ICRP-9 / GEC-68 / SPP-33
      9th International Conference on Reactive Plasmas
      68th Gaseous Electronics Conference
      33rd Symposium on Plasma Processing

October 12 - October 16 2015
    Hawaii Convention Center
    1801 Kalakaua Avenue, Honolulu, HI 96815, USA

JJAP Special Issue

Papers published in a proceedings volume may also be submitted to a special issue “Plasma Processing” of the Japanese Journal of Applied Physics (JJAP), which will be published in July, 2016. The special issue will consist of selected papers presented at the conference. The authors who want their papers to be included in the JJAP special issue will be requested to submit a manuscript directly to the Publication Office of JJAP by the end of October, 2015.
THE DEADLINE FOR PAPER SUBMISSION IS EXTENDED TO November 30, 2015.

Each manuscript should be planned to occupy 4-6 journal pages as a full paper, including more data and more detailed interpretations of the findings reported in the proceedings volume. The same manuscripts as in the proceedings volume will not be accepted. The manuscripts will be refereed by the Editorial Board of JJAP before they are accepted for publication, as strictly as those for regular JJAP issues. The authors (or their institution) will be requested to pay the publication charge of JJAP, when the paper is accepted. The most cited paper of JJAP Special Issue will be awarded in future ICRP.

The authors (or their institution) will be requested to pay the publication charge of JJAP, when the paper is accepted.

General Information for Authors of JJAP Special Issues
https://journals.jsap.jp/jjap/special-issues/information

Online Submission to JJAP Special Issues
https://journals.jsap.jp/jjap/special-issues/online-submission-to- jjap-special-issues

Direct URL to login in "Online Submission System":
https://xreview.jsap.jp/cgi-bin/submission/submission.cgi?ln=en&si=103