Publication

Publication

Total 376 peer-reviewed papers (journal 337 papers + 15 paper in Japanese + 15 peer-reviewed proceedings + 9 other papers);

6655 {7905} total citations ; h-index 38 , {41 Scopus }

Topics FC Fluorocarbon plasmas, HN hydrogen-nitrogen mixture plasmas, APP Atmospheric pressure plasmas, PA Plasma agriculture, and PM Plasma medicine, dia Plasma processes for diamond, C nano-carbon, Si nanocrystalline silicon, GaN Gallium nitrides, MG Metal gates, Pt Platinum,

Methods IR Infrared spectroscopic studies, LIF Laser induced fluorescence, ESR Electron spin (Paramagnetic) resonance, Beam Surface reactions under ion beam irradiation, QC Quantum chemical computation

2026

• [337] OPEN Etch Transient behaviors of radicals and ions of CxFy and SFx during alternative injections C4F8 and SF6 in Ar plasma
  • (Q1) Vacuum 253, 115543 pp. 1-12 (October 1, 2026). (DOI)
    • Taito Yoshie, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa

• [336] OPEN Etch Pt Anisotropic etching of platinum thin film in cyclic removal using low-energy oxygen-ion sputtering and formic acid vapor exposure
  • (Top5%) Applied Surface Science 736, 166731 pp. 1-15 (August 1, 2026). (DOI)
    • Kazuhiro Miwa, Thi-Thuy-Nga Nguyen, Masaru Hori, Kenji Ishikawa, and Daijiro Akagi

• [335] OPEN Etch Unraveling etching mechanism for SiN film in cryogenic hydrogen-fluoride plasmas
  • (Top5%) Chemical Engineering Journal 540, 177378 pp. 1-9 (July 15, 2026). (DOI)
    • Shi-Nan Hsiao, Yusuke Imai, Makoto Sekine, Kenji Ishikawa, Masaru Hori, Ryutaro Suda, and Yoshihide Kihara

• [334] OPEN ESR In situ electron spin resonance evaluation of hydrogen atoms at plasma–liquid interfaces for analysis of perfluorooctanoic acid degradation
  • Plasma Chemistry and Plasma Processing 46, 87 pp. 1-14 (July 10, 2026). (DOI)
    • Kenichi Inoue, Amir Sawires, Camelia Miron, Rikimaru Fujita, Taishi Yamakawa, Takashi Kondo, and Kenji Ishikawa

• [333] OPEN Etch In-situ analysis of TiN surface irradiated chlorine radical at low temperature for thermal desorption in atomic layer etching
  • Japanese Journal of Applied Physics 65, 12SP06 (June 29, 2026). (DOI)
    • Shunya Hirai, Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa

• [332] OPEN Etch (Review) Recent progress in atomic-scale controlled plasma processing
  • (Q2) Japanese Journal of Applied Physics 65,120801 pp. 1-24 (June 20, 2026). (DOI)
    • Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Airah Osonio, Tran Trung Nguyen, Takayoshi Tsutsumi, Lan Li, Kazunori Shinoda, Mi-Young Song, Yong Sup Choi, Igor Kaganovich, and Yevgeny Raites

• [331] Etch Evaluation of Si thin film formed from Si0.7Ge0.3/Si/Si0.7Ge0.3 stacked layers with CF4/H2 plasma for Si-nanosheet formation toward GAA transistor application
  • (Q1) Applied Physics Letters 128 (21), 212105 (May 26, 2026). (DOI)
    • Kotaro Ozaki, Yusuke Imai, Yuki Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuji Yamamoto, Wei-Chen Wen, Ibuki Saburi, and Katsunori Makihara

• [330] OPEN PM Non-thermal plasma-activated methionine-containing Ringer's solution enhances cytotoxicity by increasing oxidative stress
  • (Q2) Journal of Clinical Biochemistry and Nutrition 78 (3), pp. 251-258 (May 1, 2026). (DOI)
    • Kosei Fujisawa, Sakura Tanahashi, Kyoka Katagiri, Soo Takasu, Tomohiro Otsuka, Tetsuro Kamiya, Kenji Ishikawa, Yukihiro Esaka, and Hirokazu Hara

• [329] OPEN Etch Si Etch profiles in silicon in SF6 and O2 plasma based on etch-depth-dependent O/F transport gradient model
  • (Q2) Japanese Journal of Applied Physics 65, 08SP06 pp. 1-9 (April 24, 2026). (DOI)
    • Shuto Tsuchioka, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa

• [328] OPEN C Origins of intrinsic stress in disordered carbon materials: A first-principles study
  • (Q1) Physical Review B 113,134111 pp. 1-11 (April 15, 2026). (DOI)
    • Yusuke Ando, Hu Li, Jian Ping Zhao, Masaaki Matsukuma, Kenji Ishikawa, and Peter Ventzek

• [327] OPEN APP Preliminary study on the visualization and evaluation of non-thermal plasma dose profiles using radiochromic film
  • (Q1) European Physical Journal Plus 141, 375 pp. 1-10 (April 7, 2026). (DOI)
    • Hiroshi Yasuda, Takashi Kondo, and Kenji Ishikawa

• [326] OPEN ESR Quantification of dangling bonds formed by plasma treatment as reactive sites for functionalization of hexagonal boron nitride nanoparticles
  • (Q1) ACS Applied Nano Materials 9 (14), pp. 6080–6089 (April 1, 2026). (DOI)
    • Kenichi Inoue, Naoto Takagi, Tsuyohito Ito, Yoshiki Shimizu, Yukiya Hakuta, Kohzo Ito, Kenji Ishikawa, Masaru Hori, and Kazuo Terashima

• [325] PM Bactericidal properties of tryptophan and pyrrole solutions irradiated by oxygen radicals
  • (Q2) Japanese Journal of Applied Physics 65 (5), 056001 pp. 1-5 (March 2, 2026). (DOI)
    • Daiji Kitagawa, Kenta Shimizu, Takuya Watanabe, Motoyuki Shimizu, Masashi Kato, Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori, and Masafumi Ito

• [324] Etch Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating
  • Journal of Vacuum Science and Technology A 44 (2), 022603 pp. 1-13 (March 1, 2026). (DOI)
    • Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori

• [323] OPEN Etch Formation of SCF+, SCF2+, and CS2+ ions during gas modulation cycles associated with interference between alternating C4F8 and SF6 in Ar plasma
  • (Q2) Japanese Journal of Applied Physics 65 (3), 030904 pp. 1-5 (February 11, 2026). (DOI)
    • Taito Yoshie, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa

• [322] OPEN HFC Photodissociation and electron-collision induced dissociation of C5H2F10 using photoelectron–photoion coincidence spectroscopy and quantum chemistry
  • (Q1) Scientific Reports 16, 5312 pp. 1-15 (January 16, 2026). (DOI)
    • Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and Kenji Ishikawa

• [321] PM ESR Long-term dynamics of nitric oxide radicals in plasma-activated Ringer's lactate solution
  • (Q2) Plasma Processes and Polymers 23 (1), 70122 pp. 1-6 (January 1, 2026). (DOI)
    • Taishi Yamakawa, Kenichi Inoue, Kenji Ishikawa, Masaru Hori, and Hiromasa Tanaka

Before 2025

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