Reviews1 のバックアップソース(No.4)

#author("2023-12-20T15:55:06+09:00","default:ishikawa","ishikawa")
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This is a list of review articles about nanoprocess, nanofabrication, and nanotechnology, including plasma etching and plasma-enhanced film deposition

[2023]

-[267] &color(white,red){OPEN};    Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies
--Japanese Journal of Applied Physics 62 (SA), SA0803 pp. 1-37 (February 2023). [[(DOI):https://doi.org/10.35848/1347-4065/ac9189]]
---Makoto Kambara, Satoru Kawaguchi, Hane June Lee, Kazumasa Ikuse, Satoshi Hamaguchi, Takeshi Ohmori, and ''Kenji Ishikawa''

[2019]

-[202] Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects
--Plasma Processes and Polymers 16 (9), 1900039 (pp. 1-20) (September 5, 2019). [[(DOI):https://doi.org/10.1002/ppap.201900039]]
---Hideshi Miyajima, ''Kenji Ishikawa'', Makoto Sekine, and Masaru Hori

-[195] &color(white,red){Free}; Progress and perspectives in dry processes for leading-edge manufacturing of devices: Toward intelligent processes and virtual product development
--Japanese Journal of Applied Physics 58 (SE), SE0804 (pp. 1-21) (May 30, 2019) [[(DOI):https://doi.org/10.7567/1347-4065/ab163b]]
//---Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, and ''Kenji Ishikawa''

-[194] &color(white,red){Free}; Progress and perspectives in dry processes for emerging multidisciplinary applications: How can we improve our use of dry processes?
--Japanese Journal of Applied Physics 58 (SE), SE0803 (pp. 1-17) (May 30, 2019) [[(DOI):https://doi.org/10.7567/1347-4065/ab163a]]
//---Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, and ''Kenji Ishikawa''

-[193] &color(white,red){Free}; Progress and perspectives in dry processes for nanoscale feature fabrication: Fine pattern transfer and high-aspect-ratio feature formation
--Japanese Journal of Applied Physics 58 (SE), SE0802 (pp. 1-24) (May 30, 2019) [[(DOI):https://doi.org/10.7567/1347-4065/ab1638]]
//---Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, and ''Kenji Ishikawa''

-[192] &color(white,red){Free}; Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
--Japanese Journal of Applied Physics 58 (SE), SE0801 (pp. 1-14) (May 30, 2019) [[(DOI):https://doi.org/10.7567/1347-4065/ab163e]]
//---''Kenji Ishikawa'', Tatsuo Ishijima, Tatsuru Shirafuji, Silvia Armini, Emilie Despiau-Pujo, Richard A. Gottscho, Keren J. Kanarik, Gert J. Leusink, Nathan Marchack, Takahide Murayama, Yasuhiro Morikawa, Gottlieb S. Oehrlein, Sangwuk Park, Hisataka Hayashi, and Keizo Kinoshita

[2018]

-[161] &color(white,red){Free}; &color(white,blue){Etch}; Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?
--Japanese Journal of Applied Physics 57 (6S2), 06JA01(May 25, 2018). [[(DOI):https://doi.org/10.7567/JJAP.57.06JA01]]
---''Kenji Ishikawa'', Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson, and Keizo Kinoshita

[2017]

-[130] &color(white,blue){Etch}; Progress and prospects in nanoscale dry processes - How can we control atomic layer reactions?
--Japanese Journal of Applied Physics 56 (6S2), 06HA02  (June 1, 2017). Progress Review of DPS special issue. [[(DOI):https://doi.org/10.7567/JJAP.56.06HA02]] 
---''Kenji Ishikawa'', Kazuhiro Karahashi, Takanori Ichiki, Jane P. Chang, Steven M. George, W. M. M. Kessels, Hae June Lee, Stefen Tinck, Jung Hwan Um, and Keizo Kinoshita

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