Reviews1 のバックアップ(No.4)

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  • 1 (2020-11-20 (金) 22:19:19)
  • 2 (2021-11-12 (金) 23:23:54)
  • 3 (2023-02-18 (土) 14:20:20)
  • 4 (2023-12-20 (水) 15:55:06)
  • 5 (2023-12-20 (水) 20:22:28)

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This is a list of review articles about nanoprocess, nanofabrication, and nanotechnology, including plasma etching and plasma-enhanced film deposition

[2023]

• [267] OPEN Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies
  • Japanese Journal of Applied Physics 62 (SA), SA0803 pp. 1-37 (February 2023). (DOI)
    • Makoto Kambara, Satoru Kawaguchi, Hane June Lee, Kazumasa Ikuse, Satoshi Hamaguchi, Takeshi Ohmori, and Kenji Ishikawa

[2019]

• [202] Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects
  • Plasma Processes and Polymers 16 (9), 1900039 (pp. 1-20) (September 5, 2019). (DOI)
    • Hideshi Miyajima, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

• [195] Free Progress and perspectives in dry processes for leading-edge manufacturing of devices: Toward intelligent processes and virtual product development
  • Japanese Journal of Applied Physics 58 (SE), SE0804 (pp. 1-21) (May 30, 2019) (DOI)

• [194] Free Progress and perspectives in dry processes for emerging multidisciplinary applications: How can we improve our use of dry processes?
  • Japanese Journal of Applied Physics 58 (SE), SE0803 (pp. 1-17) (May 30, 2019) (DOI)

• [193] Free Progress and perspectives in dry processes for nanoscale feature fabrication: Fine pattern transfer and high-aspect-ratio feature formation
  • Japanese Journal of Applied Physics 58 (SE), SE0802 (pp. 1-24) (May 30, 2019) (DOI)

• [192] Free Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
  • Japanese Journal of Applied Physics 58 (SE), SE0801 (pp. 1-14) (May 30, 2019) (DOI)

[2018]

• [161] Free Etch Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?
  • Japanese Journal of Applied Physics 57 (6S2), 06JA01(May 25, 2018). (DOI)
    • Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson, and Keizo Kinoshita

[2017]

• [130] Etch Progress and prospects in nanoscale dry processes - How can we control atomic layer reactions?
  • Japanese Journal of Applied Physics 56 (6S2), 06HA02 (June 1, 2017). Progress Review of DPS special issue. (DOI)
    • Kenji Ishikawa, Kazuhiro Karahashi, Takanori Ichiki, Jane P. Chang, Steven M. George, W. M. M. Kessels, Hae June Lee, Stefen Tinck, Jung Hwan Um, and Keizo Kinoshita