Publication

Publication

Total 348 peer-reviewed papers (journal 310 papers + 14 paper in Japanese + 15 peer-reviewed proceedings + 9 other papers);

5382 {6586} total citations ; h-index 34 , {38 Scopus }

Topics FC Fluorocarbon plasmas, HN hydrogen-nitrogen mixture plasmas, APP Atmospheric pressure plasmas, PA Plasma agriculture, and PM Plasma medicine, dia Plasma processes for diamond, C nano-carbon, Si nanocrystalline silicon, GaN Gallium nitrides

Methods IR Infrared spectroscopic studies, LIF Laser induced fluorescence, ESR Electron spin (Paramagnetic) resonance, Beam Surface reactions under ion beam irradiation, QC Quantum chemical computation

2025

• [310] OPEN Q1 Etch Selective dry etching of TiAlC over TiN using nonhalogen N2/H2 plasma
  • Applied Surface Science 691, 162665 pp. 1-13 (May 15, 2025). (DOI)
    • Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori

• [309] OPEN Q1 Etch Low-temperature atomic layer etching of platinum via sequential wet-like reactions of plasma oxidation and complexation
  • Applied Surface Science 687, 162325 pp. 1-15 (April 1, 2025). (DOI)
    • Thi-Thuy-Nga Nguyen, Daijiro Akagi, Takeshi Okato, Kenji Ishikawa, and Masaru Hori

• [308] OPEN Q1 HFC Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2
  • Scientific Reports 15, 9507 pp. 1-10 (March 18, 2025). (DOI)
    • Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, and Kenji Ishikawa

• [307] OPEN Q1 Etch Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3
  • Applied Surface Science 684, 161815 pp. 1-10 (March 1, 2025). (DOI)
    • Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and Kenji Ishikawa

• [306] Review Developments in low-temperature plasma applications in Asia
  • Reviews of Modern Plasma Physics 9, 6 pp. 1-72 (February 8, 2025). (DOI), allotment writing the section of 5 Plasma‑assisted material processing, pp. 37-47
    • Pankaj Attri, Kenji Ishikawa, Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani

• [305] OPEN C Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices
  • ACS Applied Nano Materials 8 (6), pp. 2660–2668 (February 2, 2025). (DOI)
    • Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Mineo Hiramatsu, and Masaru Hori

• [304] OPEN PM Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer' s lactate solution
  • Faraday Discussions 257, pp. 212-223 (February 1, 2025). (DOI)
    • Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, Kenji Ishikawa, and Yasufumi Takahashi

• [303] OPEN Q1 C Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor
  • Applied Surface Science 681, 161485 pp. 1-10 (February 1, 2025). (DOI)
    • Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Kenji Ishikawa, and Masaru Hori

• [302] GaN Etch Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400°C
  • Journal of Vacuum Science and Technology B 43, 022202 pp. 1-13 (January 27, 2025). (DOI)
    • Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori

• [301] OPEN C Analysis of the synergetic effect of process parameters of hydrogenated amorphous carbon deposition in plasma-enhanced chemical vapor deposition using machine learning
  • Diamond & Related Materials 151, 111687 pp. 1-12 (January 1, 2025). (DOI)
    • Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Before 2024

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