Program - IC-PLANTS 2010

Thursday, March 11, 2010

Opening remark (9:20-9:30)
Invited Talks 1 (9:30-12:10)
9:30 I-01	New formation process of solar-grade Si from metallurgical-grade Si by chemical transport in near atmospheric-pressure hydrogen plasma K. Yasutake, H. Ohmi, and H. Kakiuchi Osaka University, Japan, JST, CREST, Japan
10:05 I-02	PLASMAS IN LIQUIDS AND THEIR APPLICATIONS B. Graham Queen’s University Belfast, UK
	Coffee Break (10:40-11:00)
11:00 I-03	Future prospects in plasma etching O. Joubert, E. Pargon, G. Cunge, T. Chevolleau, M. Darnon, L. Vallier, T. David², S. Barnola², and T. Lill³ LTM (CNRS-UJF-INPG), France, ²CEA-LETI, France, ³Applied Materials Inc., USA
11:35 I-04	Plasma nanoscience: synergies and opportunities K. Ostrikov CSIRO Materials Science and Engineering, Australia, The University of Sydney, Australia
	Lunch (12:10-13:30)
Invited Talks 2 (13:30-15:05)
13:30 I-05	Plasma agriculture : Effect of O related radical S. Iseki Nagoya University, Japan
13:55 I-06	Nanobiodevice from Single Biomolecule and Cell Analysis to Biomedical Applications Y. Baba Nagoya University, Japan, National Institute of Advanced Industrial Science and Technology (AIST), Japan
14:30 I-07	PLASMA MEDICINE A. Fridman Drexel University, USA
	Coffee Break (15:05-15:25)
Contributed Talks 1 (15:25-17:05)
15:25 O-01	Bacterial inactivation using atmospheric pressure capillary tube based micro-plasma system with hollow inner electrode C.-C. Weng, T.-Y. Lin, H.-H. Chen, J.-D. Liao, C.-C. Ho², and Y.-T. Ho² National Cheng Kung University, Taiwan, ²Taiwan Plasma Corp., Taiwan
15:45 O-02	Plasma needle treatments of the human peripheral blood-derived multipotent mesenchymal stem cells (hPB-MSC) S. Lazovic´ , N. Puac? , M. Miletic´ ², D. Maletic´ , G. Malovic´ , D. Bugarski³, S. Mojsilovic´ ³, P. Milenkovic´ ², and Z. Lj. Petrovic´ Institute of Physics, Serbia, ²Faculty of Stomatology, Serbia, ³Institute for the Medical Research, Serbia
16:05 O-03	Computer simulation of 3C-SiC powder production at initial stage of nucleation A. Bondareva, and G. Zmievskaya M.V. Keldysh institute of applied mathematics of Russian Academy of Sciences, Russia
16:25 O-04	Raman and AFM studies of fabricated Graphitic Carbon Nanostructures on n-Si <111> With Extremely Non-Equilibrium Plasma conditions Y. Malhotra, S. Roy, and M.P. Srivastava University of Delhi, India
16:45 O-X^*	Study of hafnium oxide nano-scale film deposited using Dense Plasma Focus as a gate dielectric for a MOS device A. Srivastava, and Y. Malhotra² Indian Institute for Information Technology, India, ²University of Delhi, India * Abstract page P-49
Poster Session (17:10-18:40)
P-01	In-situ growth of a single nano needle on a metal whisker induced by periodically scanning electron beam and its field emission property B. Liang, C. Chen, A. Ogino, and M. Nagatsu Shizuoka University, Japan
P-02	Non-isothermal Growth of Carbon Nanotubes F.-L. Lu, W.-Y. Chen, and J.-M. Ting National Cheng Kung University, Taiwan
P-03	Synthesis and Fabrication of Functional Nanomaterials J. Hahm Penn State University, USA
P-04	In-situ observations of growth processes of carbon nanowalls using spectroscopic ellipsometry K. Yasuda, S. Kondo, K. Yamakawa2, H. Kondo, M. Hiramatsu3, M. Sekine, and M. Hori Nagoya University, Japan, ²Katagiri Engineering Co., Ltd., Japan, ³Meijo University, Japan
P-05	Identification of carbon nanostructures obtained by synthesis of powder residues from discarded tires R. Mis-Fernandez, C.R. Rios-Soberanis, J. Arenas-Alatorre², and J.A. Azamar-Barrios³ Centro de Investigacion Cientifica de Yucatan, Unidad de Materiales, Mexico, ²Instituto de Fisica de la UNAM, Departamento de Materia Condensada, Mexico, ³Centro de Investigacion y de Estudios Avanzados (CINVESTAV) del IPN-Unidad Merida, Mexico
P-06	Investigation of influence of Single Carbon Nano Wall structure on Field Effect Transistor electrical parameters and characteristics A. Malinowski^1,2,3, M. Hori¹, M. Sekine¹, H. Kondo¹, L. Lukasiak², A. Jakubowski², and D. Tomaszewski³ ¹Nagoya University, Japan, ²Warsaw University of Technology, Poland, ³Institute of Electron Technology, Poland
P-07	Dense Plasma Focus assisted formation of Carbon Nanoloops on Quartz substrate S. Roy, and M.P. Srivastava University of Delhi, India
P-08	Synchrotron X-ray diffraction analyses of carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition system H. Kondo, W. Takeuchi, S. Kondo, K. Yamakawa², M. Hiramatsu³, M. Sekine, and M. Hori Nagoya University, Japan, ²Katagiri Engineering Co. Ltd., Japan, ³Meijo University, Japan
P-09	Diamond Deposition on Thick Substrates by Cooled Acetylene/Oxygen Combustion Flame Y. Ando Ashikaga Institute of Technology, Japan
P-10	Increase of Young’s modulus of diamond-like carbon by using Adamantane as Precursor Material in Plasma-Enhanced CVD S. Moroto, H. Kousaka, and N. Umehara Nagoya University, Japan
P-11	Hardness increase of amorphous carbon film coated by pulsed-plasma ablation of PTFE S. Kawara, H. Koizumi², H. Kousaka, K. Yamada³, and N. Umehara Nagoya University, Japan, ²Japan Aerospace Exploration Agency, Japan, ³Asahi Glass Co. Ltd., Japan
P-12	The rotational temperature of the CH radical differentiates hydrogenated amorphous carbon etching from deposition T.A.R. Hansen, P.G.J. Colsters, M.C.M. van de Sanden, and R. Engeln Eindhoven University of Technology, The Netherlands
P-13	Light Extraction Enhancement of GaN-based Light Emitting Diodes using Nano-patterned Sapphire Substrates S.-M. Kim, H.-S. Oh, J.-H. Baek, S.-Y. Park², and W.-H. Huh² Korea Photonics Technology Institute (KOPTI), Korea, ²Extol Inc., Korea
P-14	Simulation and Experimental Verification of Inductively-Coupled Fluorocarbon Plasmas F. Itazu, K. Nakamura, and M. Tanaka² Chubu University, Japan, ²PEGASUS Software Inc., Japan
P-15	Applying Reactive Ion Etching for the Fabrication of PhoXonic Crystals D. Dudek, V. Reboud, N. Kehagias, J. Cuffe, and C.S. Torres^1,2 Catalan Institute of Nanotechnology and (ICN-CIN2) Campus Bellaterra, Spain, ²Institute for Research and Advanced Studies, Spain
P-16	Dissociation channel of c-C₄F₈ to CF₂ radical in reactive plasma T. Hayashi, K. Ishikawa, M. Sekine, M. Hori, A. Kono, and K. Suu² Nagoya University, Japan, ²ULVAC Inc., Japan
P-17	ANISOTROPIC DRY ETCHING OF ZnO FILMS IN FLUORINE-BASED INDUCTIVELY COUPLED PLASMAS J.C. Park, H.W. Kim, H.J. Jeong², J.H. Koo², G.W. Lee², B.W. Lee², and H. Cho Pusan National University, Korea, ²Korea Maritime University, Korea
P-18	Investigation of VHF Capacitively Coupled Plasma with DC Bias for Low-k film Etching Process T. Kimura, T. Yamaguchi, K. Takeda^1,2, C. Koshimizu³, M. Sekine^1,2, and M. Hori^1,2 Nagoya University, Japan, ²JST-CREST, Japan, ³Tokyo Electron AT Limited, Japan
P-19	The Improvement of Metal Etch Under Cut Margin with normal temperature process K.-H. HAN^1,2, J.-K. LEE², J.-H. SANG², D.-W. KIM, and D.-H. KIM¹ ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-20	In Situ Fourier Transform Infrared Diagnostics of Surface Reaction Layers and Reaction Products in Cl₂ Plasma Etching of Si H. Miyata, H. Tsuda, Y. Takao, K. Eriguchi, and K. Ono Kyoto University, Japan
P-21	Improvement of Active Pixel Sensor Open Etch Process J.-H. YOO^1,2, D.-H. KIM¹, J.-J. PARK², J.-S. HYUN², B.-G. JEON², and S.-I. KIM² ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-22	Atomic-scale analysis of plasma-surface interactions and feature profile evolution by molecular dynamics approaches H. Tsuda, T. Nagaoka, Y. Takao, K. Eriguchi, and K. Ono Kyoto University, Japan
P-23	The Improvement of 90nm Metal Etch Under Cut Margin with normal temperature process K.-H. HAN^1,2, J.-K. LEE², J.-H. SANG², D.-W. KIM, and D.-H. KIM¹ ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-24	Discharge properties of diamond etched by reactive ion etcher with MgO electrode T. Misu, S. Ono, T. Higa, M. Goto, K. Koh, and T. Arai Kanagawa Institute of Technology, Japan
P-25	Investigation of Si₃N₄ liner disappearance caused by high density plasma at shallow trench isolation process B.-C. CHOI^1,2, T.-J. KIM², E.-G. LEE², J.-S. PARK², R.-K. LEE², B.-S. KIM², and D.-H. KIM¹ ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-26	Effects of Plasma Process Fluctuation on Variation in MOS Device Parameters K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, Y. Takao, and K. Ono Kyoto University, Japan
P-27	Study of high voltage transistor (HVTR) leakage path modeling at shallow trench isolation structure D.-M. SEO^1,2, J.-K. LEE², J.-H. SANG², and S.-O. Choi² ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-28	Role of Oxygen atoms in the Growth of Magnetron Sputter-Deposited ZnO Films A. Morita, J. Jin, and H. Shirai Saitama University, Japan
P-29	Withdrawn
P-30	New roll coater using microwave plasma for touch screen manufacturing I. Liang, H. Ogawa, K. Kato², K. Iseki³, and H. Sugai Chubu University, Japan, ²Nagoya Industrial Research Institute, Japan, ³Toyobo Co. Ltd, Japan
P-31	Comparison of wire properties and reliability(TCT,PCT,HTST) between Au-Ag-Pd and 4N Au Wire bonding M.-I. KIM^1,2, B.-J. KIM², S.-M. Yang², S.-H. LEE², C.-S. LEE², S.-M. SHIN², and D.-H. KIM¹ ¹Samsung Institute of Technology (SSIT) University, Korea, ²Samsung Electronics Co. Ltd., Korea
P-32	Evaluation of Plasma Sheath Thickness in Reactive Plasmas by Discrete Ion-Focusing Effect E. Stamate, and M. Draghici Technical University of Denmark, Denmark
P-33	Deposition of transparent conductive films by a DC Arc Plasmatron O.V. Penkov, V.Yu. Plasksin, S.B. Joa, C.H. Kim, and H.J. Lee Jeju National University, Korea
P-34	Deodorant of Sweat by TiO₂ Coated on Wool Textile Using Atmospheric Plasma Jet Supplied with TTIP Solution M. Hayakawa, S. Parajulee, and S. Ikezawa Chubu University, Japan
P-35	Plasma Effect on the Physical Properties of Tin Oxide Thin Film M. Medhat, H.M. El-Sayed, M.A. Saudy, and M. Saleh Ain Shams University, Egypt
P-36	Development of Scratch Test Methodology and Characterization of Surface Damage of Ti (O, N) Film S. Parajulee, M. Hayakawa, and S. Ikezawa Chubu University, Japan
P-37	Atmospheric PECVD deposition of nanostructured titanium oxide thin layers by means of barrier-torch discharge S. Kment, O. Churpita, Z. Hubicka, M. Cada, J. Olejnicek, P. Kluson², and L. Jastrabik Institute of Physics AS CR, Czech Republic, ²Institute of Chemical Process Fundamentals AS CR, Czech Republic
P-38	Microstructure of Ni-Based Metallic Glass Coating by Gas Tunnel Type Plasma Spraying A. Kobayashi, T. Kuroda, H. Kimura², and A. Inoue² Osaka University, Japan, ²Tohoku University, Japan
P-39	Visible light active Photocatalytic properties of nanocrystalline TiO₂ Synthesized by Reactive Plasma Processing M. Vijay, V. Selvarajan, K.P. Sreekumar², and P.V. Ananthapadmanabhan² Bharathiar University, India, ²Bhabha Atomic Research Centre, India
P-40	TiO₂ Coating Fabricated by Atmospheric Pressure Microwave Plasma Spray Using Suspension T. Kondo, T. Yasui, and M. Fukumoto Toyohashi University of Technology, Japan
P-41	Optical characterization of TiO₂-based plasma sprayed coatings for photocatalytic applications P. Ctibor Academy of Sciences of the Czech Republic, Czech Republic
P-42	Enhancement of Reactive Atmospheric Plasma Sprayed Aluminum Particles M. Shahien, M. Yamada, T. Yasui, and M. Fukumoto Toyohashi University of Technology, Japan
P-43	Synthesis of DNA Conjugated Gold Nanoparticles Using Gas-Liquid Interfacial Plasmas Q. Chen, T. Kaneko^1,2, and R. Hatakeyama Tohoku University, Japan, ²CREST/JST, Japan
P-44	Deposition of Hydrophobic Nano-Film on Polymeric Surface with Radio Frequency Fluorocarbon Plasma Polymerization C. Huang, C.-I. Lin, C.-H. Pan, and C.-Y. Tsai Yuan Ze University, Taiwan
P-45	Study of the interaction mechanism of colloidal nanoparticles with laser beam A. Pyatenko, and N. Koshizaki National Institute of Advanced Industrial Science and Technology (AIST), Japan
P-46	Non-linear properties of lead-based PMN-PT solid solution nanocomposites J.-W. Hyun, Y.-J. Kim, and J.-W. Park Dankook University, Korea
P-47	Fabrication of Gold Nanoparticles in Supercritical CO₂-Assisted Pulsed Laser Ablation S. Machmudah, Y. Kuwahara, Wahyudiono, M. Sasaki, and M. Goto Kumamoto University, Japan
P-48	Porosity in solids: computer simulation of blistering at nucleation fluctuation stage A. Bondareva, and G. Zmievskaya M.V. Keldysh institute of applied mathematics of Russian Academy of Sciences, Russia
P-50	Charging and Magnetizing Characteristics of Co Nanodots K. Makihara, A. Kawanami, M. Ikeda, R. Ashihara, and S. Miyazaki Hiroshima University, Japan
P-51	Effect of different sputtering time on the synthesis of copper nano particles grown on AISI 304 substrate by cylindrical magnetron sputtering system M. Ghoranneviss, M. Eshghabadi, and A. Mahmoodi Science and research branch center I.A.U, Iran
P-52	Quasi-Bragg grating with sub-wavelength particles K. Ishikawa, N. Ebizuka, K. Takeda, H. Kondo, M. Sekine, and M. Hori Nagoya University, Japan
P-53	Toxicity of CIGS nano-particles S. Iwashita, H. Miyata, Y. Yamada, K. Koga, M. Shiratani, M. Hirata, Y. Kiyohara, and A. Tanaka Kyushu University, Japan
P-54	Mass Spectrometric Measurement of Neutral Radicals in SiH₄/H₂ High Density Microwave Plasma T. Kuroda, T. Ishijima, and H. Toyoda Nagoya University, Japan
P-55	Microcrystalline Silicon Film Deposition by 915 MHz High-Density Microwave Plasma J. Sakai, T. Ishijima, and H. Toyoda Nagoya University, Japan
P-56	Analysis of Plasma Interactions with Soft Materials Using Combinatorial Plasma Process Analyzer K. Takenaka^1,4, Y. Setsuhara^1,4, K. Cho^1,4, M. Shiratani^2,4, M. Sekine^3,4, and M. Hori^3,4 ¹Osaka University, Japan, ²Kyushu University, Japan, ³Nagoya University, Japan, ⁴Japan Science and Technology Agency, CREST, Japan
P-57	Protein patterning with selective adsorption on surface by partial plasma polymerization H. Takahashi, T. Ii, A. Irie, and H. Muguruma Shibaura Institute of Technology, Japan
P-58	Experimental Verification of Etching Effect of Microorganism Due to Oxygen Radicals Y. Zhao, A. Tsukasaki, A. Ogino, and M. Nagatsu Shizuoka University, Japan
P-59	Study of bacteria sterilization at low discharge voltage by using microplasma Y. Komuro, M. Blajan, and K. Shimizu Shizuoka University, Japan
P-60	Analysis of plant nutrients by laser-induced breakdown spectroscopy T. Ohta, K. Yamamoto, and M. Ito² Wakayama University, Japan, ²Meijo University, Japan
P-61	Surface-wave Plasma Induced Grafting Polymerization of Polyethylene Glycol onto Polymer Surface and Immobilization of L-Cysteine Z. Shao, S. Noguchi, A. Ogino, and M. Nagatsu Shizuoka University, Japan
P-62	Decomposition of Dimethyl Sulfide(DMS) using Atmospheric Argon Micro-plasma System H.-H. Chen, C.-C. Weng, J.-D. Liao, W.-H. Kang, L.-M. Whang, C.-C. Chao, and J.-E. Chang National Cheng Kung University, Taiwan
P-63	Observation of Microwave Plasma Ignition in Water using High-Speed Camera and Calculation of Temperature Distribution around Coaxial Electrode Y. Hattori, S. Mukasa, S. Nomura, and H. Toyota Ehime University, Japan
P-64	Control of plasma and cavitation bubble in liquid-phase laser ablation by applying supersonic wave A. Fujikawa, N. Takada, and K. Sasaki Nagoya University, Japan
P-65	Surface Activation of Poly (vinylidene fluoride) Membrane by Cyclonic Atmospheric Pressure Plasma Processing R.-S. Juang, H.-Y. Cheng, C.-Y. Tsai, Y.-C. Chang, and C. Huang Yuan Ze University, Taiwan
P-66	Hollow plate effects on microwave plasma production at high pressure S. Ohta, I. Liang, K. Kato², K. Nakamura, and H. Sugai Chubu University, Japan, ²Nagoya Industrial Research Institute, Japan
P-67	Hydrothermal Pulsed Discharge Plasma for Conversion of Organic Compounds Wahyudiono, M. Mitsugi, H. Watanabe, K. Nagafuchi, T. Kiyan, M. Sasaki, H. Akiyama, and M. Goto Kumamoto University, Japan
P-68	Measurements of electron energy distribution accelerated in the cathode region in CCP by using energy analyzer T. Matsubara, T. Muranaka, T. Hayashi, A. Kono, N. Mizutani², and K. Suu² Nagoya University, Japan, ²ULVAC Inc., Japan
P-69	Deposition of Zn_1-xMn_xO thin films by Atmospheric Barrier-Torch Discharge and measurement of electron density from Stark broadening of Hb J. Olejnicek, O. Churpita, Z. Hubicka, S. Kment, M. Cada, A. Dejneka, and L. Jastrabik Institute of Physics AS Cr, Czech Republic
P-70	Saturation of the Balmer-a line of atomic hydrogen in diode laser absorption spectroscopy R. Asakawa, M. Goto², and K. Sasaki Nagoya University, Japan, ²National Institute for Fusion Science, Japan
P-71	Time Resolved Measurement of Hb Emission from Atmospheric-Pressure Pulsed Microwave Plasma A. Kamata, H. Yang, T. Ishijima, and H. Toyoda Nagoya University, Japan
P-72	Measurement of Multiphoton Ionization Efficiency Relevant to Laser Thomson scattering diagnostics Y. Matsuda, M. Aramaki, and A. Kono Nagoya University, Japan
P-73	Emission spectroscopy of microplasma in Ar/N₂ mixture for surface treatment applications M. Blajan, S. Muramatsu, A. Umeda, and K. Shimizu Shizuoka University, Japan
P-74	Measurement of plasma parameters of atmospheric pressure microplasma jet excited by microwave T. Shirasaki, M. Aramaki, and A. Kono Nagoya University, Japan
P-75	Surface Loss Probabilities of H, N Radicals in Afterglow Plasma C.S. Moon, K. Takeda, S. Takashima², M. Sekine^1,5, Y. Setsuhara^3,5, M. Shiratani^4,5, and M. Hori^1,5 Nagoya University, Japan, ²Plasma Center for Industrial Applications, Japan, ³OsakaUniversity, Japan, ⁴Kyushu University, Japan, ⁵Japan Society of Technology Agency, Japan
P-76	Measurements of molecular nitrogen densities in sparkplug assisted atmosphericpressure microwave discharges using rotational Raman scattering M. ElSabbagh, S. Kado², M. Kaneko³, Y. Ikeda³, and K. Sasaki Nagoya University, Japan, ²The University of Tokyo, Japan, ³Imagineering Inc., Japan
Posters from Student Oral Session on The 2nd International Student Workshop on Electrical Engineering (15:15-16:55) program
PS-1	A Stable Large-Volume Fluorine Negative-Ion Source for Ultrafine Etching M Abid Imtiaz, T. Mieno Shizuoka University, Japan
PS-2	Effects of amplitude modulation of RF discharge voltage on ion saturation current Hiroshi Miyata, Shinya Iwashita, Yasuyuki Yamada, Kazunori Koga, Masaharu Shiratani Kyusyu University, Japan
PS-3	Synthesis dynamics of nanoparticles produced by laser ablation of a solid target immersed in pressurized water Wafaa Soliman, Noriharu Takada, Koichi Sasaki Nagoya University, Japan
PS-4	XPS Analysis of Plasma-Polymer Interactions for Organic-Inorganic Hybrid Materials Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori Osaka University, Japan
PS-5	Hα emission intensity measurements of H₂ + Ar + C₇H₈ plasmas in H-assisted plasma CVD reactor Takuya nomura, Yuki Korenaga, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori Kyushu University, Japan
PS-6	Ar/H₂O plasma treatment of multiwall carbon nanotubes for dispersion Improvement in water Changlun Chen, Akihisa Ogino, Bo Liang, Masaaki Nagatsu Shizuoka University, Japan
PS-7	Deposition of n-type a-Si:H using SiH₄+PH₃ multi-hollow discharge plasma CVD Kenta Nakahara, Hiroshi Sato, Yuuki Kawashima, Kazunori Koga, Masaharu Shiratani Kyushu University, Japan
PS-8	Surface temperature rise of a-Si:H films during deposition in silane multi-hollow discharges Yuki Kawashima, Kenta Nakahara, Hiroshi Sato, William Makoto Nakamura, Kazunori Koga, Masaharu Shiratani Kyushu University, Japan
PS-9	Numerical Analysis on Heat Convection in the Synthesis of Single Walled Carbon Nanotubes by Arc Vaporization Guodong Tan, Tetsu Mieno Shizuoka University, Japan
PS-10	Effect of Post-Baking on Copper Adhesion to Polyimide Films Treated by High Density Microwave Plasma Kenji Usami, Tatsuo Ishijima, Hirotaka Toyoda, Kiyoshi Iseki, Hideo Sugai Nagoya University, Japan
	Banquet (19:00-20:30)

Friday, March 12, 2010

Special session on Frontier science of interactions between plasmas and nano-interfaces (9:00-11:50)
9:00 S-01	Frontier science of interactions between plasmas and nano-interfaces M. Shiratani, and K. Koga Kyushu University, Japan
9:30 S-02	Nano-interface plasmas generated in supercritical fluids and their application to nanomaterials processing K. Terashima, S. Stauss, H. Miyazoe, T. Shizuno, and K. Saito The University of Tokyo, Japan
10:00 S-03	Plasmas Involving Liquid Media, and Their Applications T. Shirafuji, Y. Noguchi, J. Hieda, N. Saito, and O. Takai Nagoya University, Japan
	Coffee Break (10:30-10:50)
10:50 S-04	Physical control of plasma and cavitation bubble in liquid-phase laser ablation K. Sasaki, and N. Takada Nagoya University, Japan
11:20 S-05	Atmospheric Glow Discharges with Liquid Electrode ? Toward Understanding of Plasma-Liquid Interface ? F. Tochikubo, N. Shirai, and S. Uchida Tokyo Metropolitan University, Japan
	Lunch (11:50-13:00)
Invited Talks 3 (13:00-14:10)
13:00 I-08	Modelling of chlorine inductive discharges P. Chabert, and E. Despiau-Pujo Ecole Polytechnique, France
13:35 I-09	Plasma functionalized carbon nanomaterials for nanocomposite bio-scaffolds and cell viability effects O.J. Yoon, H.J. Lee², S.S. Kim², and N.-E. Lee Sungkyunkwan University, Korea, ²Chung Ang University, Korea
Contributed Talks 2 (14:10-15:10)
14:10 O-05	Population inversion in a magnetized thermal plasma investigated by active and passive spectroscopy W.E.N. van Harskamp, O. Gabriel², D.C. Schram, M.C.M. van de Sanden, and R. Engeln Eindhoven University of Technology, The Netherlands, ²Helmholtz-Zentrum fur Materialien und Energie GmbH, Germany
14:30 O-06	Ultrafast heating in air at atmospheric pressure for nanotechnology applications D.Z. Pai, G.D. Stancu, F. Kaddouri, D.A. Lacoste, and C.O. Laux Ecole Centrale Paris, France
14:50 O-07	Anisotropic film construction using plasma nanotechnology (atomic polymerization) L. Hoferek, R. Trivedi, J. Mistrik^1,2, and V. Cech Brno University of Technology, Czech Republic, ²University of Pardubice, Czech Republic
	Coffee Break (15:10-15:30)
Invited Talks 4 (15:30-17:50)
15:30 I-10	Tailoring nanostructures with low-temperature plasmas U. Cvelbar Jozef Stefan Institure, Slovenia (EU)
16:05 I-11	Focused Inert Ion Beam systems for 3D rock tomography on the nano-scale R. Boswell, and T. Senden RSPE, ANU, Australia
16:40 I-12	ZnO nano-materials: Synthesis, Characteristic, and Application S.-H. Nam, M.-H. Kim, S.-D. Lee, B. Hong, Y.-J. Kim, and J.-H. Boo Sungkyunkwan University, Korea
17:15 I-13	With the aim of establishing low-cost fabrication technology for high-performance nitride-based light emitters H. Amano, M. Iwaya, S. Kamiyama, and I. Akasaki Meijo University, Japan
Closing remark (17:50-18:00)

Thursday, March 11, 2010

Opening remark (9:20-9:30)

Invited Talks 1 (9:30-12:10)

Invited Talks 2 (13:30-15:05)

Contributed Talks 1 (15:25-17:05)

Poster Session (17:10-18:40)

Posters from Student Oral Session on

Friday, March 12, 2010

Special session on Frontier science of interactions between plasmas and nano-interfaces (9:00-11:50)

Invited Talks 3 (13:00-14:10)

Contributed Talks 2 (14:10-15:10)

Invited Talks 4 (15:30-17:50)

Closing remark (17:50-18:00)