ProceedingIntern22

国際会議 2022 | 2021 | 2020 | 2019 | 2018 | 2017 | 2016 | 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | before 2009

Proceedings of international conferences

2022

  • 960) Masaru Hori, Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, and Makoto Sekine
    • (Invited) Internal parameter analysis by random forest model in PECVD of amorphous carbon films
      • First Meeting of the NTC Technical Committee on Emerging Plasma Nanotechnologies(IEEE Nanotechnology Council)

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma-Nano Technology & Science (ISPlasma2022/IC-PLANTS2022) March 7-10, 2022

  • 961) Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R. Vasquez Jr., and Masaru Hori
    • In-liquid plasma coating of graphite films on metal surface immersed in ethanol
      • 07pB09O
  • 962) Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, and Mineo Hiramatsu
    • Three-dimensional morphological analysis of carbon nanowalls
      • 07pE03O
  • 963) Frank Wilson Amalraj, Dhasiyan Arun Kumar, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori
    • Homoepitaxial Growth of GaN Using a p-BN Tube Attached Radical Enhanced MOCVD (REMOCVD)
      • 08pC13O
  • 964) Swapnil Ghodke, Motoyuki Murashima, Dennis Christy, Ngo Van Nong, Osamu Oda, Noritsugu Umehara, Kenji Ishikawa, and Masaru Hori
    • Nanomechanical Properties Of Maze-Like Carbon Nanowalls Structure By Nanoindentation Technique
      • 07pD06O
  • 965) Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
    • Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma Enhanced Chemical Vapor Deposition
      • 07pD05O
  • 966) Naohiro Shimizu, Ranjit Borude, Reiko Tanaka, Kenji Ishikawa, Osamu Oda, Hiroki Hosoe, Satoshi Ino, Yousuke Inoue, and Masaru Hori
    • Rebound Tailing Pulse Method Applied to Water Electrolysis
      • 07pB11O
  • 967) Liugang Hu, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Etching of a layer from stacked graphene in remote oxygen plasma
      • 09P-02
  • 968) Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori
    • Improvement of Efficiency of Biodegradation of Polyethylene Terephthalate using Neutral-Oxygen-Radical Source
      • 08P-29
  • 969) Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
    • Effect of substrate temperature on morphology of carbon nanowalls grown by a radical-injection plasma-enhanced chemical vapor deposition using C2F6/H2 mixture gas
      • 08P-05
  • 970) Shunya Hashimoto, Yuta Matsumoto, Jun-Seok Oh, Tatsuru Shirafuji, Kenji Ishikawa, and Masaru Hori
    • Visualization of plasma affected area on a 3D printed mouse model.
      • 08pE09O
  • 971) Masaru Hori, Hiromasa Tanaka, and Kenji Ishikawa
    • Tuning Plasma-Knobs to Control Seamless Radical-Induced Biological Reaction Processes
      • 08P-24
  • 972) Hidefumi Uchiyama, Kenji Ishikawa, Masaru Hori, and Takashi Kondo
    • Low temperature plasma chemistry of volatile and non-volatile solutes in aqueous solutions: e.p.r. and spin trapping studies.
      • 08P-25
  • 973) Koki Ono, Takashi Koide, Kenji Ishikawa, Hiromasa Tanaka, Hiroki Kondo, Ayae Sugawara Narutaki, Yong Jin, Shigeo Yasuhara, Masaru Hori, and Wakana Takeuchi
    • Biocompatibility of Conformal Coating of SiC on Carbon Nanowall Scaffold
      • 08P-28
  • 974) Camelia Miron, Nikolay Britun, Hiroki Kondo, Kae Nakamura, Hiroshi Hashizume, Hiromasa Tanaka, Kenji Ishikawa, and Masaru Hori
    • Physicochemical Investigation of Plasma Activated Lactate Solutions
      • 09pE13O
  • 975) Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Atomic layer etching of metal compounds with selective removal of their carbides over nitrides using a floating wire-assisted liquid vapor plasma method
      • 09aC03O
  • 976) Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma
      • 09pC06O
  • 977) Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
    • Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film
      • 09pB14O
  • 978) Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma
      • 09pC07O
  • 979) Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
    • Quality-Increasing Effect of Plasma Treatment in a Paddy on Various Rice Cultivars
      • 09pE07O
  • 980) Takumi Yamauchi, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Shinichi Akiyama, and Masaru Hori
    • Measurement of RONS concentration in plasma-irradiated artificial seawater
      • 09P-26
  • 981) Yang Liu, Yoshimichi Nakatsu, Hiromasa Tanaka, Kazunori Koga, Kenji Ishikawa, Masaharu Shiratani, and Masaru Hori
    • Genotoxic effects of plasma activated Ringer's lactate solution on cancer cells
      • 09pE08O
  • 982) Shohei Nakamura, Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, Osamu Oda, and Masaru Hori
    • Low damage atomic layer etching of GaN at high temperature
      • 09aC04O
  • 983) Daiki Ito, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Kae Nakamura, Camelia Miron, Hiromasa Tanaka, Hiroaki kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori
    • Evaluation of selective anti-cancer effect in plasma-activated Ringer's lactate solution produced by regulated surrounding atmosphere
      • 09aE06O
  • 984) Kenichi Inoue, Noritaka Sakakibara, Taku Goto, Tsuyohito Ito, Yoshiki Shimizu, Kenji Ishikawa, Masaru Hori, and Kazuo Terashima
    • Carbon layer formation on boron nitride via a plasma in hydroquinone solution
      • 09P-25

2022 MRS Spring Meeting & Exhibit at Hawaii Convention Center, Honolulu, USA May 7-13, 2022

  • 985) Kenji Ishikawa
    • (Tutorial, INVITED) Plasma medicine and plasma bio related phenomena
      • MF01 8:30 on May 8
  • 986) Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Passivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma
      • MF01.03.02
  • Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Yasumasa Okazaki, Shinya Toyokuni, and Masaru Hori
    • Gene Expression Analysis of Plasma Activated Ringer’s Lactate Solution Treated Cells
      • MF01.08.02

The others

  • [Invited] Creation of Plasma Biology by Seamless Radical Control in Gas Phase, Liquid Phase and Biological Systems
    • Masaru Hori
  • Growth of High-In Content InGaN Layer by Molecular Beam Epitaxy Under High-Density Nitrogen Radical Irradiation
    • MF01.05.03
      • Hiroki Kondo, Kiyoshi Kuwahara, Arun Dhasiyan, Osamu Oda, Koji Yamakawa, Shoji Den, Yoshihiro Nakai, and Masaru Hori

  • 988) Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • (INVITED) Nanoscale etching technologies for nitrides and carbides
      • Second Meeting of the NTC Technical Committee on Emerging Plasma Nanotechnologies, May 10, 2022
  • 989) Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Study of etching process using CHF3 gas condensed layer in cryogenic region
      • 1st International Workshop on Plasma Cryogenic Etching Processes, Talk3 10:50‐11:15 May 17, 2022

22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop) held at Ghent University, Belgium

  • 990) Thi-Thuy-Nga Nguyen, Kazunori Shinoda, H. Hamamura, Kenji Maeda, K. Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Surface Modification for Atomic Layer Etching of TiAlC Using Floating Wire-Assisted Liquid Vapor Plasma at Medium Pressure
      • ALE-TuM2-3
  • 991) Kazunori Shinoda, H. Hamamura, Kenji Maeda, Masaru Izawa, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, and Masaru Hori
    • Plasma-Assisted Thermal-Cyclic Etching of Silicon Germanium Selective to Germanium
      • ALE-MoM2-3

9th International conference on Plasma medicine (ICPM9) held at Jaarbeurs, Utrecht, the Netherlands

  • 992) Camelia Miron, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Massaki Mizuno, and Masaru Hori
    • Physicochemical Investigation of Plasma Activated Liquids Organically Engineered by Cold Atmospheric Pressure Plasma for Cancer Treatment
      • O4 D4B3
  • 993) Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima,
    Masaaki Mizuno, and Masaru Hori
    • Effectiveness of Plasma Treatment for Various Rice Cultivation
      • P1 6
  • 994) Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori
    • [Invited] Molecular mechanisms of cell death by plasma activated solutions in glioblastoma cells
      • I1 D1A1
  • 995) Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Shinya Toyokuni, and Masaru Hori
    • [Invited] The aqueous plasma therapy for ovarian cancer ~Aiming for controlling disseminated peritoneal metastasis
      • I2 D4B1

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 2022.9.11.SUN-16.FRI Sapporo Convention Center, Sapporo, Japan

  • 996) Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas
      • 13:15 Tue-H1-4
  • 997) Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
    • Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition
      • 13:30 Tue-H1-5

GEC/ICRP

  • XXX) Kenji Ishikawa, Masaru Hori, and Toshiro Kaneko
    • Plasma-based in situ functionalization based on functional nitrogen science
      • EF2.00001 : 10:00 AM–10:30 AM Friday, October 7, 2022
  • XXX) Takashi Kondo, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori, Shinya Toyokuni, and Masaaki Mizuno
    • Biological effects of the combination with low temperature plasmas and nanoparticles-platinum and gold-
      • EF2.00006 : 11:30 AM–11:45 AM Friday, October 7, 2022
  • XXX) Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Shih-Nan Hsiao, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Yoji Hirosue, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
    • Various approaches of cold plasma treatment to brewer's rice plant for improvement of grain quality
      • EF3.00003 : 2:15 PM–2:30 PM Friday, October 7, 2022
  • XXX) Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature
      • ER2.00007 : 11:45 AM–12:00 PM Thursday, October 6, 2022
  • XXX) Shohei Nakamura, Atsushi Tanide, Masafumi Kawagoe, Soichi Nadahara, Kenji Ishikawa, Osamu Oda, and Masaru Hori
    • Damage mitigation in atomic layer etching of GaN by cyclic exposure of BCl3 gas and F2 added Ar plasma at high substrate temperature
      • FW5.00002 : 3:00 PM–3:15 PM Wednesday, October 5, 2022
  • XXX) Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Plasma-assisted thermal-cyclic atomic-layer etching for selective removal of thin films
      • FW5.00004 : 3:30 PM–4:00 PM Wednesday, October 5, 2022
  • XXX) Hiroki Kondo, Jumpei Kurokawa, Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
    • Deposition mechanism of hydrogenated amorphous carbon film by C3H6/H2 mixture gas plasma
      • GR5.00008 : 5:45 PM–6:00 PM Thursday, October 6, 2022
  • XXX) Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, and Masaru Hori
    • Highly efficient exosome capture by carbon nanowalls template
      • GT2.00005 : 11:15 AM–11:30 AM Tuesday, October 4, 2022
  • XXX) Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, and Masaru Hori
    • Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias
      • IF3.00006 : 3:00 PM–3:15 PM Friday, October 7, 2022
  • XXX) Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets
      • HT4.00084 : Poster Tuesday, October 4, 2022
  • XXX) Hiromasa Tanaka, Masaaki Mizuno, Ayako Tanaka, Yuki Shibata, Kenji Ishikawa, Hiroki Kondo, Hiroshi Hashizume, Camelia Miron, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, and Masaru Hori
    • Comprehensive analysis of gene expression in PAL-treated glioblastoma cells
      • HT4.00087 : Poster Tuesday, October 4, 2022

Others

  • Masaru Hori
    • Evolution of reactive plasma processes by radical control
      • DW3.00001 : 11:00 AM–11:30 AM
  • Airah P Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
    • Topographically-selective Atomic Layer Etching of SiO2 using fluorine-containing plasma
      • FW5.00003 : Wednesday, October 5, 2022
  • Nikolay Britun, Peterraj Dennis Christy, Vladislav Gamaleev, Shih-Nan Hsiao, and Masaru Hori
    • Properties of an atmospheric He-based nanosecond jet discharge
      • ER5.00007 : 5:30 PM–5:45 PM
  • Yasumasa Mori, Naoyuki Iwata, Tomiyasu Murata, Masaru Hori, and Masafumi Ito
    • Dependence of depth in liquid and gas-flow-rate ratio irradiated with nitric-oxide radicals on proliferation of fibroblast cells
      • HT4.00091 : Tuesday, October 4, 2022
  • Taiga Nishida, Naoyuki Iwata, Tomiyasu Murata, Hiromasa Tanaka, Masaru Hori, and Masafumi Ito
    • Inactivation of Breast Cancer Cells using Nitrogen-Oxygen-Radical-Activated Lactate Ringer's Solution
      • HW6.00084 : Wednesday, October 5, 2022
  • Ryuichi Ohashi, Naoyuki Iwata, Hiroyuki Kato, Motoyuki Shimizu, Masashi Kato, Masaru Hori, and Masafumi Ito
    • Degradation of lignin model compounds using ambient-air glow discharge
      • HW6.00086 : Wednesday, October 5, 2022
  • Kazuma Okamoto, Masahiro Maebayashi, Motoyuki Shimizu, Masashi Kato, Masaru Hori, and Masafumi Ito
    • Viscous reduction of carboxymethyl cellulose treated with ambient-air glow discharge using peristaltic pumps
      • HW6.00088 : Wednesday, October 5, 2022
  • Araki Shota, Tomomichi Ota, Hironaka Tsukagoshi, Naoyuki Iwata, Masaru Hori, and Masafumi Ito
    • Growth promotion of Arabidopsis thaliana using oxygen-radical-treated l-tryptophan solution
      • HW6.00090 : Wednesday, October 5, 2022
  • Hiromi Alwi Yamamoto, Masaru Hori, and Masafumi Ito
    • Spatiotemporal distribution measurements of ozone in the gas and liquid phases generated by non-equilibrium atmospheric pressure radical source
      • HW6.00094 : Wednesday, October 5, 2022

AVS 68th International Symposium & Exhibition at The David L. Lawrence Convention Center, Pittsburgh, PA, USA, November 6 - 11, 2022

  • XXX) Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, and Masaru Hori
    • Impact of Bias Power and Oxygen Addition on Selective Dry Etching of TiAlC over TiN Using N2/H2-based Plasmas
      • 9:20 AM November 9, 2022
  • XXX) Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Selective Dry Etching of TiAlC over TiN using N2/H2 Plasma Chemistry
      • 11:20 AM November 9, 2022

国際会議 2022 | 2021 | 2020 | 2019 | 2018 | 2017 | 2016 | 2015 | 2014 | 2013 | 2012 | 2011 | 2010 | before 2009


Last-modified: 2022-08-23 (火) 16:45:03