Research for Photovoltaics: Cost Reduction of Solar Energy through Comprehensive Researches from Materials to Large Scale PV Systems
Atmospheric-Pressure Plasma Technology for the High-Rate and Low-Temperature Deposition of Si Thin Films
Plasma Etching Technology to Enhance Solar Cell Efficiency
A Novel Method to Improve Uniformity in a Large Area VHF Plasma Source for Solar Application
Magnetron Sputtering Deposition of Conductive Diamond-Like Carbon Films with Embedded Nanoparticles
Decomposition of CO2 by Large Flow Atmospheric Microwave Plasma (LAMP)
Micromachining of a PZT Cantilever Based on MEMS Scale for Low Frequency Energy Harvesting
Corrosion Protection of Ti/TiN, Cr/TiN, Ti/CrN, and Cr/CrN Multi-coatings in Simulated Proton Exchange Membrane Fuel Cell Environments
Catalytic Plasma for Methanol from Methane and Oxygen with [Ga Cr]/Cu-Zn-Al Catalyst in a Dielectric Barrier Discharge
Application of Plasma Technology in the Synthesis of the Key Materials for Direct Alcohol Fuel Cells
Surface Treatment of SC-SOFC Electrodes by an Atmospheric- Pressure He Plasma Jet
Microwave H2/SiH4 PCVD by Modified Microwave Antenna for Improvement of Silicon Film Quality
Low Temperature Growth of Thin-Film Si:H by PECVD for Solar Cells
SiNx Double Layer Anti Reflection Coating by PECVD for Single Crystalline Silicon Solar Cells
Screen-printed EFG (Edge-defined Film-fed Growth) Ribbon Silicon Solar Cells by Vapor Texturing
Factor Determining the Preferential Crystal Orientation in the Growth of Microcrystalline Si Films by RF PE-CVD
Effect of Side-Wall Gate Potential on Leakage Current of Amorphous Silicon p-i-n Diode
Real Time Monitoring of the Atmospheric-Pressure Plasma-PEDOT: PSS Interface using Spectroscopic Ellipsometry
Improvement of Minority-Carrier Lifetime in GaAsN Grown by Chemical Beam Epitaxy
Structural Analysis of GaAsN Thin Films Grown by Chemical Beam Epitaxy using X-Ray Reciprocal Space Map
Enhancement of Light Trapping using High-k Dielectric in LSPR for Silicon-Based Thin Film Solar Cells
Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles
High Photocatalytic Efficiency of ZnO Nanoparticles Synthesized by Spray-Pyrolysis Method
Donor-Acceptor Type Blue Fluorescent Emitters with Diphenylaminofluorene Derivatives
Preparation of SiO2 Passivation Thin Film for Improve the OLED Life Time
The Effects of Plasma Treatments of ITO Electrode for OLEDs
Helium Atmospheric Pressure Glow Discharge for Three-Dimensional Porous Scaffold as a Pre-Wetting Process
Study on Improvement in Hydrophilic Property of Polymer Film by Pulsed Microplasma
Pulsed Powered Microplasma Diagnostics
Low Temperature Deposition of SiOx Films by HMDSN/O2 Atmospheric Pressure Plasma
Effects of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure
Combinatorial Analysis of Plasma-Polymer Interactions for Soft Material Processing
A High-Fidelity Computational Model of Electromagnetic Wave-Plasma Coupling Effects in Capacitively Coupled Plasma Reactors
Modeling Wave Effects in CCP Reactors using CFD-ACE+
Estimation of the Light Output Power and Efficiency of XeCl Barrier Discharge Excilamp using a Drift--Diffusion Model for Various Voltage Waveforms
The Detailed Measurement of the Electron Density Peak in Microwave Plasma Source with Resonant Cavity for TM Wave
Spatial Plasma Profile of the Dual Frequency Inductively Coupled Plasma Discharge
Spatial Distribution of Dust Particle Controlled in Modulated-13.56 MHz RF Plasmas
In Situ Monitoring of Plasma Etch Processes of Low-k Dielectrics using Quantum Cascade Laser Absorption Spectroscopy
Optical Measurement of Plasma Arcing in RF Discharge
Improvement of Radial Thermal Shielding of a Temperature Gradient Type Thermal Probe
An Indirect Method to Monitor Plasma Status in a Transformer Coupled Plasma
Optical Luminescence of GaN Thin Films Induced by High Energy Electrons in Inductively-Coupled Plasmas
Progress in Plasma Medicine: Plasma Wound Treatment
Detection of Plasma-Induced Damage on Transparent Polymer Films using Total Internal Reflection Microscopy
Improved Thickness Uniformity of Si Layer in SOI wafer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
Formation of High Density Pt Nanodots on SiO2 Induced by Millisecond Rapid Thermal Annealing using Thermal Plasma Jet
Front-End-Friendly Bumpless Wafer-on-Wafer (WOW) Technology for 3D Integration and Applications
Investigation of Si Etch Reaction Induced by SF6/O2 Plasma
Improvement of Thermal Stability of MRAM Device with SiN Protective Film Deposited by Pseudo Remote Plasma CVD
Novel Precursors for SiCH Low-k Caps beyond the 22-nm Node: Reactions of Silacyclopentane Precursors in PECVD Process and Structural Analyses of SiCH Films
Conformal Doping for FinFETs by a Novel Self-Regulatory Plasma Doping Process
Efficient Activation of As Atoms in Ultra Shallow Junction by Thermal Plasma Jet Induced Microsecond Annealing
Auger Electron Spectroscopy Study of the Chemical Reactions on a Plasma Reactor Wall
Study of the Modifications Induced by Plasma VUV Light on Photoresists for the Development of Cure Treatments to Improve Etch Resistance and Linewidth Roughness
Mechanism of 193-nm Resist Cure by DC Superimposed Capacitively-Coupled Plasma
Crystallization Behavior Changes Occurred by N Doping in GeSb Alloy
Different Crystallization Behavior between Ag-Doped and Si-Doped Sb-Rich GeSb Thin Films
Reactive Sputter Deposited Silicon Oxynitride Films under Argon-Carbon Dioxide-Nitrogen Atmospheres
Influence of Nitrogen-Incorporation on the Electrochemical Performance of DLC Coating
Ar/N2 Supermagnetron-Sputter Deposition of a-CNx: H Films under Wafer Bias Application
Epitaxial Growth of (100)ß-FeSi2 Film on 4H-SiC (001)
Cubic Shape of MgO Deposited on Silicon (001)
Metastability of Oxygen Atoms in the Sputter-Deposited ZnO Films
Physical Properties of ZnO Thin Films on Glass and PES Substrates by RF Magnetron Sputtering System
The Surface Energy-Dictated Initial Growth of a Pentacene Film on a Polymeric Adhesion Layer for Field-Effect Transistors
Enhancement of Electron Field Emission Properties of Carbon Nanowalls by N2 Plasma Surface Treatment
Enhancement in Electron Field Emission of Microcrystalline Diamond Films upon Annealing Process with Metal Layers Coating
Deposition of Fluorocarbon Film with 1,1,1,2-tetrafluoroethane Plasma Polymerization Based on RF-Capacitively Couple Mode Discharge
Surface Modification of Polypropylene Membrane by RF Methane/Oxygen Mixture Plasma Treatment
Observation of 193-nm Photoresist Surface Exposed to Etching Plasma Employing C5HF7 Gas Chemistry
Investigation of the Modified ArF Photoresist Surface during Fluorocarbon Plasma Etching Process
Replacement Gate Formation Etch Development
Very Narrow Si Trench Fabrication by New Mask Process
A Study on the High-Aspect-Ratio Si Etch
Global Plasma Modeling Based Analysis of Si Master Etching in the Sidewall Transfer Nanoimprint Lithography using Inductively Coupled Cl2/O2 Plasma
Dry Etching of SiC by using Capacity Coupled Pure NF3 and NF3/Ar Mixture Gas Plasmas
Etching of MTJ (Magnetic Tunnel Junction) Layer using CO/NH3 in an Inductively Coupled Plasma
Etch Properties of the TiN Thin Film in the Metal-Insulator-Metal Capacitor using Inductively Coupled Plasma
Etch Characteristics of TiO2 Thin Films using the Metal-Insulator-Metal Capacitor in a High Density Plasma
A Study on Dry Etching for Profile and Selectivity of ZnO Thin Films by using Inductively Coupled Plasma
Uncooled Microbolometer Fabrication using Step Via Dry Etching Technology
Estimation of Ion/Radical Flux from Mask Selectivity and Etching Rate, Calibrated by Topography Simulation
Measurement of Negative Ions Generated on the Si Etched Surface
High Density F-- Negative-Ion Source by Utilizing Magnetized SF6 Plasma
Capacitively Coupled Radio Frequency Helium Plasma Etch Damage to TiO2 Thin Film Surfaces
Study of Wet-Etch Rate of Plasma-Damaged Surface and Interface Layers and Residual Defect Sites
Mechanism of Damage Generation on Porous SiOCH during Resist Strip using N2/H2 and CO2 Plasmas
Study of Si Surface Roughness in FEOL Etch Applications
Molecular Dynamics Analysis of Surface Roughness during Si Etching in Chlorine-Based Plasmas
C5HF7 Chemistry for Highly Selective Etch of SiO2 over SiN and Si
Mechanisms of Selective Etching for Magnetic Thin Films by Reactive Plasmas for MRAM Applications
Trade-Off Relationship between Si Recess and Defect Density Formed by Plasma-Induced Damage in Planar MOSFETs and the Optimization Strategies
Si Recess of Poly-Si Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion
Comparative Study of Plasma-Charging Damage in High-k Dielectric and p-n Junction and their Effects on Off-State Leakage Current of MOSFETs
Advanced Contactless Analysis of Plasma-Induced Damage on Si by Temperature-Controlled Photoreflectance Spectroscopy