| |
Name |
Affiliation |
Country |
| Chair |
T. Ohiwa |
Toshiba Corp. |
Japan |
| Vice-chair |
M. Izawa |
Hitach High-Technologies Corp. |
Japan |
| Members |
T.-H. Ahn |
Samsung Electronics Co., Ltd. |
Korea |
| D. S. H. Chan |
National University of Singapore |
Singapore |
| H. Y. Chang |
Korea Advanced Institute of Science and Technology |
Korea |
| C. K. Choi |
Jeju National University |
Korea |
| V. Donnelly |
University of Houston |
USA |
| S. Fujimura |
Tokyo Institute of Technology |
Japan |
| N. Fujiwara |
Mitsubishi Electronic Corp. |
Japan |
| D. B. Graves |
University of California, Berkeley |
USA |
| J. G. Han |
Sungkyunkwan University |
Korea |
| M. Hori |
Nagoya University |
Japan |
| M. Horioka |
Applied Materials Inc. |
Japan |
| L. van den Hove |
Interuniversity Microelectronics Center (IMEC) |
Belgium |
| O. Joubert |
LTM/CNRS |
France |
| K. Kinoshita |
NEC Corp. |
Japan |
| M. J. Kushner |
University of Michigan |
USA |
| K. C. Leou |
National Tsing Hua University |
Taiwan |
| K. Nojiri |
Lam Research Corp. |
Japan |
| K. Ono |
Kyoto University |
Japan |
| L. Overzet |
University of Texas at Dallas |
USA |
| M. C. M. van de Sanden |
Eindhoven University of Technology (TU/e) |
the Netherlands |
| M. Shiratani |
Kyushu University |
Japan |
| S. Xu |
Nanyang Technological University |
Singapore |
| N. Yamamoto |
Tokyo Electron AT Ltd. |
Japan |
| |
Name |
Affiliation |
Country |
| Chair |
N. Itabashi |
Hitachi, Ltd. |
Japan |
| Vice-chair |
K. Kurihara |
Toshiba Corp. |
Japan |
| T. Tatsumi |
Sony Corp. |
Japan |
| Members |
K. Azuma |
Shimadzu Corp. |
Japan |
| J.-P. Booth |
CNRS/École Polytechnique |
France |
| J. P. Chang |
University of California, Los Angeles |
USA |
| K.-N. Chen |
National Chiao Tung University |
Taiwan |
| L. Chen |
TEL Technology Center, America |
USA |
| D. J. Economou |
University of Houston |
USA |
| M. Engelhardt |
Infineon Technologies Austria AG |
Germany |
| K. Eriguchi |
Kyoto University |
Japan |
| P. Favia |
University of Bari |
Italy |
| H. Hayashi |
Toshiba Corp. |
Japan |
| S. Higashi |
Hiroshima University |
Japan |
| M. Hiramatsu |
Meijo University |
Japan |
| T. Hirata |
Tokyo City University |
Japan |
| M. Honda |
Tokyo Electron AT Ltd. |
Japan |
| M. Horioka |
Applied Materials Inc. |
Japan |
| T. Ichiki |
The University of Tokyo |
Japan |
| K. Ishikawa |
Nagoya University |
Japan |
| C. J. Kang |
Samsung Electronics Co., Ltd. |
Korea |
| S. Y. Kang |
Tokyo Electron Ltd. |
Japan |
| K. Karahashi |
Osaka University |
Japan |
| K. Kawamoto |
Renesas Electronics Corp. |
Japan |
| W.M.M.Kessels |
Eindhoven University of Technology (TU/e) |
the Netherlands |
| H. Kobayashi |
Hitachi, Ltd. |
Japan |
| K. Koga |
Kyushu University |
Japan |
| H. Kokura |
FUJITSU Semiconductor Ltd. |
Japan |
| A. Kono |
Nagoya University |
Japan |
| A. Koshiishi |
Lam Research Corp. |
Japan |
| H. Kuwano |
Tohoku University |
Japan |
| S. K. Lee |
Hynix Semiconductor Inc. |
Korea |
| T. Maruyama |
Renesas Electronics Corp. |
Japan |
| Y. Morikawa |
ULVAC Inc. |
Japan |
| K. Nakamura |
Chubu University |
Japan |
| K. Nakamura |
Mitsubishi Electric Corp. |
Japan |
| M. Nakamura |
SEMATECH/ISMI |
Japan |
| N. Negishi |
Hitachi, Ltd. |
Japan |
| Y. Noda |
DENSO Corp. |
Japan |
| K. Nojiri |
Lam Research Corp. |
Japan |
| S. Nunomura |
Advanced Industrial Science and Technology (AIST) |
Japan |
| Y. Ohshita |
Toyota Technological Institute |
Japan |
| H. Ohtake |
Tohoku University |
Japan |
| T. Okumura |
Panasonic Corp. |
Japan |
| F. Roozeboom |
Eindhoven University of Technology (TU/e) |
the Netherlands |
| Y. Setsuhara |
Osaka University |
Japan |
| D. Shamiryan |
Interuniversity Microelectronics Center (IMEC) |
Belgium |
| Y. Shimogaki |
The University of Tokyo |
Japan |
| T. Shirafuji |
Osaka City University |
Japan |
| M. Tada |
NEC Corp. |
Japan |
| K. Takahashi |
Kyoto Institute of Technology |
Japan |
| K. Tamura |
Sharp Corp. |
Japan |
| S. Watanabe |
Hitachi High-Technologies Corp. |
Japan |
| T. Watanabe |
Waseda University |
Japan |
| T. Yagisawa |
Keio University |
Japan |