Home のバックアップ(No.117)

HIGHLIGHTS †

Review has been published.

Plasma-assisted material processing (Go to publication (link)). Plasma process hierarchy comprises heterogeneous phases of plasma, sheath, and surface (Link to Fig), Mechanisms behind the cyclic atomic layer etching processes (Link to Fig.)

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Grant-in-Aid for Transformative Research Areas (A) has been started from April, 2024

Project area name is "Plasma-driven seed memory operation: Frontiers in molecular dynamics in seeds driven by plasma"

24H02254 "プラズマ駆動生化学反応の学理構築：活性種の動態解析" (KAKEN) Principal investigator: Kenji Ishikawa

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Plasma-based in situ functionalization based on functional nitrogen science

Functional nitrogen science is now emerged for effective utilization of reactive nitrogen species (RNS). The technologies are related to water and air plasma-based nitrogen fixation. Electron impact reactions and chemical reactions among nitrogen, oxygen, and hydrogen, can occur on non-equilibrium plasma processing. Key issues are on in situ generation of RNS at the point of use and plasma-based nitrogen cycles of ammonia and nitric acid. (link to) Ishikawa Jpn. J. Appl. Phys. 61 SA0802 (2022).

Nitrogen derivatives (Diagram): Short-lived nitrogen derivatives react to generate various RNS in situ through oxidation and hydrogenation.

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Upcoming meeting †

Color: Oversea, Domestic

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2025

April 1, 2025: Guest from Tokyo Electron US, Austin, Texas USA.

April 3, 2025: 大阪大学

April 4, 2025: Guest from North Carolina State University, USA.

April 7, 2025: 新人歓迎会

April 10, 2025: 見学

April 10, 2025: 相談会

April 10, 2025: 岐阜大学，岐阜薬科大学

April 12, 2025: サタデーモーニングプラズマ講座　於：オンライン

April 12, 2025: 応用物理学会プラズマエレクトロニクス分科会幹事会　於：名古屋大学

April 14-17, 2025: UPWARDS Global meeting at Boise State University, USA.

April 17, 2025: Meeting at Boise State University, USA.

April 21, 2025: 講義「電気物理数学」1,2限（8:45-12:00）於：232

April 22, 2025: (Closed) R052 DXプラズマ研究会　2025年度第1回研究会　於：東京

April 24, 2025: 相談会

April 25, 2025: 安全講習会，新人歓迎会

April 25, 2025: 最先端半導体レクチャー　半導体が拓く未来（JEIDA）　於：TELオーディトリアム

May 7, 2025: 福岡3DICセンター

May 9, 2025: ISPlasma2026 組織委員会

May 9, 2025: 最先端半導体レクチャー　最先端テクノロジにおける設計プラットフォーム（TSMC）　於：TELオーディトリアム

May 14, 2025: 大学院特別講義　彦坂（Ramseed）

May 16, 2025: 講義「電気電⼦情報⼯学序論」　4限（14:45-16:15）於：IB⼤講義室　「電荷もつ電⼦とイオンの集団はプラズマと呼ばれ，私たちの⾝の回りの電⼦機器を製造するために使われている．このプラズマプロセスについて説明し，この講義ではプラズマの⽣体作⽤などにも触れ，プラズマエレクトロニクスの全体像について紹介する．」

May 18-20, 2025: IPPD The 2nd Global Forum and International Conference on Industrial Plasma Processes and Diagnostics 2025 (IPPD 2025), to be held at IIT Delhi, India. Dr Tanaka will have an invited talk.

May 21, 2025: 会議

May 22-25, 2025: 第78回日本酸化ストレス学会学術集会於：ミナカ小田原コンベンションホール・ホテル天成園　(Web)

May 23, 2025: 最先端半導体レクチャー　フラッシュメモリのこれから（Kioxia　福原成太）　於：TELオーディトリアム

May 28, 2025: 教務委員会

May 29, 2025: 相談会

June 5-6, 2025: (not attend) 22nd International Workshop on Junction Technology (IWJT2025) to be held at Kyoto University Kihada Hall (Uji Campus). (Web)

June 6, 2025: 最先端半導体レクチャー　これからの自動車半導体（デンソー）　於：TELオーディトリアム

June 8-12, 2025: IWOPA International Workshop on Plasma Agriculture (IWOPA) to be held at Philadelphia, USA. (Web)

June 8-12, 2025: 2025 Symposium on VLSI Technology and Circuits “Cultivating the VLSI Garden: From Seeds of Innovation to Thriving Growth“ to be held at Rihga Royal Hotel Kyoto, Japan. (Web)

June 9, 2025: TSMC's day　於：名古屋大学

June 11-14, 2025: (not attend) EM-NANO 2025 on topic of Organic and Inorganic Electronic Materials and Related Nanotechnologies, to be held in Fukui City, Japan. (Web)

June 14-15, 2025: Summer school of low temperature plasma at Minneapolis, USA

June 15-20, 2025: ISPC 26th International Symposium on Plasma Chemistry (ISPC) at Minneapolis, USA (Web)

June 20, 2025: 最先端半導体レクチャー　アナログファウンドリ事業（パワーパートナーズ）　於：TELオーディトリアム

June 22-25 2025: ALD/ALE AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025) to be held at Jeju island, Korea. (Web)

June 25-28, 2025: IPTJC International Plasma Technology Joint Conference 2025 (IPTJC-2025) (Placep, GPF, SDSE) to be held at Ming Chi University of Technology in New Taipei City, Taiwan. (Web)

July 3, 2025: (Closed) R052 DXプラズマ研究会　2025年度第2回研究会　於：東京

July 4, 2025: 最先端半導体レクチャー　半導体メモリ技術（マイクロン）　於：TELオーディトリアム

July 18, 2025: 最先端半導体レクチャー　光情報処理（NTT物性科学基礎研究所）　於：TELオーディトリアム

July 20-25, 2025: ICPIG XXXVIth International Conference on Phenomena in Ionized Gases (ICPIG), to be held at Aix-En-Provence, France (Web)

August 20-23, 2025: ISPB 14th International Symposium on Plasma Bioscience (ISPB14) to be held in conjunction with the 69th KVS in Jeju, South Korea.

September 4, 2025: (Closed) R052 DXプラズマ研究会　2025年度第3回研究会　於：東京

September 7-10, 2025: 応物秋 2025年（令和7年）応用物理学会秋季学術講演会 to be held at Meijo University, Nagoya, Japan.

September 21-26, 2025: AVS 71st AVS International Symposium & Exhibition to be held, at Charlotte, North Carolina, USA (Web)

September 21-26, 2025: AAPPS-DPP (not attend) AAPPS-DPP2024 Annual Conference to be held at Fukuoka International Congress Center, Japan

October 10, 2025: 最先端半導体レクチャー　プラズマエッチング装置（TEL宮城　大矢）　於：TELオーディトリアム

October 20-24, 2025: GEC 78th Annual Gaseous Electronics Conference (GEC) to be held at Seoul, Korea.

October 24, 2025: 最先端半導体レクチャー　SiCパワーモジュール（東芝デバイス＆ストレージ）　於：TELオーディトリアム

October 26-29, 2025: TACT 2025 Conference to be held at National Taipei University of Technology, Taipei, Taiwan, (Web)

November 3-6, 2025: AEPSE Asian European Plasma Surface Engineering (AEPSE) 2025, to be held at Phuket, Thailand.

November 7, 2025: 最先端半導体レクチャー　ファウンドリ（ユナイテッド・セミコンダクター・ジャパン）　於：TELオーディトリアム

November 10-12, 2025: MRS-J 35th Annual meeting of material research society of Japan (MRS-J) 2025, to be held at Kita-kyushu (北九州国際会議場), Japan. (Web) Deadline is July 31, 2025.

November 14, 2025: 最先端半導体レクチャー　フラッシュメモリ（ウェスタンデジタル）　於：TELオーディトリアム

November 19, 2025: (Closed) R052 DXプラズマ研究会　2025年度第4回研究会　於：東京

November 20-21, 2025: DPS 46th DPS to be held at Ehime, Japan

November 28, 2025: 最先端半導体レクチャー　パッケージ基板（イビデン）　於：TELオーディトリアム

December 1-4, 2025: プラズマ核融合学会

December 3-5, 2025: 第48回日本分子生物学会年会於：パシフィコ横浜　(Web) シンポジウム：　雷！プラズマが駆動型科学にみる植物内分子応答

December 5, 2025: 最先端半導体レクチャー　半導体洗浄技術（SCREENセミコンダクターソリューションズ）　於：TELオーディトリアム

December 19, 2025: 最先端半導体レクチャー　未定　於：TELオーディトリアム

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2026

January 16, 2025: 最先端半導体レクチャー　未定　於：TELオーディトリアム

January 20-22, 2025: (Closed) R052 DXプラズマ研究会　2025年度第5回研究会　於：

March 2026: ISPlasma ISPlasma 2026, Japan.

March 15-18, 2026: 応物春 2026年（令和8年）第73回応用物理学会春季学術講演会 to be held at University of Tokyo Science, Okayama, Tokyo, Japan.

April 27-May 1, 2026: 2026 MRS Spring Meeting and JSAP-MRS Joint Symposia 2026 to be held at Hawaii Convention Center, Honolulu, Hawaii, USA

May 31-June 5, 2026: ICPM International Conference on Plasma Medicine (ICPM) to be held at Gifu, Japan.

June 22-26, 2026: ICOPS to be held at Statelone, Lake Tahoe NV, USA (Web)

July 7-11, 2026: XXVII ESCAMPIG (Europhysics Conference on Atomic and Molecular Physics of Ionized Gases) to be held at Madeira, Portugal.

July 27-31, 2026: ICRP ICRP-12 to be held at Kanazawa, Japan.

August 31-September 3: 20th International Conference on Plasma Surface Engineering (PSE 2026), to be hld at Erfurt, Germany

September 8-11, 2026: 応物秋 2026年（令和8年）応用物理学会秋季学術講演会 to be held at Hokkaido University, Japan.

September 21-26, 2026: AAPPS-DPP AAPPS-DPP2024 Annual Conference to be held at Exhibition and Convention Center in Busan port (BPEX), Korea

October 12-16: GEC GEC to be held at Illinois, USA

November 8-13, 2026: AVS AVS 72nd International Symposium & Exhibition, to be held at Pittsburgh, Pennsylvania, USA.

November 19-20, 2026: DPS 47th DPS

December , 2026: プラズマ核融合学会

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2027

March 2-6, 2027: ISPlasma ISPlasma 2027, to be held at Nagoya University, Japan.

meeting2025, meeting2024, meeting2023, meeting2022, meeting2021, meeting2020, meeting2019, meeting2018, meeting2017, meeting2016, meeting2015, meeting2014, meeting2013, meeting2012, meeting2011

JSPF calendar, MRS calendar, APS calendar, conferences calendar

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HIGHLIGHTS (II)

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Metabolomic profiles display a novel mechanism on cell death that is induced specifically by incubation in the non-thermal plasma treated solutions

The plasma-activated lactated solution (PAL) exhibits antitumor effects in glioblastoma U251SP cells. The PAL-treated U251SP cells exhibited changes in intracellular metabolites that were reductive in the redox state.

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Non-thermal plasma–activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism

Kenji Ishikawa, Yugo Hosoi et al. Archives of Biochemistry and Biophysics 688, 108414 (pp. 1-9) (July 30, 2020). link

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Nonthermal plasma-activated medium (PAM) modified metabolomic profiles in glycolysis of U251SP glioblastoma

Naoyoyuki Kurake, Kenji Ishikawa et al. Archives of Biochemistry and Biophysics 662, pp.83-92 (February 15, 2019). link

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Real-time in situ ESR

Our paper was published on-line in the Applied Physics Letters (IF 2011 = 3.844) on July 2 issue of 2012.

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Real-time In Situ Electron Spin Resonance Measurements on Fungal Spores of Penicillium digitatum during Exposure of Oxygen Plasmas

Kenji Ishikawa et al. Appl. Phys. Lett. 101, 013704 (2012). link, arXiv

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Real-time in situ ESR

Our paper was published in the Journal of Physical Chemistry Letters (I.F. 2011 = 6.213)

link

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Synergistic Formation of Radicals by Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real-time in situ Electron Spin Resonance Study

We report on the surface modification of polytetrafluoroethylene (PTFE) as an example of soft- and bio-materials that occur under plasma discharge by kinetics analysis of radical formation using in situ real-time electron spin resonance (ESR) measurements. During irradiation with hydrogen plasma, simultaneous measurements of the gas-phase ESR signals of atomic hydrogen and the carbon dangling bond (C-DB) on PTFE were performed. Dynamic changes of the C-DB density were observed in real time, where the rate of density change was accelerated during initial irradiation and then became constant over time. It is noteworthy that C-DBs were formed synergistically by irradiation with both vacuum ultraviolet (VUV) and atomic hydrogen. The in situ real-time ESR technique is useful to elucidate synergistic roles during plasma surface modification.

Kenji Ishikawa et al. J. Phys. Chem. Lett. 2, 1278 (2011). link

This paper won the 11th Plasma Electronics Award awarded by the Plasma Electronics division of the Japanese Society of Applied Physics on March 28, 2013.