meeting2011 - ishikawa

Past meetings 2011 †

November 17-18, 2011: JSAP hokuriku(in Japanese) Kanazawa, Japan. Prof. Horibe's group will give presentations on this conference. Mr Watanabe will give a presentation 18p-C-08, entitled "加熱触媒体により生成した原子状水素を用いたPMMA 系ポリマーの除去" at 16:00 on Nov. 18.

November 14-18, 2011: GEC in Salt-lake City, U.S.A. Mr Takeuchi will give an oral presentation on Nov. 17, NR1.00005, "Study on modification process of photoresist by fluorocarbon ions and radicals". Mr Miyawaki will give an oral presentation on Nov. 17, NR1.00006, "Mechanism of Highly Selective SiO2 Etching over Si using New Alternative Gas, C5HF7". Prof. Dr Hayashi will give a poster presentation on Nov. 17, QRP1.00013, "Quantum chemical investigation for Chemical dry etching by flowing NF3 into H2 down flow plasma". Mr Hiraoka will give an oral presentation on Nov. 15, DT2.00007, "Evaluation of Penicillium digitatum sterilization using non-equilibrium atmospheric pressure plasma by terahertz time-domain spectroscopy". Mr Abe will give an oral presentation on Nov. 15, ET1.00004, "Behavior of radicals in SiH4/H2 plasma for fabrication of solar cell using silicon thin film".

November 22-25, 2011: Plasma Conference 2011 in Ishikawa Ongakudo Kanazawa, Japan. Dr Ishikawa will give an invited presentation 10:40-11:10 on Nov. 24, S-04-01, "電子スピン共鳴測定によるプラズマ表面相互作用のその場観察"(in Japanese). Dr Hashizume will give a presentation 15:50 on Nov. 22, 22G11, "低温大気圧プラズマとミドリカビ胞子の相互作用". Mr Cho will give a presentation 17:30 on Nov. 22 22B07, "CH4/H2プラズマを用いて成長したカーボンナノウォールの結晶構造および電気的特性". Mr Kato will give an oral presentation on Nov. 23, 23G09 "O2/Ar非平衡大気圧プラズマにおける活性種の3次元気相反応解析".

October 30-November 4, 2011: AVS in Tennessee, U.S.A. Dr Ishikawa will give an oral presentation on Thu 3:00PM, PS+SS-ThA-4, "Polymer Surface Modification: Real-time In Situ Electron Spin Resonance Study for Plasma Processes". Prof. Sekine will given an oral presention on Tue 17:20 PS1-TuA-11 "Mechanism of Highly Selective SiO2 Etching over Si3N4, Si and Photoresist Using Hydro-Fluorocarbon Gases". Dr Jia will give an oral presentation on Wed 4:40PM, SE+PS-WeA-9, "High Performance of 60-Hz Atmospheric Pressure Plasma: Basic Characteristics and Applications". Mr Chin, D2 student, will give an oral presentation on Thu 11:20AM, PS-ThM-11, "Room Temperature Radical Annealing of Plasma Damaged Gallium Nitride".

November 8-12, 2011: International conference on thin film ICTF-15 Kyoto Terrasa, Japan. Mr Fukushima, Mr Kuki will give presentation on this conference.

November 10-11, 2011: DPS in Kyoto, Japan Kyoto Garden Palace, Kyoto, Japan. Mr Sumi will give an oral presentation on 15:20 Nov. 11, E-3 "Real time/in situ electron spin resonance analysis of surface reaction on organic materials". Mr Asano will give an oral presentation on 16:10 Nov. 10, B-3 "Inhibition of roughness formation on 193nm photoresist during C5HF7/O2/Ar plasma". Mr Takeuchi (P1-04), Mr Amasaki (P1-06), Mr Kondo (P1-12), Mr Komuro (P1-20), Mr Kometani (P1-21), and Mr Miyawaki (P103) will poster presentations. Prof. Dr. Hayashi (P1-01) will give a poster presentation. Dr Tomiya from Sony, our collaborator, will give an oral presentation on 14:30 Nov. 10, A-5, "Plasma induced damage to InGaN single quantum well".

September 19-22, 2011: The 8th Asian European International Conference on Plasma Surface Engineering (AEPSE 2011) in Dalian, China. Dr Ishikawa will give an invited presentation on Sept. 22, ThB8-1, "In-situ ESR measurements for revealing plasma-surface interactions". Dr Jia will give a poster presentation P-161, "Highly Spatial Mapping of Atomic Oxygen Density in a 60-Hz Atmospheric Pressure Plasmas Using Calibrated Two-Photon Laser-Induced Fluorescence". Mr Kondo (M2) will give a poster presentation P-310, "Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes".

September 27-30, 2011: SSDM in Nagoya, Japan Dr Ishikawa will give an oral presentation on 16:10, September 30, 2011, C-9-1, “In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films”. Mr Abe will give an oral presentation. Mr Ro, Mr Suzuki, and Mr Hagino will give poster presentations.

September 7-10, 2011: SISPAD in Osaka, Japan Mr Malinowski will give a poster presentation.

September 12-16, 2011: ESSDERC in Finland Mr Malinowski will give a poster presentation in fringe poster session, 13/D, "Development of radical kinetic behaviour investigation method and its application for sticking coefficient estimation".

September 13-15, 2011: Advanced Metallization Conference 2011 at Shibaura Institute of Technology (Toyosu Campus), Tokyo in Japan. Mr Asano will give an oral presentation on 14:40, September 13, 2011, (3-4) "In-situ Analysis of Modification on Porous SiOCH During and After O2 Plasmas"

August 29- September 2, 2011: The 72nd Fall Meeting of the Japan Society of Applied Physics (JSAP) in the Yamagata University. Deadline on June 5.

August 28- September 2, 2011: ICPIG in Belfast, Northern Ireland, UK deadline May 18.

July 21-22, 2011: 13th International Workshop on Advanced Plasma Processing and Diagnostics (KJ13) at National Fusion Research Institute, Deajeon in Korea.

July 19-20, 2011: 24th Symp. on Plasma Sci. for Mater. (SPSM-24) at Osaka University in Japan. Abst. deadline on May 31.

July 4-7, 2011: ICMAP in China at Dalian, China. Mr Suzuki, D1 student, will give an oral presentation.

June 17-18, 2011: 8th Cat-CVD at Kanazawa Institute of Technology, Japan. Mr Sumi, M2 student, won award for the best poster presentation on this conference.

Last-modified: 2020-11-21 (土) 11:01:56