ICRP-7 / SPP-28 / GEC-63

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1 Atomic and Molecular Processes

  • 1.1 Electron and photon collisions with atoms and molecules: excitation
  • 1.2 Electron and photon collisions with atoms and molecules: ionization
  • 1.3 Heavy particle collisions
  • 1.4 Dissociation, recombination and attachment
  • 1.5 Distribution functions and transport coefficients for electrons and ions
  • 1.6 Other atomic and molecular collision phenomena

2 Plasma science

  • 2.1 Nonequilibrium kinetics of low-temperature plasmas
  • 2.2 Basic plasma physics phenomena in low-temperature plasmas
  • 2.3 Plasma boundaries: sheaths, boundary layers, others
  • 2.4 Gas phase plasma chemistry
  • 2.5 Plasma-surface interactions
  • 2.6 Plasma diagnostic techniques
  • 2.7 Modeling and simulation
  • 2.8 Glows: dc, pulsed, microwave, others
  • 2.9 Capacitively coupled plasmas
  • 2.10 Inductively coupled plasmas
  • 2.11 Magnetically-enhanced plasmas: ECR, helicon, magnetron, others
  • 2.12 High pressure discharges: Dielectric barrier discharges, coronas, breakdown, sparks
  • 2.13 Microdischarges: dc, rf, microwave
  • 2.14 Thermal plasmas: arcs, jets, switches, others
  • 2.15 Plasmas in liquids
  • 2.16 Negative ion and dust particle containing plasmas
  • 2.17 Other plasma science

3 Plasma applications

  • 3.1 Plasmas for light production: laser media, glows, arcs, flat panels and novel sources
  • 3.2 Plasma etching
  • 3.3 Plasma deposition
  • 3.4 Plasma Ion Implantation
  • 3.5 Green Plasma technologies: Environmental and energy applications
  • 3.6 Plasma processing for photovoltaic applications
  • 3.7 Biological and biomedical applications of plasmas
  • 3.8 Plasma propulsion and Aerodynamics
  • 3.9 Plasmas for nanotechnologies, flexible electronics and other emerging applications
  • 3.10 Evening session: History and future of plasma processing and collision physics
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