quasi-Bragg grating with sub-wavelength particles.
---3rd International Conference on PLAsma-Nano Technology...
-69) T. Kino, H. Kondo, ''Kenji Ishikawa'', Makoto Sekine...
--Control in optical properties of amorphous carbon films...
---International Symposium on Technology Evolution for Si...
-70) H. Yamamoto, K. Takeda, H. Kondo, ''Kenji Ishikawa''...
--Modification of Si-O-Si Structure in Porous SiOCH Films...
---11th International Workshop on Advanced Plasma Process...
-71) A. Malinowski, W. Takeuchi, Makoto Sekine, ''Kenji I...
--Performance estimation of carbon nanowall-based field e...
---The 40th Solid-State Device Research Conference ESSDER...
-72) A. Malinowski, L. Lukasiak, A. Jakubowski, D. Tomasz...
--3D TCAD simulation study of the influence of line-width...
---The 10th Conference "Electron Technology ELTE 2010", (...
-73) Shang Chen, Ryosuke Kometani, ''Kenji Ishikawa'', Hi...
--Analysis of gallium nitride (GaN) surface interacted wi...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-74) ''Kenji Ishikawa'', N. Sumi, A. Kono, H. Horibe, K. ...
--In situ electron spin resonance study for plasma-surfac...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-75) Fengdong Jia, Naoya Sumi, ''Kenji Ishikawa'', Hiroyu...
--Time dependence measurement of electron density and tem...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-76) Toshio Hayashi, ''Kenji Ishikawa'', Makoto Sekine, M...
--Dissociation channels of c-C4F8 to CF2 radical in react...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-77) Masaki Minami, Shigetaka Tomiya, ''Kenji Ishikawa'',...
--Analysis of GaN damage induced by Cl2/SiCl4/Ar plasma.
---63rd Annual Gaseous Electronics Conference and 7th Int...
-78) Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, ''Ke...
--Study on modified surface layer of photoresist employin...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-79) Hiroshi Yamamoto, Kohei Asano, Keigo Takeda, ''Kenji...
--Modification of Si-O-Si structure in porous SiOCH low-k...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-80) Yusuke Abe, Keigo Takeda, ''Kenji Ishikawa'', Hiroki...
--Measurement of surface loss probabilities of hydrogen r...
---63rd Annual Gaseous Electronics Conference and 7th Int...
-81) S. Kawashima, Yusuke Abe, Keigo Takeda, ''Kenji Ishi...
--High-speed growth and crystallinity control of microcry...
---Third International workshop on Thin Film Silicon Sola...
-82) Tsuyoshi Yamaguchi, Keigo Takeda, Chishio Koshimizu,...
--Highly selective etching of SiOCH over sic films by dua...
---57th International Symposium on American Vacuum Societ...
-83) Hiroshi Yamamoto, Keigo Takeda, ''Kenji Ishikawa'', ...
--Mechanism of modification in Si-O-Si structure in porou...
---57th International Symposium on American Vacuum Societ...
-84) Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, ''Kenji ...
--Mechanism of highly selective SiO2 etching over photore...
---57th International Symposium on American Vacuum Societ...
-85) ''Kenji Ishikawa'', Keigo Takeda, Hiroki Kondo, Mako...
--Polymer surface modification: vibrational sum frequency...
---57th International Symposium on American Vacuum Societ...
-86) Yudai Miyawaki, Yusuke Kondo, Hiroshi Yamamoto, A. I...
--C5HF7 chemistry for highly selective etch of SiO2 over ...
---32nd International Symposium on Dry Process (DPS), (To...
-87) H. Yamamoto, Y. Miyawaki, K. Takeda, ''Kenji Ishikaw...
--Observation of 193-nm photoresist surface exposed to et...
---32nd International Symposium on Dry Process (DPS), (To...
-88) Takuya Takeuchi, Shinpei Amasaki, K. Takeda, ''Kenji...
--Investigation of the modified ArF photoresist surface d...
---32nd International Symposium on Dry Process (DPS), (To...
-89) Shinpei Amasaki, Takuya Takeuchi, Keigo Takeda, ''Ke...
--Investigation of Si etch reaction induced by SF6/O2 pla...
---32nd International Symposium on Dry Process (DPS), (To...
-90) ''Kenji Ishikawa'', Makoto Sekine, Masaru Hori.
--In line electron spin resonance study of plasma-surface...
---The 3rd International Symposium of Plasma Center for I...
-91) M. Hori , ''Kenji Ishikawa'', H. Kondo, K. Takeda, H...
--(INVITED) Plasma induced surface and/or sub-surface in...
---The Second International Symposium on Plasma Nanoscien...
-92) ''Kenji Ishikawa'', Makoto Sekine, Masaru Hori.
--(INVITED) In line electron spin resonance study of pla...
---20th MRS-Japan Academic Symposium, Session A: Frontier...
-93) Naoya Sumi,''Kenji Ishikawa'',Akihiro Kono,Hideo ...
--Real-time electron-spin-resonance measurement of plasma...
---20th MRS-Japan Academic Symposium, Session A: Frontier...
-94) Tokushige Kino,Hiroki Kondo,''Kenji Ishikawa'',Ma...
--Controlled synthesis of amorphous carbon films by radic...
---20th MRS-Japan Academic Symposium, Session A : Frontie...
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