Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substate temperature with a CF4/H2 plasma
Hsiao, SN (Hsiao, Shih-Nan); Britun, N (Britun, Nikolay); Nguyen, TTN (Nguyen, Thi-Thuy-Nga); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Sekine, M (Sekine, Makoto); Hori, M (Hori, Masaru)
Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma
Nguyen, TTN (Nguyen, Thi-Thuy-Nga); Shinoda, K (Shinoda, Kazunori); Hamamura, H (Hamamura, Hirotaka); Maeda, K (Maeda, Kenji); Yokogawa, K (Yokogawa, Kenetsu); Izawa, M (Izawa, Masaru); Ishikawa, K (Ishikawa, Kenji); Hori, M (Hori, Masaru)
Low-temperature reduction of SnO2 by floating wire-assisted medium-pressure H-2/Ar plasma
Nguyen, TTN (Thi-Thuy-Nga Nguyen); Sasaki, M (Sasaki, Minoru); Hsiao, SN (Hsiao, Shih-Nan); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Hori, M (Hori, Masaru)
Plasma Process Polymer 19 (6) e2100209 (2022) DOI: 10.1002/ppap.202100209
On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D-2 Plasma: Comparison with CF4/H-2
Hsiao, SN (Hsiao, Shih-Nan); Nguyen, TTN (Nguyen, Thi-Thuy-Nga); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Sekine, M (Sekine, Makoto); Hori, M (Hori, Masaru)
Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures
Hsiao, SN (Hsiao, Shih-Nan); Britun, N (Britun, Nikolay); Nguyen, TTN (Thi-Thuy-Nga Nguyen); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Sekine, M (Sekine, Makoto); Hori, M (Hori, Masaru)
Plasma Process Polymer 18 (11) 2100078 (2021) DOI: 10.1002/ppap.202100078
Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H-2/Ar plasma at atmospheric pressure
Nguyen, TTN (Thi-Thuy-Nga Nguyen); Sasaki, M (Sasaki, Minoru); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Hori, M (Hori, Masaru)
Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass
Nguyen, TTN (Thi-Thuy-Nga Nguyen); Sasaki, M (Sasaki, Minoru); Odaka, H (Odaka, Hidefumi); Tsutsumi, T (Tsutsumi, Takayoshi); Ishikawa, K (Ishikawa, Kenji); Hori, M (Hori, Masaru)
Journal of Applied Physics 125 (6) 063304 (2019) DOI: 10.1063/1.5081875
Microstructure, near infrared reflectance, and surface temperature of Ti-O coated polyethylene terephthalate fabrics prepared by roll-to-roll high power impulse magnetron sputtering system
One-step inkjet printing of tungsten oxide-poly(3,4-ethylenedioxythiophene):polystyrene sulphonate hybrid film and its applications in electrochromic devices
Nguyen, TTN; Chan, CY and He, JL
Thin Solid Films 603 , pp.276-282 (2016)
Preparation of inkjet-printed titanium monoxide as p-type absorber layer for photovoltaic purposes