Reviews1

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This is a list of review articles

[2022]

  • [247] [OPEN] Perspectives on functional nitrogen science and plasma-based in situ functionalization
    • Japanese Journal of Applied Physics (2022). (DOI)
      • Kenji Ishikawa
  • [245] [OPEN] Functional nitrogen science based on plasma processing: Quantum devices, photocatalysts and activation of plant defense and immune systems
    • Japanese Journal of Applied Physics (2022). (DOI)
      • Toshiro Kaneko, Hiromitsu Kato, Hideaki Yamada, Muneaki Yamamoto, Tomoko Yoshida, Pankaj Attri, Kazunori Koga, Tomoyuki Murakami, Kazuyuki Kuchitsu, Sugihiro Ando, Yasuhiro Nishikawa, Kentaro Tomita, Ryo Ono, Tsuyohito Ito, Atsushi M. Ito, Koji Eriguchi, Tomohiro Nozaki, Takayoshi Tsutsumi, and Kenji Ishikawa
  • [244] [OPEN] Towards prevention and prediction of infectious diseases with virus sterilization using ultraviolet light and low-temperature plasma and bio-sensing devices for health and hygiene care
    • Japanese Journal of Applied Physics (2022). (DOI)
      • Shinya Kumagai, Chikako Nishigori, Tetsuya Takeuchi, Peter Bruggeman, Keisuke Takashima, Hideki Takahashi, Toshiro Kaneko, Eun Ha Choi, Makoto Kambara, Kazuo Nakazato, and Kenji Ishikawa

[2021]

  • [J9] 大気圧プラズマによるフリーラジカル生成と生物影響 Effects of free radicals generated by atmospheric pressure plasma on physical actions and biochemical relaxations (PACR)
    • 放射線生物研究 Radiation Biology Research Communications 56 (3), pp. 280-294 (October, 2021)
      • Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Hiromasa Tanaka, and Masaru Hori
  • [J8] 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス
    • プラズマ・核融合学会誌 97 (9), pp. 517-521 (September 30, 2021) (in Japanese)
      • Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori (堤 隆嘉,石川 健治,近藤 博基,関根 誠,堀 勝)
  • [J7] 小特集 先端デバイス構造を実現する超絶ドライエッチング技術の最前線 6.おわりに
    • プラズマ・核融合学会誌 97 (9), pp. 534-536 (September 30, 2021) (in Japanese)
      • Kenji Ishikawa, and Keigo Takeda (石川 健治,竹田 圭吾)
  • [J6] 小特集 先端デバイス構造を実現する超絶ドライエッチング技術の最前線 1.はじめに
    • プラズマ・核融合学会誌 97 (9), pp. 508-510 (September 30, 2021) (in Japanese)
      • Kenji Ishikawa, and Keigo Takeda (石川 健治,竹田 圭吾)
  • [228] Free Insights into normothermic treatment with direct irradiation of atmospheric pressure plasma for biological applications
    • Selected Topics in Applied Physics in Japanese Journal of Applied Physics 60, 010502 (pp.1-12) (January, 2021). (DOI)
      • Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, and Kenji Ishikawa
  • [227] Free Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma
    • Selected Topics in Applied Physics in Japanese Journal of Applied Physics 60, 010503 (pp. 1-15) (January, 2021). (DOI)
      • Masafumi Ito, Hiroshi Hashizume, Jun-Seok Oh, Kenji Ishikawa, Takayuki Ohta, and Masaru Hori

[2020]

  • [209] Electron spin resonance as a tool to monitor the influence of novel processing technologies on food properties
    • Trends in Food Science and Technology 100, pp. 77-87 (April 17, 2020) (DOI)
      • Francisco J. Barba, Shahin Roohinejad, Kenji Ishikawa, Sze Ying Leong, Alaa El-Din A Bekhit, Jorge A. Saraiva, and Nikolai Lebovka

[2019]

  • [202] Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects
    • Plasma Processes and Polymers 16 (9), 1900039 (pp. 1-20) (September 5, 2019). (DOI)
      • Hideshi Miyajima, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
  • [195] Free Progress and perspectives in dry processes for leading-edge manufacturing of devices: Toward intelligent processes and virtual product development
    • Japanese Journal of Applied Physics 58 (SE), SE0804 (pp. 1-21) (May 30, 2019) (DOI)
  • [194] Free Progress and perspectives in dry processes for emerging multidisciplinary applications: How can we improve our use of dry processes?
    • Japanese Journal of Applied Physics 58 (SE), SE0803 (pp. 1-17) (May 30, 2019) (DOI)
  • [193] Free Progress and perspectives in dry processes for nanoscale feature fabrication: Fine pattern transfer and high-aspect-ratio feature formation
    • Japanese Journal of Applied Physics 58 (SE), SE0802 (pp. 1-24) (May 30, 2019) (DOI)
  • [192] Free Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
    • Japanese Journal of Applied Physics 58 (SE), SE0801 (pp. 1-14) (May 30, 2019) (DOI)

[2018]

  • [161] Free Etch Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?
    • Japanese Journal of Applied Physics 57 (6S2), 06JA01(May 25, 2018). (DOI)
      • Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson, and Keizo Kinoshita

[2017]

  • [J5] Free 最先端プラズマバイオ技術
    • Japanese Society of Radiation Chemistry 104, 3-14 (October 31, 2017) 放射線化学 (in Japanese) (web)
      • Masaru Hori, Kenji Ishikawa, Takashi Kondo, Hiromasa Tanaka, and Hiroshi Hashizume
  • [133] PM State of the art in medical applications using non-thermal atmospheric pressure plasma
    • Reviews on Modern Plasma Physics 1, 3 (July 3, 2017). (DOI)
      • Hiromasa Tanaka, Kenji Ishikawa, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Fumitaka Kikkawa, Hans-Robert Metelmann, and Masaru Hori
  • [J4] Free ESR PM 電子スピン共鳴法を活用したプラズマバイオ反応プロセスの診断
    • プラズマ核融合学会誌 2017年5月号 小特集「気相-液相反応プロセスにおける診断技術の進展」 (PDF)
      • 石川健治,近藤隆,竹田圭吾,呉準席,橋爪博司,田中宏昌,近藤博基,太田貴之,伊藤昌文,関根誠,堀勝
  • [130] Etch Progress and prospects in nanoscale dry processes - How can we control atomic layer reactions?
    • Japanese Journal of Applied Physics 56 (6S2), 06HA02 (June 1, 2017). Progress Review of DPS special issue. (DOI)
      • Kenji Ishikawa, Kazuhiro Karahashi, Takanori Ichiki, Jane P. Chang, Steven M. George, W. M. M. Kessels, Hae June Lee, Stefen Tinck, Jung Hwan Um, and Keizo Kinoshita

[2014]

  • [P11] ESR PA Diagnostics of plasma-biological surface interactions in low pressure and atmospheric pressure plasmas

Copyright Kenji Ishikawa (c) 2009-2020 Center for Low-temperature plasma sciences, Nagoya University.

Last-modified: 2021-11-12 (金) 23:23:54