Organization

Committee members for IC-PLANTS

Organizing Committee
Chair

Y. Suzuoki
Nagoya University, Japan

Vice Chair

M. Hori
Nagoya University, Japan

Member

Y. Baba
Nagoya University, Japan

G. Bruce
University of Texas at Dallas, U.S.A.

U. Czarnetzki
Ruhr-University Bochum, Germany

T. Goto
Chubu University, Japan

J. G. Han
Shungkyunkwan University, Korea

R. Hatakeyama
Tohoku University, Japan

M. Hirose
MIRAI Project, Japan

Y. Horiike
National Institute for Material Science, Japan

S. Hosaka
Tokyo Electron Limited, Japan

O. Joubert
National Center for Scientific Research, France

K. Koumoto
Nagoya University, Japan

A. Kono
Nagoya University, Japan

T. Makabe
Keio University, Japan

T. Mizutani
Nagoya University, Japan

M. Nagatsu
Shizuoka University, Japan

T. Ohiwa
Toshiba Corporation, Japan

K. Ono
Kyoto University, Japan

H. Sugai
Chubu University, Japan

O. Takai
Nagoya University, Japan

T. Tanji
Nagoya University, Japan

N. Umehara
Nagoya University, Japan

S. Zaima
Nagoya University, Japan


Executive Committee
Chair

K. Sasaki
Nagoya University, Japan

Member

M. Aramaki
Nagoya University, Japan

T. Ishijima
Nagoya University, Japan

H. Kousaka
Nagoya University, Japan

N. Ohno
Nagoya University, Japan


Program Committee
Chair

M. Sekine
Nagoya University, Japan

Member

J. H. Boo
Sungkyunkwan University, Korea

R. Engeln
Eindhoven University of Technology, Netherlands

P. Favia
University of Bari, Itary

N. Fujiwara
Renesas Technology Corporation, Japan

S. Hamaguchi 
Osaka University, Japan

T. Hayashi
Nagoya University, Japan

M. Hiramatsu
Meijyo University, Japan

T. Ichiki
The University of Tokyo, Japan

M. Izawa
Hitachi Limited, Japan

M. Kondo
AIST(National Institute of Advanced Industrial Science and Technology), Japan

S. Miyazaki
Hiroshima University, Japan

K. Nakamura
Chubu University, Japan

G. Oehrlein
University of Maryland, U.S.A.

L. Overzet
University of Texas at Dallas, U.S.A.

J. Röpcke
Institute of Low Temperature Plasma Physics, Garmany

N. Saito
Nagoya University, Japan

I. Sawada
Tokyo Electron Ltd., Japan

Y. Setsuhara
Osaka University, Japan

M. Shiratani
Kyushu University, Japan

H. Toyoda
Nagoya University, Japan

T. Watanabe
Tokyo Institute of Technology, Japan